Patents by Inventor Motohide Ukiana

Motohide Ukiana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8581484
    Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.
    Type: Grant
    Filed: May 14, 2010
    Date of Patent: November 12, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
  • Publication number: 20120126684
    Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.
    Type: Application
    Filed: May 14, 2010
    Publication date: May 24, 2012
    Inventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
  • Patent number: 7146872
    Abstract: Provision of a 3-DOF micro manipulator easy to operate and capable of executing accurate positioning, wherein the link mechanisms of the micro manipulator whose main operation is parallel 3-DOF operation are implemented by cutting, folding, and moding a sheet of metal plate. Base and end effector are connected by three link mechanisms. The three link mechanisms are manufactured by cutting and folding a flexible plate material, and are equipped with plate-like arm portions each having a spread in the axially peripheral direction of the end effector, with hinge portions that are formed longitudinally across each arm portion in order to function as revolving joints R, and with a hinge portion also formed at the middle position of the arm portion in order to function as revolving joints R. Also, a parallelogrammatic link is formed between one longitudinal end of the arm portion and the middle portion thereof in order to function as a prismatic joint pair P.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: December 12, 2006
    Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Kazuhiro Morita, Motohide Ukiana, Kazuhiro Fujii, Shigeto Isakozawa, Hidemi Koike, Tamio Tanikawa
  • Publication number: 20030056364
    Abstract: Provision of a 3-DOF micro manipulator easy to operate and capable of executing accurate positioning, wherein the link mechanisms of the micro manipulator whose main operation is parallel 3-DOF operation are implemented by cutting, folding, and molding a sheet of metal plate.
    Type: Application
    Filed: August 8, 2002
    Publication date: March 27, 2003
    Inventors: Kazuhiro Morita, Motohide Ukiana, Kazuhiro Fujii, Shigeto Isakozawa, Hidemi Koike, Tamio Tanikawa
  • Patent number: 5783830
    Abstract: A sample evaluation/process observation system includes a common sample stage which accommodates a plurality of samples to be processed. The common sample stage is provided with a processing/observing notch and also with a movement mechanism. The movement mechanism functions to sequentially move the plurality of samples to the notch to cause the samples to be exposed to a predetermined processing beam and observing beam. The system further includes a beam processing device in which the common sample stage can be mounted and which functions to irradiate the predetermined processing beam on the plurality of samples through the notch to thereby sequentially perform beam processing operation over the samples. The system further includes a beam observation device in which the common sample stage can be mounted and which functions to irradiate the predetermined observing beam on the plurality of samples through the notch to sequentially observe and evaluate shapes of the plurality of samples.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: July 21, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Hirose, Hidemi Koike, Shigeto Isakozawa, Yuji Sato, Mikio Ichihashi, Motohide Ukiana
  • Patent number: 5012092
    Abstract: Method and apparatus for fine movement of a specimen stage of an electron microscope wherein a value of enlargement magnification M of the electron microscope is set, a manipulation unit adapted to move an image enlarged by the electron microscope in X or Y direction is then manipulated; a pulse signal PX2 or PY2 which accords with a manipulation amount of the manipulation unit is delivered, the specimen stage is moved in the X or Y direction in accordance with the delivered pulse signal, a pulse signal PX1 and PY1 which accords with a moving distance of the specimen stage in the X or Y direction is delivered, and the operation of movement of the specimen stage is stopped when the relation represented by PX2.multidot.K/M=PX1 or the relation represented by PY2.multidot.K/M=PY1 stands, where K is a constant.
    Type: Grant
    Filed: December 26, 1989
    Date of Patent: April 30, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Kobayashi, Shigeru Izawa, Motohide Ukiana
  • Patent number: 4227080
    Abstract: A specimen holder holding a frozen specimen is adapted to engage the opened end of a recess in a specimen support, such that the frozen specimen is exposed to the inside of the recess. The mutually engaging specimen holder and the specimen support are shifted to a specimen chamber. In the specimen chamber, the specimen holder is separated from the specimen support and is received by a specimen receiving chamber. The specimen holder received by the specimen receiving member can be moved together with the latter to a specimen treating chamber. Cooling means for cooling the specimen receiving member is unitarily secured to the specimen receiving member, so as to be moved together with the specimen receiving member.
    Type: Grant
    Filed: December 4, 1978
    Date of Patent: October 7, 1980
    Assignee: Hitachi, Ltd.
    Inventors: Akimitsu Okura, Syobu Saito, Motohide Ukiana