Abstract: A process fluid flow system is provided having an input, an output, and a plurality of fluid circuits disposed between the input and output. At least one valve is disposed to selectably cause process fluid to flow through either a first circuit of the plurality of circuits, or a second circuit of the plurality of circuits. Process fluid flows through the first circuit during normal production, and through the second circuit during process fluid sequestration. A process fluid flow measurement device is operably interposed between the input and output and configured to measure total flow through the system. A separator is disposed in the second circuit and is arranged to allow the process fluid to separate gravitationally over time into immiscible components of the process fluid, the separator having a known internal volume. A guided wave radar level measurement device is preferably disposed to measure heights of interfaces within the separator.

Abstract: A process fluid flow system is provided having an input, an output, and a plurality of fluid circuits disposed between the input and output. At least one valve is disposed to selectably cause process fluid to flow through either a first circuit of the plurality of circuits, or a second circuit of the plurality of circuits. Process fluid flows through the first circuit during normal production, and through the second circuit during process fluid sequestration. A process fluid flow measurement device is operably interposed between the input and output and configured to measure total flow through the system. A separator is disposed in the second circuit and is arranged to allow the process fluid to separate gravitationally over time into immiscible components of the process fluid, the separator having a known internal volume. A guided wave radar level measurement device is preferably disposed to measure heights of interfaces within the separator.