Patents by Inventor Moritz Nitschke
Moritz Nitschke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10209294Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: GrantFiled: December 5, 2013Date of Patent: February 19, 2019Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Patent number: 10176970Abstract: A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply, and a data transfer connection operably coupling the two power supplies for data communication between the two power supplies. The first power supply is configured to: receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data. The first power supply can supply in the active backup mode to the plasma process the power having one or more characteristics that are substantially the same as those of the power provided by the second power supply in the normal operating mode.Type: GrantFiled: August 7, 2017Date of Patent: January 8, 2019Assignee: TRUMPF Huettinger GmbH + Co. KGInventor: Moritz Nitschke
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Publication number: 20170358429Abstract: A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply, and a data transfer connection operably coupling the two power supplies for data communication between the two power supplies. The first power supply is configured to: receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data. The first power supply can supply in the active backup mode to the plasma process the power having one or more characteristics that are substantially the same as those of the power provided by the second power supply in the normal operating mode.Type: ApplicationFiled: August 7, 2017Publication date: December 14, 2017Inventor: Moritz Nitschke
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Publication number: 20140159741Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.Type: ApplicationFiled: December 5, 2013Publication date: June 12, 2014Applicant: TRUMPF Huettinger GmbH + Co. KGInventors: Markus Bannwarth, Christian Fritsch, Ulrich Heller, Daniel Krausse, Rolf Merte, Moritz Nitschke, Peter Wiedemuth, Christian Bock, Michael Glueck, Thomas Kirchmeier, Ekkehard Mann, Krishna Kishore Nedunuri, Martin Steuber, Markus Winterhalter
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Patent number: 8735767Abstract: For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed.Type: GrantFiled: December 14, 2007Date of Patent: May 27, 2014Assignee: TRUMPF Huettinger GmbH + Co. KGInventors: Moritz Nitschke, Gerhard Zaehringer
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Patent number: 8110992Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.Type: GrantFiled: September 10, 2010Date of Patent: February 7, 2012Assignee: HUETTINGER Elektronik GmbH + Co. KGInventor: Moritz Nitschke
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Patent number: 8044595Abstract: A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: a. carrying out an arc detection for at least one of the power supplies; b. generating at least one signal relating to the arc detection and/or data relating to the arc detection; transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to one or more of the arc diverter devices associated with the other power supplies.Type: GrantFiled: May 26, 2009Date of Patent: October 25, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventor: Moritz Nitschke
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Patent number: 7995313Abstract: An arc discharge in a plasma process is detected using a method that includes detecting arc discharges by monitoring one or more characteristic values of the plasma process, and comparing at least a first characteristic value with a predefinable first threshold value (SW1). When it is determined that the at least first characteristic value reaches the first threshold value, a potential arc discharge is recognized and a first countermeasure is triggered to suppress the arc discharge. The method includes comparing at least a second characteristic value with a pre-definable second threshold value (SW2) that differs from the first threshold value, and when it is determined that the second characteristic value reaches the second threshold value, triggering a second countermeasure for suppressing the arc discharge. After the second countermeasure has been triggered, a renewed triggering of the second countermeasure is prevented during a blocking time (Tt).Type: GrantFiled: November 23, 2007Date of Patent: August 9, 2011Assignee: Huettinger Elektronik GmbH + Co. KGInventor: Moritz Nitschke
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Publication number: 20100327749Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.Type: ApplicationFiled: September 10, 2010Publication date: December 30, 2010Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventor: Moritz Nitschke
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Patent number: 7795817Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.Type: GrantFiled: November 21, 2007Date of Patent: September 14, 2010Assignee: HUETTINGER Elektronik GmbH + Co. KGInventor: Moritz Nitschke
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Patent number: 7782100Abstract: A full bridge that produces an alternating output signal can be driven by operating switching elements of the full bridge in each period in a switching sequence that determines the order of the activation and deactivation of the switching elements. The switching elements are switched in at least two different switching sequences, a first switching sequence is repeated n times before a second switching sequence is carried out, with n>1, or the switching elements are switched in at least three different switching sequences.Type: GrantFiled: February 23, 2009Date of Patent: August 24, 2010Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Martin Steuber, Moritz Nitschke
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Publication number: 20090289034Abstract: A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: a. carrying out an arc detection for at least one of the power supplies; b. generating at least one signal relating to the arc detection and/or data relating to the arc detection; transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to one or more of the arc diverter devices associated with the other power supplies.Type: ApplicationFiled: May 26, 2009Publication date: November 26, 2009Applicant: HUETTINGER Elektronik GmbH + Co. KGInventor: Moritz Nitschke
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Patent number: 7586099Abstract: A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of the VPG to a mains power supply, a mains input filter coupled to the mains connector, a voltage converter coupled to the mains input filter for generating an output signal, a voltage converter control input for connection to a voltage converter control, a shield that surrounds at least the voltage converter, the mains power supply, and the mains input filter, and a connection device that provides an electrical connection between the shield and the plasma chamber.Type: GrantFiled: March 30, 2006Date of Patent: September 8, 2009Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Thorsten Eyhorn, Moritz Nitschke, Peter Wiedemuth, Gerhard Zahringer
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Publication number: 20090219075Abstract: A full bridge that produces an alternating output signal can be driven by operating switching elements of the full bridge in each period in a switching sequence that determines the order of the activation and deactivation of the switching elements. The switching elements are switched in at least two different switching sequences, a first switching sequence is repeated n times before a second switching sequence is carried out, with n>1, or the switching elements are switched in at least three different switching sequences.Type: ApplicationFiled: February 23, 2009Publication date: September 3, 2009Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Martin Steuber, Moritz Nitschke
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Publication number: 20080257869Abstract: For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed.Type: ApplicationFiled: December 14, 2007Publication date: October 23, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventors: Moritz Nitschke, Gerhard Zaehringer
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Publication number: 20080122369Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.Type: ApplicationFiled: November 21, 2007Publication date: May 29, 2008Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KGInventor: Moritz Nitschke
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Publication number: 20080121517Abstract: An arc discharge in a plasma process is detected using a method that includes detecting arc discharges by monitoring one or more characteristic values of the plasma process, and comparing at least a first characteristic value with a predefinable first threshold value (SW1). When it is determined that the at least first characteristic value reaches the first threshold value, a potential arc discharge is recognized and a first countermeasure is triggered to suppress the arc discharge. The method includes comparing at least a second characteristic value with a pre-definable second threshold value (SW2) that differs from the first threshold value, and when it is determined that the second characteristic value reaches the second threshold value, triggering a second countermeasure for suppressing the arc discharge. After the second countermeasure has been triggered, a renewed triggering of the second countermeasure is prevented during a blocking time (Tt).Type: ApplicationFiled: November 23, 2007Publication date: May 29, 2008Inventor: MORITZ NITSCHKE
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Publication number: 20070241287Abstract: A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of the VPG to a mains power supply, a mains input filter coupled to the mains connector, a voltage converter coupled to the mains input filter for generating an output signal, a voltage converter control input for connection to a voltage converter control, a shield that surrounds at least the voltage converter, the mains power supply, and the mains input filter, and a connection device that provides an electrical connection between the shield and the plasma chamber.Type: ApplicationFiled: March 30, 2006Publication date: October 18, 2007Inventors: Thorsten Eyhorn, Moritz Nitschke, Peter Wiedemuth, Gerhard Zahringer