Patents by Inventor Moohyun KOH

Moohyun KOH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF FORMING PATTERNS
    Publication number: 20230288799
    Abstract: A method of forming patterns includes coating a metal-containing resist composition on a substrate, sequentially coating two types of compositions for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, and exposing and developing the metal-containing resist film to form a resist pattern; or coating a metal-containing resist composition on a substrate, coating a composition for removing edge beads along an edge of the substrate, performing a heat-treatment including drying and heating to form a metal-containing resist film on the substrate, exposing the metal-containing resist film, and developing with a developing solution composition to form a resist pattern, wherein details of the two types of compositions for removing edge beads and the developing solution composition are as described in the specification.
    Type: Application
    Filed: December 5, 2022
    Publication date: September 14, 2023
    Inventors: Hyungrang Moon, Youngkwon Kim, Ryunmin Heo, Minyoung Lee, Minsoo Kim, Kyuwon Lee, Jung Min Choi, Cheol Hong Park, Moohyun Koh, Sang Won Bae, Jungah Kim
  • PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
    Publication number: 20230176477
    Abstract: A photoresist composition includes an organometallic compound including at least one metal-ligand bond, the organometallic compound including a metal core and at least one organic ligand bonded to the metal core, and being configured such that the at least one metal-ligand bond is not breakable by exposure to light or moisture; a photoinitiator generating an acid or a radical in response to exposure to light; and a solvent.
    Type: Application
    Filed: June 15, 2022
    Publication date: June 8, 2023
    Inventors: Sukkoo HONG, Moohyun KOH, Kyungoh KIM, Yechan KIM, Kyunghwan NOH, Sungan DO, Hyun-Ji SONG
  • METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME
    Publication number: 20230037563
    Abstract: A metal-containing photoresist developer composition, and a method of forming patterns including a step of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxy group (—OH). The heptagonal ring compound has at least two double bonds in the ring.
    Type: Application
    Filed: July 6, 2022
    Publication date: February 9, 2023
    Inventors: Ryunmin HEO, Hyungrang MOON, Minyoung LEE, Minsoo KIM, Youngkwon KIM, Jaehyun KIM, Changsoo WOO, Jung Min CHOI, Moohyun KOH, Jungah KIM, Sungan DO, Sang Won BAE, Hoon HAN, SukKoo HONG
  • COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF REMOVING EDGE BEADS USING THE COMPOSITION
    Publication number: 20230038110
    Abstract: A composition for removing edge beads from a metal-containing resist, and a method of forming patterns including step of removing edge beads using the same are provided. The composition for removing edge beads from a metal-containing resist includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxyl group (—OH). The heptagonal ring compound has at least two double bonds in the ring.
    Type: Application
    Filed: July 6, 2022
    Publication date: February 9, 2023
    Inventors: Minyoung LEE, Hyungrang MOON, Ryunmin HEO, Minsoo KIM, Youngkwon KIM, Jaehyun KIM, Changsoo WOO, Jung Min CHOI, Moohyun KOH, Jungah KIM, Sungan DO, Sang Won BAE, Hoon HAN, SukKoo HONG