Patents by Inventor Moon Hyung BAE

Moon Hyung BAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230288811
    Abstract: The inventive concept provides an apparatus and method for treating a substrate with a gas. The apparatus includes a chamber having a process space in which the substrate is treated, a substrate support unit that supports the substrate in the process space, a gas supply unit that supplies a hydrophobic gas onto the substrate supported on the substrate support unit, and a controller that controls the substrate support unit and the gas supply unit. The substrate support unit includes a support plate on which the substrate is placed and a pin assembly that raises the substrate off the support plate or lowers the substrate onto the support plate, and the controller controls a degree of hydrophobization of a surface of the substrate by adjusting the pin assembly.
    Type: Application
    Filed: May 2, 2023
    Publication date: September 14, 2023
    Applicant: SEMES CO, LTD.
    Inventors: Moon Hyung BAE, Hye Bin BAEK, Youngseo AN, Euntark LEE, Min Jung PARK, Seunghan LEE, Jung-Hyun LEE
  • Patent number: 11456198
    Abstract: An apparatus for treating a substrate includes an index module and a treatment module that treats the substrate. The index module includes a load port on which a carrier having a plurality of substrates received therein is loaded and a transfer frame that is disposed between the treatment module and the load port and that transfers the substrate between the carrier loaded on the load port and the treatment module. The treatment module includes one or more process chambers and a transfer chamber that transfers the substrate to the process chambers. The transfer chamber includes a housing having a transfer space in which the substrate is transferred, a transfer robot that is disposed in the housing and that transfers the substrate between the process chambers, and an electrostatic pad that is provided in the transfer space and that electro-statically attracts particles in the housing.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: September 27, 2022
    Assignee: SEMES CO., LTD.
    Inventors: Moon Hyung Bae, Min Jung Park
  • Publication number: 20210132499
    Abstract: The inventive concept provides an apparatus and method for treating a substrate with a gas. The apparatus includes a chamber having a process space in which the substrate is treated, a substrate support unit that supports the substrate in the process space, a gas supply unit that supplies a hydrophobic gas onto the substrate supported on the substrate support unit, and a controller that controls the substrate support unit and the gas supply unit. The substrate support unit includes a support plate on which the substrate is placed and a pin assembly that raises the substrate off the support plate or lowers the substrate onto the support plate, and the controller controls a degree of hydrophobization of a surface of the substrate by adjusting the pin assembly.
    Type: Application
    Filed: October 30, 2020
    Publication date: May 6, 2021
    Applicant: SEMES CO., LTD.
    Inventors: Moon Hyung BAE, Hye Bin BAEK, Youngseo AN, Euntark LEE, Min Jung PARK, Seunghan LEE, Jung-Hyun LEE
  • Publication number: 20210057253
    Abstract: An apparatus for treating a substrate includes an index module and a treatment module that treats the substrate. The index module includes a load port on which a carrier having a plurality of substrates received therein is loaded and a transfer frame that is disposed between the treatment module and the load port and that transfers the substrate between the carrier loaded on the load port and the treatment module. The treatment module includes one or more process chambers and a transfer chamber that transfers the substrate to the process chambers. The transfer chamber includes a housing having a transfer space in which the substrate is transferred, a transfer robot that is disposed in the housing and that transfers the substrate between the process chambers, and an electrostatic pad that is provided in the transfer space and that electro-statically attracts particles in the housing.
    Type: Application
    Filed: August 21, 2020
    Publication date: February 25, 2021
    Inventors: Moon Hyung BAE, Min Jung PARK
  • Publication number: 20210054507
    Abstract: An embodiment of the inventive concept provides an apparatus for treating a substrate. The apparatus for treating a substrate includes a chamber having a treating space inside the chamber and a gas inlet unit entering a gas into the treating space. The gas inlet unit includes an introduction pipe through which the gas is entered, and a discharging plate in which a discharging hole discharging the gas entered through the introduction pipe is formed. The discharging hole is arranged such that density for each area of the discharging plate is different.
    Type: Application
    Filed: August 19, 2020
    Publication date: February 25, 2021
    Inventors: Seunghan LEE, Jongsu CHOI, Jong Seok SEO, Junho SEO, Younghun JUNG, Kyungjin SEO, Jung-Hyun LEE, Moon Hyung BAE, Sang Jin BAE