Patents by Inventor Motohiro SHIRATANI
Motohiro SHIRATANI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11796912Abstract: A radiation-sensitive composition contains: particles that include a metal oxide, a cation that includes a metal, an anion. The anion is preferably a conjugated base of an acid and the acid has preferably a pKa of no greater than 3. The content of the particles in terms of solid content equivalent is preferably no less than 50% by mass, and more preferably no less than 70% by mass. The hydrodynamic radius of the particles as determined by a dynamic light scattering analysis is preferably no greater than 10 nm. The total content of the cation and the anion with respect to 100 parts by mass of the particles is preferably no less than 5 parts by mass. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof.Type: GrantFiled: February 27, 2019Date of Patent: October 24, 2023Assignee: JSR CORPORATIONInventor: Motohiro Shiratani
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Patent number: 11745216Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.Type: GrantFiled: June 23, 2022Date of Patent: September 5, 2023Assignee: JSR CORPORATIONInventors: Ryo Kumegawa, Sosuke Osawa, Miki Tamada, Ken Maruyama, Motohiro Shiratani
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Publication number: 20230259032Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.Type: ApplicationFiled: April 25, 2023Publication date: August 17, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Hiroyuki KOMATSU, Motohiro SHIRATANI, Ken MARUYAMA, Sosuke OSAWA
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Publication number: 20230203229Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.Type: ApplicationFiled: February 10, 2023Publication date: June 29, 2023Applicant: JSR CORPORATIONInventors: Miki TAMADA, Ryo KUMEGAWA, Motohiro SHIRATANI, Hiroyuki KOMATSU, Ken MARUYAMA, Sosuke OSAWA
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Publication number: 20230103682Abstract: Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).Type: ApplicationFiled: January 12, 2021Publication date: April 6, 2023Applicant: JSR CORPORATIONInventors: Kazuki KASAHARA, Katsuaki NISHIKORI, Sosuke OSAWA, Miki TAMADA, Motohiro SHIRATANI
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Patent number: 11603480Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.Type: GrantFiled: August 1, 2019Date of Patent: March 14, 2023Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Motohiro Shiratani, Miki Tamada
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Publication number: 20230027151Abstract: A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Y1 is a single bond, —CO—NR2—, a divalent aromatic ring group, a divalent group containing —O—, or a divalent group containing —CO—NR2—. A1 is a single bond, —O—, —S—, or —NR3—. R1 is a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.Type: ApplicationFiled: June 23, 2022Publication date: January 26, 2023Applicant: JSR CORPORATIONInventors: Ryo KUMEGAWA, Sosuke Osawa, Miki Tamada, Ken Maruyama, Motohiro Shiratani
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Publication number: 20220259741Abstract: A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including —B(OR)2; a group including —PO(OR)2; and a group including —P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the group (X) at an end of a main chain thereof or at an end of a side chain thereof.Type: ApplicationFiled: May 3, 2022Publication date: August 18, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro Shiratani
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Publication number: 20220145113Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.Type: ApplicationFiled: January 25, 2022Publication date: May 12, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro SHIRATANI
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Patent number: 11319388Abstract: A radiation-sensitive resin composition contains: a polymer having a first structural unit represented by formula (1), and a second structural unit represented by formula (2) and having an acid-labile group. A first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80° C. and no greater than 140° C. for a time period of 1 minute, and the second acid, to be generated from the second acid generating agent, does not substantially disassociate the acid-labile group under the condition. The polymer is synthesized by RAFT, ATRP, or NMP, and a RAFT agent is at least one selected from the group consisting of a mercaptocarboxylic acid ester, a disulfide, a dithioester, a xanthate, a dithiocarbamate, and a trithiocarbonate.Type: GrantFiled: September 7, 2020Date of Patent: May 3, 2022Assignee: JSR CORPORATIONInventors: Ken Maruyama, Yoshiki Nonoyama, Takuo Sone, Motohiro Shiratani
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Publication number: 20220089809Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.Type: ApplicationFiled: December 3, 2021Publication date: March 24, 2022Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro SHIRATANI, Tatsuya SAKAI
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Patent number: 11270883Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.Type: GrantFiled: September 11, 2020Date of Patent: March 8, 2022Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Motohiro Shiratani
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Patent number: 11204552Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a ? ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10?28 m3.Type: GrantFiled: May 24, 2018Date of Patent: December 21, 2021Assignee: JSR CORPORATIONInventors: Tomoki Nagai, Takehiko Naruoka, Ken Maruyama, Motohiro Shiratani, Hisashi Nakagawa
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Publication number: 20210082689Abstract: A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.Type: ApplicationFiled: September 11, 2020Publication date: March 18, 2021Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro SHIRATANI
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Publication number: 20200407476Abstract: An object of the present invention is to provide a radiation-sensitive resin composition being superior in each of an inhibitory ability of defects, LWR performance, and sensitivity. An aspect of the present invention is a radiation-sensitive resin composition containing: a polymer having a first structural unit represented by the following formula (1), and a second structural unit represented by the following formula (2) and having an acid-labile group; a first acid generating agent which generates a first acid upon irradiation with a radioactive ray; and a second acid generating agent which generates a second acid upon irradiation with a radioactive ray, wherein the first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80° C. and no greater than 140° C.Type: ApplicationFiled: September 7, 2020Publication date: December 31, 2020Applicant: JSR CORPORATIONInventors: Ken MARUYAMA, Yoshiki Nonoyama, Takuo Sone, Motohiro Shiratani
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Publication number: 20200356000Abstract: A radiation-sensitive composition contains: a metal oxide having a first structural unit represented by formula (1), formula (2) or a combination thereof, and a second structural unit represented by formula (3); and a solvent. In the formulae (1) to (3), M1, M2 and M3 each independently represent germanium, tin or lead; and R1, R2 and R3 each independently represent a monovalent organic group having 1 to 40 carbon atoms which bonds to M1 or M2 via a carbon atom. A proportion of the first structural unit with respect to total structural units constituting the metal oxide is preferably no less than 50 mol %.Type: ApplicationFiled: July 23, 2019Publication date: November 12, 2020Applicant: JSR CORPORATIONInventors: Shinya MINEGISHI, Motohiro SHIRATANI, Hisashi NAKAGAWA
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Patent number: 10725376Abstract: A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R1 represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents —COOH. In a case where n is 2 to 4, X represents —OH, —COOH, —NCO, —NHRa, —COORA or —CO—C(RL)2—CO—RA.Type: GrantFiled: March 16, 2017Date of Patent: July 28, 2020Assignee: JSR CORPORATIONInventors: Hisashi Nakagawa, Takehiko Naruoka, Motohiro Shiratani
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Publication number: 20200040209Abstract: A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.Type: ApplicationFiled: August 1, 2019Publication date: February 6, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Motohiro Shiratani, Miki Tamada
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Publication number: 20200041902Abstract: A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a ? ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10?28 m3.Type: ApplicationFiled: May 24, 2018Publication date: February 6, 2020Applicant: JSR CORPORATIONInventors: Tomoki NAGAI, Takehiko Naruoka, Ken Maruyama, Motohiro Shiratani, Hisashi Nakagawa
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Publication number: 20200013617Abstract: A substrate treatment method includes: overlaying a film on a surface of a substrate which includes a first region including a metal atom in a surface layer thereof, using a directed self-assembling material which contains a compound having no less than 6 carbon atoms and including at least one cyano group. After the overlaying, the film on a region other than the first region is removed. After the removing, a pattern principally containing a metal oxide is formed by an Atomic Layer Deposition process or a Chemical Vapor Deposition process on the region other than the first region, of the surface of the substrate.Type: ApplicationFiled: July 8, 2019Publication date: January 9, 2020Applicant: JSR CORPORATIONInventors: Hiroyuki KOMATSU, Miki TAMADA, Hitoshi OSAKI, Motohiro SHIRATANI, Tomoki NAGAI