Abstract: Provided are a system for business process automation and a method thereof. The system according to some embodiments may include a connect manager configured to register and manage application programming interface (API) information for services, a process execution engine configured to execute a target business process comprising a particular service task, which is a task using a particular service provided by a service module, and a connect broker configured to acquire API information for the particular service, registered through the connect manager, during execution of the target business process in response to a request from the process execution engine, and process the particular service task by sending a request for the particular service to the service module using the acquired API information.

Abstract: The simulation system for predicting heating and cooling loads of a building comprises the collection unit collecting measurement data of a target building from a BEMS, the identification unit identifying indoor and outdoor temperature, humidity, and insolation measured in the building in real time based on RTS method, the correlation derivation unit deriving a correlation between energy usage based on the BEMS measurement data collected by the collection unit and the cooling and heating loads according to indoor and outdoor temperature, humidity, and insolation identified by the identification unit, the simulation unit predicting a change in cooling and heating loads according to a change in at least one of pieces of measurement data based on the correlation derived from the correlation derivation unit to perform a simulation, and the information provision unit providing a simulation result from the simulation unit in a visible form to a user terminal.

Abstract: Provided are an apparatus for performing leveling of a person image and an operating method thereof. The method includes: receiving an original person image; selecting an arbitrary latent vector in a latent space; generating a virtual person image based on the latent vector; optimizing the latent vector such that identity similarity between the original person image and the virtual person image increases; manipulating the optimized latent vector; and generating a levelled person image corresponding to the original person image, by using the manipulated latent vector.

Abstract: An integrated circuit of a semiconductor device is fabricated by forming patterns on a wafer in conformance with a layout of the patterns. A method for verifying the layout includes providing a virtual pattern on a predicted defect point in the layout, and identifying at least one pattern from among those of the layout using the virtual pattern. The predicted defect point corresponds to a weak point where it is determined in advance that a defect will occur when the layout is transcribed on a wafer. The identified pattern is a pattern that is adjacent to the virtual pattern in the layout.

Abstract: An integrated circuit of a semiconductor device is fabricated by forming patterns on a wafer in conformance with a layout of the patterns. A method for verifying the layout includes providing a virtual pattern on a predicted defect point in the layout, and identifying at least one pattern from among those of the layout using the virtual pattern. The predicted defect point corresponds to a weak point where it is determined in advance that a defect will occur when the layout is transcribed on a wafer. The identified pattern is a pattern that is adjacent to the virtual pattern in the layout.

Abstract: A semiconductor device and method of manufacturing a semiconductor device include a plurality of first active regions and a second active region being formed on a substrate. The second active region is formed between two of the first active regions. A plurality of gate structures is formed on respective first active regions. A dummy gate structure is formed on the second active region, and a first voltage is applied to the dummy gate structure.

Abstract: A semiconductor device and method of manufacturing a semiconductor device include a plurality of first active regions and a second active region being formed on a substrate. The second active region is formed between two of the first active regions. A plurality of gate structures is formed on respective first active regions. A dummy gate structure is formed on the second active region, and a first voltage is applied to the dummy gate structure.