Patents by Inventor Motohiro Kono
Motohiro Kono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11986867Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.Type: GrantFiled: September 10, 2020Date of Patent: May 21, 2024Assignee: SCREEN Holdings Co., Ltd.Inventors: Akira Horikoshi, Shohei Nakamura, Shigeru Takatsuji, Motohiro Kono, Takahiro Kimura, Kenji Kobayashi
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Patent number: 11267729Abstract: An in-liquid plasma generation device includes a housing which holds a liquid in an internal space, a gas supply tube which includes an opening in the internal space and discharges a gas into the liquid through the opening, a first electrode which has projecting part projecting into the internal space via the opening from inside of the gas supply tube, the projecting part including a conductor covered by a dielectric, a second electrode which surrounds the projecting part of the first electrode and includes a conductor isolated from the liquid by a dielectric, and a voltage applier which applies a voltage to between the first electrode and the second electrode. A space between the projecting part and the second electrode is a flow passage in which the gas discharged from the opening flows.Type: GrantFiled: May 22, 2018Date of Patent: March 8, 2022Assignee: SCREEN HOLDINGS CO., LTD.Inventors: Akira Horikoshi, Shohei Nakamura, Shigeru Takatsuji, Motohiro Kono
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Publication number: 20210086238Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.Type: ApplicationFiled: September 10, 2020Publication date: March 25, 2021Applicant: SCREEN Holdings Co., Ltd.Inventors: Akira HORIKOSHI, Shohei NAKAMURA, Shigeru TAKATSUJI, Motohiro KONO, Takahiro KIMURA, Kenji KOBAYASHI
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Publication number: 20200407247Abstract: An in-liquid plasma generation device includes a housing which holds a liquid in an internal space, a gas supply tube which includes an opening in the internal space and discharges a gas into the liquid through the opening, a first electrode which has projecting part projecting into the internal space via the opening from inside of the gas supply tube, the projecting part including a conductor covered by a dielectric, a second electrode which surrounds the projecting part of the first electrode and includes a conductor isolated from the liquid by a dielectric, and a voltage applier which applies a voltage to between the first electrode and the second electrode. A space between the projecting part and the second electrode is a flow passage in which the gas discharged from the opening flows.Type: ApplicationFiled: May 22, 2018Publication date: December 31, 2020Inventors: Akira HORIKOSHI, Shohei NAKAMURA, Shigeru TAKATSUJI, Motohiro KONO
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Patent number: 9766132Abstract: A measuring apparatus measure the amount of a metal catalyst supported on a sample that has a membrane of a metal catalyst layer containing the metal catalyst. The measuring apparatus includes a terahertz-wave emitting part that emits a terahertz wave in the range of 0.01 to 10 THz to the sample, a transmitted-terahertz-wave detection part that detects the electric field intensity of a transmitted terahertz wave that has passed through the sample, a storage that stores correlation information acquired in advance and indicating the correlation between the amount of the metal catalyst supported and the electric field intensity of the transmitted terahertz wave, and an amount-of-catalyst-supported acquisition module that acquires the amount of the metal catalyst supported on the sample, on the basis of the correlation information and the electric field intensity of the transmitted terahertz wave detected by the transmitted-terahertz-wave detection part.Type: GrantFiled: February 8, 2016Date of Patent: September 19, 2017Assignee: SCREEN Holdings Co., Ltd.Inventors: Yasuhiro Takase, Hidetoshi Nakanishi, Motohiro Kono, Kazuo Kinose
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Publication number: 20160245703Abstract: A measuring apparatus measure the amount of a metal catalyst supported on a sample that has a membrane of a metal catalyst layer containing the metal catalyst. The measuring apparatus includes a terahertz-wave emitting part that emits a terahertz wave in the range of 0.01 to 10 THz to the sample, a transmitted-terahertz-wave detection part that detects the electric field intensity of a transmitted terahertz wave that has passed through the sample, a storage that stores correlation information acquired in advance and indicating the correlation between the amount of the metal catalyst supported and the electric field intensity of the transmitted terahertz wave, and an amount-of-catalyst-supported acquisition module that acquires the amount of the metal catalyst supported on the sample, on the basis of the correlation information and the electric field intensity of the transmitted terahertz wave detected by the transmitted-terahertz-wave detection part.Type: ApplicationFiled: February 8, 2016Publication date: August 25, 2016Inventors: Yasuhiro TAKASE, Hidetoshi NAKANISHI, Motohiro KONO, Kazuo KINOSE
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Patent number: 7795886Abstract: In a surface voltmeter (1), a surface voltage on a measurement area on a semiconductor substrate (9) on which an insulating film is formed is measured while applying light to the measurement area. With this operation, a voltage induced on a main body of the substrate (9) by charge which is charged on a surface of the insulating film is balanced out. Consequently, it is possible to measure a surface voltage on the measurement area with high accuracy. Since an electrode wiring (164) used for application of an electrode voltage to an electrode (12) extends from the electrode (12) in a direction away from the substrate (9) along a vibration direction, it is possible to prevent influences of noises caused by vibration of the electrode wiring (164) in vibrating the electrode (12) and to measure the surface voltage on the measurement area more accurately.Type: GrantFiled: March 25, 2008Date of Patent: September 14, 2010Assignee: Dainippon Screen Mgf. Co., Ltd.Inventors: Motohiro Kono, Toshikazu Kitajima, Kazuhiko Fuse, Yoshiyuki Nakazawa
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Patent number: 7598746Abstract: A surface voltmeter has a stage having a conductive surface, a vibrating electrode, a vibration part, and an elevation mechanism. While vibrating the vibrating electrode, displacement current from the conductive surface is acquired. A control part controls electrode voltage so that the displacement current becomes a value specified by a computer, and acquires a relationship between the displacement current and the electrode voltage while changing the displacement current. Acquisition of the relationship is performed a plurality of times while changing distance between the vibrating electrode and an object, the electrode voltage which is independent from the distance between the vibrating electrode and the object is obtained as reference voltage, and surface voltage on the object is obtained on the basis of the reference voltage.Type: GrantFiled: March 9, 2007Date of Patent: October 6, 2009Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Motohiro Kono, Kazuhiko Fuse, Yoshiyuki Nakazawa
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Publication number: 20090019722Abstract: In a body of a film-thickness measuring apparatus (1), an organic contamination remover (3) for removing organic contamination adsorbed onto a substrate (9) is provided. The organic contamination remover (3) includes a chamber body (31), an interior of which is kept clean. In the chamber body (31), a hot plate (32) for heating the substrate, a cooling plate (33) for cooling the substrate, and a transfer arm (34) for moving the substrate (9) from the hot plate (32) to the cooling plate (33) in the chamber body 31, are provided. With this structure, it is possible to keep the substrate (9) in a clean atmosphere within the chamber body (31), to thereby suppress re-adsorption of organic contamination onto the substrate during a time period from a time when organic contamination adsorbed onto the substrate (9) is removed to a time when cooling is completed.Type: ApplicationFiled: July 16, 2008Publication date: January 22, 2009Applicant: DAINIPPON SCREEN MFG. CO., LTD.Inventors: Yoshiyuki Nakazawa, Motohiro Kono, Toshikazu Kitajima, Daisuke Iso
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Publication number: 20080238434Abstract: In a surface voltmeter (1), a surface voltage on a measurement area on a semiconductor substrate (9) on which an insulating film is formed is measured while applying light to the measurement area. With this operation, a voltage induced on a main body of the substrate (9) by charge which is charged on a surface of the insulating film is balanced out. Consequently, it is possible to measure a surface voltage on the measurement area with high accuracy. Since an electrode wiring (164) used for application of an electrode voltage to an electrode (12) extends from the electrode (12) in a direction away from the substrate (9) along a vibration direction, it is possible to prevent influences of noises caused by vibration of the electrode wiring (164) in vibrating the electrode (12) and to measure the surface voltage on the measurement area more accurately.Type: ApplicationFiled: March 25, 2008Publication date: October 2, 2008Inventors: Motohiro Kono, Toshikazu Kitajima, Kazuhiko Fuse, Yoshiyuki Nakazawa
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Patent number: 7427520Abstract: A memory (43) of a control unit (4) stores correction data (81) indicating a relationship between a decrement in a measurement value of a film thickness by removal of organic contamination adsorbed onto a substrate and an amount of adsorbed organic contamination corresponding to a difference between a true film thickness and the measurement. The difference is caused by organic contamination adsorbed onto the substrate before removal of organic contamination. In a film-thickness measuring apparatus (1), a calculating/measuring part 41 obtains a first measurement value of a film thickness on a substrate (9) using an ellipsometer (23), and further obtains a second measurement value which is affected by remaining organic contamination after organic contamination adsorbed onto the substrate (9) is removed by an organic contamination remover (3).Type: GrantFiled: March 3, 2005Date of Patent: September 23, 2008Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Motohiro Kono, Yoshiyuki Nakazawa, Toshikazu Kitajima
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Patent number: 7375537Abstract: A relative-dielectric-constant measuring apparatus according to the present invention includes an ellipsometer and a capacitance measuring part. The ellipsometer allows non-contact measurements of the film thickness and optical constants of an insulation film formed on the upper surface of a wafer. The capacitance measuring part, on the other hand, allows non-contact measurements of the gap between the insulation film and an electrode and accumulation capacitance. The relative-dielectric-constant measuring apparatus can calculate the relative dielectric constant of the insulation film based on the measured film thickness, gap, and accumulation capacitance. Thus, the relative dielectric constant of the insulation film can be determined without contact and with high precision.Type: GrantFiled: March 24, 2005Date of Patent: May 20, 2008Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Toshikazu Kitajima, Motohiro Kono
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Publication number: 20070216418Abstract: A surface voltmeter comprises a stage having a conductive surface, a vibrating electrode, a vibration part, and an elevation mechanism. While vibrating the vibrating electrode, displacement current from the conductive surface is acquired. A control part controls electrode voltage so that the displacement current becomes a value specified by a computer, and acquires a relationship between the displacement current and the electrode voltage while changing the displacement current. Acquisition of the relationship is performed a plurality of times while changing distance between the vibrating electrode and an object, the electrode voltage which is independent from the distance between the vibrating electrode and the object is obtained as reference voltage, and surface voltage on the object is obtained on the basis of the reference voltage.Type: ApplicationFiled: March 9, 2007Publication date: September 20, 2007Inventors: Motohiro Kono, Kazuhiko Fuse, Yoshiyuki Nakazawa
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Publication number: 20050239224Abstract: A relative-dielectric-constant measuring apparatus according to the present invention includes an ellipsometer and a capacitance measuring part. The ellipsometer allows non-contact measurements of the film thickness and optical constants of an insulation film formed on the upper surface of a wafer. The capacitance measuring part, on the other hand, allows non-contact measurements of the gap between the insulation film and an electrode and accumulation capacitance. The relative-dielectric-constant measuring apparatus can calculate the relative dielectric constant of the insulation film based on the measured film thickness, gap, and accumulation capacitance. Thus, the relative dielectric constant of the insulation film can be determined without contact and with high precision.Type: ApplicationFiled: March 24, 2005Publication date: October 27, 2005Inventors: Toshikazu Kitajima, Motohiro Kono
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Publication number: 20050206911Abstract: A memory (43) of a control unit (4) stores correction data (81) indicating a relationship between a decrement in a measurement value of a film thickness by removal of organic contamination adsorbed onto a substrate and an amount of adsorbed organic contamination corresponding to a difference between a true film thickness and the measurement. The difference is caused by organic contamination adsorbed onto the substrate before removal of organic contamination. In a film-thickness measuring apparatus (1), a calculating/measuring part 41 obtains a first measurement value of a film thickness on a substrate (9) using an ellipsometer (23), and further obtains a second measurement value which is affected by remaining organic contamination after organic contamination adsorbed onto the substrate (9) is removed by an organic contamination remover (3).Type: ApplicationFiled: March 3, 2005Publication date: September 22, 2005Inventors: Motohiro Kono, Yoshiyuki Nakazawa, Toshikazu Kitajima
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Publication number: 20050198857Abstract: In a body of a film-thickness measuring apparatus (1), an organic contamination remover (3) for removing organic contamination adsorbed onto a substrate (9) is provided. The organic contamination remover (3) includes a chamber body (31), an interior of which is kept clean. In the chamber body (31), a hot plate (32) for heating the substrate, a cooling plate (33) for cooling the substrate, and a transfer arm (34) for moving the substrate (9) from the hot plate (32) to the cooling plate (33) in the chamber body 31, are provided. With this structure, it is possible to keep the substrate (9) in a clean atmosphere within the chamber body (31), to thereby suppress re-adsorption of organic contamination onto the substrate during a time period from a time when organic contamination adsorbed onto the substrate (9) is removed to a time when cooling is completed.Type: ApplicationFiled: March 3, 2005Publication date: September 15, 2005Inventors: Yoshiyuki Nakazawa, Motohiro Kono, Toshikazu Kitajima, Daisuke Iso
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Patent number: 6915232Abstract: A non-contact method of measuring the thickness of an insulator film on a semiconductor substrate includes: (i) charging the insulator film surface in a non-contact manner; (ii) obtaining a first flat band voltage by conducting, prior to the charging processing step, a C-V measurement on the semiconductor substrate; obtaining a second flat band voltage by conducting, after the charging processing step, a C-V measurement on the semiconductor substrate; and calculating, based on a difference between the first and second flat band voltages, the charge amount given to the insulator film surface by the charging processing step; (iii) then measuring the insulator film surface potential and (iv) calculating the insulator film thickness based on the charge amount measured at the charge amount measuring step and on the surface potential measured at the surface potential measuring step.Type: GrantFiled: July 21, 2003Date of Patent: July 5, 2005Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Toshikazu Kitajima, Motohiro Kono
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Publication number: 20040019442Abstract: A method of measuring the thickness of an insulator film formed on one surface of a semiconductor substrate, in a non-contact manner with respect to the insulator film.Type: ApplicationFiled: July 21, 2003Publication date: January 29, 2004Applicant: Dainippon Screen Mfg. Co., Ltd.Inventors: Toshikazu Kitajima, Motohiro Kono
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Patent number: 6278267Abstract: The method obtains a first C-V curve prior to irradiation with light and a second C-V curve after the irradiation with light. The method determines the amount of the intra-film impurity ions in an insulating film in the state prior to the irradiation with light, based on the first and the second C-V curves.Type: GrantFiled: August 14, 1998Date of Patent: August 21, 2001Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Hiroshi Okada, Sadao Hirae, Motohiro Kono
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Patent number: 6037781Abstract: C-V measurement is first carried out with respect to a target area on a semiconductor wafer using a measuring electrode located over the target area. Parameters used for C-t measurement of the target area (for example, applied voltages Vacc and Vmeas or a recovery time Tr) are then obtained from a C-V characteristic obtained by the C-V measurement. C-t measurement is subsequently carried out with respect to the target area using these parameters.Type: GrantFiled: March 23, 1998Date of Patent: March 14, 2000Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Motohiro Kono, Tatsufumi Kusuda