Abstract: The present invention relates to a method and a device for measuring scattering of X-rays wherein the compound to be analyzed is installed in a receptacle comprising an X-ray-permeable flat bottom, wherein the X-ray diffraction analysis is undertaken by sending an X-ray stream upwards toward said X-ray-permeable bottom and by measuring the stream of scattered X-rays reflected downwards, and wherein a fluid thermostatically controlled to the same temperature as that of the compound to be analyzed in the receptacle is projected toward the X-ray permeable flat bottom, from outside the receptacle.

Abstract: Method of measuring scattering of X-rays, characterized in that a compound to be analyzed is installed in a receptacle (1) comprising a flat bottom permeable to X-rays, in that an analysis by scattering of the X-rays is carried out by sending a stream of X-rays upwards in the direction of said bottom permeable to the X-rays and by measuring the stream of scattered X-rays that is reflected downwards, and in that a thermostatically controlled fluid at the same temperature as that of the compound to be analyzed in the receptacle is projected towards the flat bottom (3) permeable to X-rays, from outside the receptacle (1), and device for measuring scattering of X-rays characterized in that it comprises a receptacle (1) comprising a bottom shut off by a membrane (3) transparent to X-rays, as well as a diffractometer whose goniometer (4, 5) is installed so as to direct a beam of X-rays from below towards the membrane (3) transparent to X-rays and the detector (5) being installed for the measurement of the X-rays sc