Patents by Inventor MOSHE VANHOTSKER

MOSHE VANHOTSKER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical system and method for measuring parameters of patterned structures in micro-electronic devices
    Patent number: 11512943
    Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: November 29, 2022
    Assignee: NOVA LTD
    Inventors: Danny Grossman, Shahar Gov, Moshe Vanhotsker, Guy Engel, Elad Dotan
  • INTEGRATED MEASUREMENT SYSTEM
    Publication number: 20210396511
    Abstract: A measurement system is presented configured for integration with a processing equipment for applying optical measurements to a structure.
    Type: Application
    Filed: November 17, 2019
    Publication date: December 23, 2021
    Applicant: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Elad DOTAN, Moshe VANHOTSKER, Shimon YALOV, Valery DEICH, Roi RINGEL, Beni SHULMAN, Yossi BAR ON, Shahar BASSON
  • OPTICAL SYSTEM AND METHOD FOR MEASURING PARAMETERS OF PATTERNED STRUCTURES IN MICRO-ELECTRONIC DEVICES
    Publication number: 20190339068
    Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.
    Type: Application
    Filed: November 23, 2016
    Publication date: November 7, 2019
    Inventors: DANNY GROSSMAN, SHAHAR GOV, MOSHE VANHOTSKER, GUY ENGEL, ELAD DOTAN