Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.

Abstract: A line balance correction device adapted to correct longitudinal balance of a copper pair carrying xDSL signals and to produce a cancellation signal for reducing at least one of common-mode noise and differential signal imbalance. The device may be installed at any segment of a copper pair wiring of an xDSL transmission system that requires correction of longitudinal balance. The device is adapted to be connected in parallel to the copper pair and to a local ground and includes a controller and circuitry for correcting longitudinal balance. At least one variable resistor is connected to each wire of the copper pair. The resistance of each such variable resistor being independently controlled by the controller for matching resistance of signals carried over a corresponding wire of the copper pair to the local ground.

Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.