Abstract: A semiconductor device a first fin-shaped pattern provided at a first surface of a substrate and extending in a second direction, a first source/drain pattern disposed on the first fin-shaped pattern and connected thereto, a first source/drain contact disposed on the first source/drain pattern and connected thereto, a buried conductive pattern extending through the substrate and connected to the first source/drain contact, a contact connection via disposed between the first source/drain contact and the buried conductive pattern. The contact connection via is directly connected to the first source/drain contact and a back wiring line disposed on a second surface of the substrate and connected to the buried conductive pattern. A width of the contact connection via increases as the contact connection via extends away from the second surface. A width of the first source/drain contact decreases as the first source/drain contact extends away from the second surface of the substrate.

Abstract: The invention relates to an antistatic silicone release film having a layer coated with an antistatic silicone release composition, and, used for semiconductors, electronics and display devices while addressing problems of static electricity generated when a general release film is separated from adhesive or an adhesive layer, and of contamination by such static electricity that causes critical product defects. The invention also relates to an antistatic silicon release film that can reduce product contamination caused by static electricity in peeling the film from adhesive or an adhesive layer, and achieves close adhesion between a substrate and a coated layer because of no interruption in curing a release layer, and also thereby has a stable release property.

Abstract: The present invention relates to an optical sheet for a backlight unit of a TFT-LCD and a TFT-LCD including the same. The optical sheet of the present invention includes a transparent base sheet, and a light diffusion layer in which a diffusion pattern comprised of a plurality of protrusions is formed on the transparent base sheet. The diffusion pattern satisfies an aspect ratio of 0.8 or more, the aspect ratio being a ratio of a radius (l) of a unit body portion of the protrusion, which is formed on the transparent base sheet, to a thickness (d) of the protrusion.

Abstract: The present invention relates to an optical sheet for a backlight unit of a TFT-LCD and a TFT-LCD including the same. The optical sheet of the present invention includes a transparent base sheet, and a light diffusion layer in which a diffusion pattern comprised of a plurality of protrusions is formed on the transparent base sheet. The diffusion pattern satisfies an aspect ratio of 0.8 or more, the aspect ratio being a ratio of a radius (l) of a unit body portion of the protrusion, which is formed on the transparent base sheet, to a thickness (d) of the protrusion.

Abstract: The invention relates to an antistatic silicone release film having a layer coated with an antistatic silicone release composition, and, used for semiconductors, electronics and display devices while addressing problems of static electricity generated when a general release film is separated from adhesive or an adhesive layer, and of contamination by such static electricity that causes critical product defects. The invention also relates to an antistatic silicon release film that can reduce product contamination caused by static electricity in peeling the film from adhesive or an adhesive layer, and achieves close adhesion between a substrate and a coated layer because of no interruption in curing a release layer, and also thereby has a stable release property.

Abstract: The invention pertains to a silicone release composition of which the peeling force can be controlled and also a silicone release film coated with the composition. With the inventive composition and the release film coated with the composition, it is possible to obtain a reproducible peeling force with a given value, and also possible to produce a uniformly coated release film without discharged harmful solvent. The silicone release film produced as such can have controlled peeling force with a stable peeling force characteristic compatible with viscous agent. To this end, the invention is characterized in that the silicone release composition of which the peeling force can be controlled according to the invention is a silicone water-dispersed release coating composition, contains organopolysiloxane, organopolysiloxane resin, organo hydrogen polysiloxane and platinum chelate catalyst, and meets the following math figure for peeling force: Peeling Force=a X+b, where a=61.62±3.98, and b=16.43±3.

Abstract: A release agent and a release liquid which are used for the manufacture of labels, double-sided tapes, etc., are disclosed. The release agent and the release liquid provide improved adhesion between a substrate and a release layer, and excellent peel strength betwveen the release layer and an adherent. The release agent includes a dispersion of a vinyl-modified colloidal silica, a dispersion of a platinum chelate catalyst, and a polysiloxane water-dispersible silicone emulsion. The release liquid is obtained by dispersing the release agent in water so as to have a solid content of 2.5˜30% by weight. The release film is produced by applying the release liquid on a substrate, followed by drying.

Abstract: A method for producing a release film which is used for the manufacture of adhesive labels, double-sided tapes, etc., is disclosed. The release film provides improved adhesion between a substrate and a release layer, and excellent peel strength between the release layer and an adherent. The method includes the steps of : obtaining a silicone aqueous emulsion release liquid by dispersing a silicone aqueous release agent including a dispersion of a vinyl-modified colloidal silica, a dispersion of a platinum chelate catalyst and a polysiloxane water-dispersible silicone emulsion, in water, so as to achieve a solid content of the release liquid of 2.5˜30% by weight; and applying and drying the obtained release liquid on a substrate to form a release layer.