Patents by Inventor Monsour Moinpour

Monsour Moinpour has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6475293
    Abstract: An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: November 5, 2002
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park
  • Patent number: 6357071
    Abstract: An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: March 19, 2002
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park
  • Patent number: 6092253
    Abstract: An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.
    Type: Grant
    Filed: December 1, 1998
    Date of Patent: July 25, 2000
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park
  • Patent number: 5901399
    Abstract: An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: May 11, 1999
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park
  • Patent number: 5868857
    Abstract: An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: February 9, 1999
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park
  • Patent number: 5725414
    Abstract: An apparatus for cleaning the side-edge and top-edge of a semiconductor wafer. The present invention provides an edge cleaning mechanism that cleans both the side-edge and top-edge of a wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: March 10, 1998
    Assignee: Intel Corporation
    Inventors: Monsour Moinpour, Ilan Berman, Young C. Park