Patents by Inventor Moon-Ho Kim

Moon-Ho Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8440153
    Abstract: A method for preparing manganese sulfate and zinc sulfate from waste batteries containing manganese and zinc, and more particularly to a method for preparing manganese sulfate and zinc sulfate from waste batteries containing manganese and zinc. Zinc powder and activated carbon are added to a leached solution obtained from a continuous leaching process so as to remove heavy metals and organic materials from the leached solution, and then the leached solution is spray-dried to simultaneously obtain manganese sulfate and zinc sulfate at high-purity by a simple process without generating wastewater. An environmentally friendly waste battery recycling process is thereby provided, because it is not required to use additional chemical substances for neutralization titration or impurity removal in recovering manganese sulfate and zinc sulfate by leaching a waste battery powder.
    Type: Grant
    Filed: January 25, 2010
    Date of Patent: May 14, 2013
    Assignees: Korea Institute of Geoscience and Mineral, Econics Corporation
    Inventors: Shun Myung Shin, Jin Gu Kang, Jeong Soo Sohn, Hyun Gun Kim, Moon Ho Kim
  • Patent number: 8203183
    Abstract: The present invention relates to an electrostatic discharge diode. The electrostatic discharge diode according to exemplary embodiment of the present invention includes: an N-type well formed on a substrate; an n? region formed on the N-type well; a plurality of p? regions penetrated and formed in the n? region; a plurality of n+ regions penetrated and formed in a first layer in which the n? region and a plurality of the p? regions are formed; a plurality of n+ regions penetrated and formed in a first layer in which the n? region and a plurality of the p? regions are formed; and a plurality of p+ regions penetrated and formed in the first layer, wherein a first n+ region among a plurality of the n+ regions and a first p+ region corresponding to the first n+ region are penetrated and formed in each other region of the corresponding first p? region among a plurality of the p? regions.
    Type: Grant
    Filed: September 10, 2009
    Date of Patent: June 19, 2012
    Assignee: Fairchild Korea Semiconductor Ltd.
    Inventors: Jun-Hyeong Ryu, Taeg-Hyun Kang, Moon-Ho Kim
  • Publication number: 20110123419
    Abstract: A method for preparing manganese sulfate and zinc sulfate from waste batteries containing manganese and zinc, and more particularly to a method for preparing manganese sulfate and zinc sulfate from waste batteries containing manganese and zinc. Zinc powder and activated carbon are added to a leached solution obtained from a continuous leaching process so as to remove heavy metals and organic materials from the leached solution, and then the leached solution is spray-dried to simultaneously obtain manganese sulfate and zinc sulfate at high-purity by a simple process without generating wastewater. An environmentally friendly waste battery recycling process is thereby provided, because it is not required to use additional chemical substances for neutralization titration or impurity removal in recovering manganese sulfate and zinc sulfate by leaching a waste battery powder.
    Type: Application
    Filed: January 25, 2010
    Publication date: May 26, 2011
    Applicants: KOREA INSTITUTE OF GEOSCIENCE AND MINERAL, ECONICS CORPORATION
    Inventors: Shun Myung Shin, Jin Gu Kang, Jeong Soo Sohn, Hyun Gun Kim, Moon Ho Kim
  • Publication number: 20100065884
    Abstract: The present invention relates to an electrostatic discharge diode. The electrostatic discharge diode according to exemplary embodiment of the present invention includes: an N-type well formed on a substrate; an n? region formed on the N-type well; a plurality of p? regions penetrated and formed in the n? region; a plurality of n+ regions penetrated and formed in a first layer in which the n? region and a plurality of the p? regions are formed; a plurality of n+ regions penetrated and formed in a first layer in which the n? region and a plurality of the p? regions are formed; and a plurality of p+ regions penetrated and formed in the first layer, wherein a first n+ region among a plurality of the n+ regions and a first p+ region corresponding to the first n+ region are penetrated and formed in each other region of the corresponding first p? region among a plurality of the p? regions.
    Type: Application
    Filed: September 10, 2009
    Publication date: March 18, 2010
    Inventors: Jun-Hyeong RYU, Taeg-Hyun KANG, Moon-Ho KIM
  • Patent number: 5147809
    Abstract: A method for manufacturing a bipolar transistor semiconductor device for preventing a degradation phenomenon of the transistor resulting from a reduction of a lateral electric field intensity. This is achieved by grading an emitter junction by way of refilling an emitter window with polycrystalline silicon. The resulting transistor structure overcomes the etch stop barrier by removing layer of oxide disposed below a layer of nitride along the region where formation of removing sidewalls of polycrystalline silicon have been formed. Subsequently, a doping distribution of the laterally graded emitter junction can easily be obtained by refilling the emitter window with the removed oxide layer with polycrystalline silicon. Because the shallowness of the oxide layer can be selectively and easily controlled, a thickness of the sidewalls is chosen which most efficiently raises the lateral electric field intensity of the transistor junction.
    Type: Grant
    Filed: August 20, 1991
    Date of Patent: September 15, 1992
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Young Won, Seog-Heon Han, Moon-Ho Kim, Jang-Man Ko