Abstract: The present disclosure provides compositions comprising encapsulated engineered bacteria. The bacteria may be engineered to act as sensors of biomarkers, such as inflammation, as well as to produce diagnostic or therapeutic agents.

Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.

Abstract: A method for imaging using a flatbed imaging system includes providing first imaging data to a first imaging source; providing second imaging data to a second imaging source; imaging a first beam from the first imaging source at a first height on a rotating multi-facet spinner; imaging a second beam from the second imaging source at a second height on the rotating multi-facet spinner; distributing the first beam on a first location on a printing plate; and distributing the second beam on a second location on a the printing plate.

Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.

Abstract: An imaging head for a flatbed imaging system includes a first rotating multi-facet spinner; a first set of long mirrors directed towards imaging media positioned on a flatbed surface wherein the first set mirrors is at a first distance from said media; a second set of long mirrors directed towards the imaging media wherein the second set of mirrors is at a second distance from said media; a first laser source configured to emit light on the spinner at a first height on the spinner wherein light emitted from the first height on the spinner is directed to the first set of mirrors; and a second laser source configured to emit light on the spinner at a second height on the spinner wherein light emitted from the second height on the spinner is directed to the second set of mirrors.

Abstract: A method for imaging using a flatbed imaging system includes providing first imaging data to a first imaging source; providing second imaging data to a second imaging source; imaging a first beam from the first imaging source at a first height on a rotating multi-facet spinner; imaging a second beam from the second imaging source at a second height on the rotating multi-facet spinner; distributing the first beam on a first location on a printing plate; and distributing the second beam on a second location on a the printing plate.

Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.

Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.

Abstract: An apparatus and system permitting simulated firing from any firearm including a bolt and/or rotating bolt as well as rifles, machine guns, sniper rifles and the like. In particular, the present invention relates to light emitting munitions, being used as part of a system for registering “hits” during dry-fire exercises and gaming with any hand-held firearm, without any change to either the feel, or the external dimensions of the firearms.

Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.

Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.