Abstract: Provided is a lithography model simulation method. The method comprises receiving a first mask image, generating a second mask image by simulating an optical model on the first mask image, generating at least one third mask image by simulating a quenching model on the second mask image, and generating a resist image by performing machine learning on the first mask image, the second mask image, and the third mask image. The generating of the resist image comprises outputting first output data by convolving the first mask image with a first kernel, outputting second output data by convolving the second mask image with a second kernel, outputting third output data by convolving the third mask image with a third kernel, and adding together the first to third output data. Each of the first to third kernels is or includes a free-form kernel.

Abstract: In a method for minimizing optical proximity correction errors in a semiconductor pattern. The method includes modifying a mask in a quantized unit to reduce an edge placement error between a simulation layout shape and a target layout shape; adjusting a critical dimension (CD) error between a CD of the simulation layout shape and a CD of the target layout shape to generate an adjusted CD error by further modifying at least one side of the mask in a predetermined unit; and reforming the simulation layout shape by modifying each side of the mask with arbitrary correction values.

Abstract: In a method for minimizing optical proximity correction errors in a semiconductor pattern. The method includes modifying a mask in a quantized unit to reduce an edge placement error between a simulation layout shape and a target layout shape; adjusting a critical dimension (CD) error between a CD of the simulation layout shape and a CD of the target layout shape to generate an adjusted CD error by further modifying at least one side of the mask in a predetermined unit; and reforming the simulation layout shape by modifying each side of the mask with arbitrary correction values.