Patents by Inventor Moshe Markowitz

Moshe Markowitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems for providing illumination in optical metrology
    Patent number: 10203247
    Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: February 12, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
  • Systems for Providing Illumination in Optical Metrology
    Publication number: 20170146399
    Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
    Type: Application
    Filed: December 5, 2016
    Publication date: May 25, 2017
    Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
  • Systems for providing illumination in optical metrology
    Patent number: 9512985
    Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: December 6, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
  • Metrology systems and methods
    Patent number: 9080971
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: July 14, 2015
    Assignee: KLA-Tencor Corp.
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Metrology Systems and Methods
    Publication number: 20150036142
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Application
    Filed: October 16, 2014
    Publication date: February 5, 2015
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Metrology systems and methods
    Patent number: 8873054
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: October 28, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Metrology Systems and Methods
    Publication number: 20130229661
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Application
    Filed: April 17, 2013
    Publication date: September 5, 2013
    Applicant: KLA-Tencor Corporation
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Metrology systems and methods
    Patent number: 8441639
    Abstract: Various metrology systems and methods are provided.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: May 14, 2013
    Assignee: KLA-Tencor Corp.
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • METROLOGY SYSTEMS AND METHODS
    Publication number: 20110069312
    Abstract: Various metrology systems and methods are provided.
    Type: Application
    Filed: August 31, 2010
    Publication date: March 24, 2011
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem