Patents by Inventor Mor Azaria

Mor Azaria has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IN-SITU PROCESS CHAMBER CHUCK CLEANING BY CLEANING SUBSTRATE
    Publication number: 20230264234
    Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.
    Type: Application
    Filed: May 1, 2023
    Publication date: August 24, 2023
    Inventors: Mor Azaria, Giampietro Bieli, Shai Mark, Adi Pahima, Yoram Uziel
  • In situ process chamber chuck cleaning by cleaning substrate
    Patent number: 11638938
    Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: May 2, 2023
    Assignee: KLA Corporation
    Inventors: Mor Azaria, Giampietro Bieli, Shai Mark, Adi Pahima, Yoram Uziel
  • Systems and methods for chuck cleaning
    Patent number: 11607716
    Abstract: A cleaning assembly may include a chuck. The cleaning assembly may include a plurality of lift pins positioned proximate to the chuck. The plurality of lift pins may be configured to engage a cleaning substrate and translate the cleaning substrate to allow the cleaning substrate to capture one or more particles from the surface of the chuck via at least one of electrostatic attraction or mechanical trapping when the cleaning substrate is positioned in the second position. The cleaning assembly may include a replaceable top skin coupled to the chuck and configured to capture the one or more particles.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: March 21, 2023
    Assignee: KLA Corporation
    Inventors: Shai Mark, Mor Azaria, Yoram Uziel, Giampietro Bieli, Adi Pahima
  • In Situ Process Chamber Chuck Cleaning by Cleaning Substrate
    Publication number: 20200384509
    Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.
    Type: Application
    Filed: November 13, 2019
    Publication date: December 10, 2020
    Inventors: Mor Azaria, Giampietro Bieli, Shai Mark, Adi Pahima, Yoram Uziel