Abstract: A lighting device according to an embodiment includes a sensor, a substrate disposed on the sensor and including an electrode pattern, a light source disposed on the substrate and electrically connected to the electrode pattern, a resin layer disposed on the substrate, and a reflective layer disposed between the substrate and the resin layer, and the substrate may include a first region overlapping the sensor in a first direction perpendicular to an upper surface of the substrate, a second region surrounding the first region, the light source may be disposed on the second region, the plurality of reflective pattern groups may be disposed on the first region, and the sensor may not overlap the light source and the electrode pattern in the first direction.

Abstract: Lighting module disclosed in an embodiment of the invention, a substrate; a plurality of light emitting devices disposed on the substrate; a first reflective layer disposed on the substrate; a resin layer disposed on the first reflective layer and the light emitting device; and a second reflective layer disposed on the resin layer, wherein the resin layer is a front side surface on which light generated from the plurality of light emitting devices is emitted, a rear side surface facing the front side surface, and first and second side surfaces connecting the front side surface and the rear side surface with each other.

Abstract: A lighting device disclosed in an embodiment of the invention includes a substrate; light sources disposed on the substrate; and a resin layer disposed on the substrate and the light sources. a first reflective layer disposed on the resin layer, wherein the resin layer includes an exit surface facing the light sources, and the exit surface of the resin layer includes convex portions facing each of the light sources and recess portions respectively disposed between the plurality of convex portions, concave surfaces disposed in each of the plurality of recess portions may have a curvature, and a radius of curvature of the concave surfaces may increase in one direction.

Abstract: Disclosed are an electric vehicle capable of improving the charging efficiency of a charging apparatus by reducing the switching loss that may occur in the charging apparatus of an electric vehicle and a charging apparatus thereof. To this end, a power factor correction apparatus of an on board charger includes a first boost circuit receiving AC power through a first inductor to charge a load, a second boost circuit receiving the AC power through a second inductor to charge the load, and a third inductor provided between a leg of the first boost circuit and a leg of the second boost circuit so that parasitic capacitors of the first boost circuit and the second boost circuit are discharged.

Abstract: A discrete capacitance switching circuit includes a DC decoupling capacitor connected between a power node that receives an AC signal and a first node, a diode connected between the first node and a second node, a unit capacitor connected between the second node and a reference node that receives a ground voltage, and a bias circuit. The bias circuit is configured to apply a first DC voltage to the first node and apply a second DC voltage to the second node. The applied first and second DC voltages control a switching operation of the diode.

Abstract: Disclosed are an electric vehicle capable of improving the charging efficiency of a charging apparatus by reducing the switching loss that may occur in the charging apparatus of an electric vehicle and a charging apparatus thereof. To this end, a power factor correction apparatus of an on board charger includes a first boost circuit receiving AC power through a first inductor to charge a load, a second boost circuit receiving the AC power through a second inductor to charge the load, and a third inductor provided between a leg of the first boost circuit and a leg of the second boost circuit so that parasitic capacitors of the first boost circuit and the second boost circuit are discharged.

Abstract: A discrete capacitance switching circuit includes a DC decoupling capacitor connected between a power node that receives an AC signal and a first node, a diode connected between the first node and a second node, a unit capacitor connected between the second node and a reference node that receives a ground voltage, and a bias circuit. The bias circuit is configured to apply a first DC voltage to the first node and apply a second DC voltage to the second node. The applied first and second DC voltages control a switching operation of the diode.

Abstract: A radiation treatment planning apparatus and method thereof are disclosed. The radiation treatment planning apparatus according to an embodiment of the present invention includes a processor configured to acquire first radiation therapy plan (RTP) data based on a medical image of a region of interest of a patient; acquire radiation therapy results data for the region of interest based on the first RTP data; and generate third RTP data from second RTP data preset for the region of interest using the radiation therapy results data.

Abstract: Disclosed herein is a radiation treatment planning apparatus and method thereof. A radiation treatment planning apparatus comprising: a processor configured to: generate a statistical model for a change in radiation therapy plan (RTP) data based on change data of RTP data collected in association with radiation therapy results data; set first RTP data based on a medical image of a region of interest of a patient; acquire radiation therapy results data based on the first RTP data; acquire statistical data corresponding to the first RTP data and the radiation therapy results data from the statistical model; and generate second RTP data using the statistical data.

Abstract: A management system and method for managing a radiation treatment machine are disclosed herein. The system includes an information acquisition unit, an amount-of-use database, a treatment plan database, and a management unit. The information acquisition unit acquires information about the amount of use of the radiation treatment machine and information about a treatment plan. The amount-of-use database stores the information about the amount of use of the radiation treatment machine. The treatment plan database stores the time at which treatment is to be performed and information about the amount of use of the radiation treatment machine. The management unit checks whether the cumulative amount of use of the radiation treatment machine to exceed a predetermined reference value when the treatment is to be performed.

Abstract: A radiation treatment planning apparatus and method thereof are disclosed. The radiation treatment planning apparatus according to an embodiment of the present invention includes a processor configured to acquire first radiation therapy plan (RTP) data based on a medical image of a region of interest of a patient; acquire radiation therapy results data for the region of interest based on the first RTP data; and generate third RTP data from second RTP data preset for the region of interest using the radiation therapy results data.

Abstract: Disclosed herein is a radiation treatment planning apparatus and method thereof. A radiation treatment planning apparatus comprising: a processor configured to: generate a statistical model for a change in radiation therapy plan (RTP) data based on change data of RTP data collected in association with radiation therapy results data; set first RTP data based on a medical image of a region of interest of a patient; acquire radiation therapy results data based on the first RTP data; acquire statistical data corresponding to the first RTP data and the radiation therapy results data from the statistical model; and generate second RTP data using the statistical data.