Patents by Inventor Motokatsu Imai
Motokatsu Imai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9846371Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: April 27, 2015Date of Patent: December 19, 2017Assignee: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20170329234Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: ApplicationFiled: July 31, 2017Publication date: November 16, 2017Applicant: NIKON CORPORATIONInventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hiroyuki NAGASAKA, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
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Patent number: 9268237Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: January 30, 2013Date of Patent: February 23, 2016Assignee: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Patent number: 9235139Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: January 30, 2013Date of Patent: January 12, 2016Assignee: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20150301457Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: ApplicationFiled: April 27, 2015Publication date: October 22, 2015Applicant: Nikon CorporationInventors: Soichi OWA, Nobutaka MAGOME, Shigeru HIRUKAWA, Yoshihiko KUDO, Jiro INOUE, Hirotaka KOHNO, Masahiro NEI, Motokatsu IMAI, Hiroyuki NAGASAKA, Kenichi SHIRAISHI, Yasufumi NISHII, Hiroaki TAKAIWA
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Patent number: 9019467Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: January 30, 2013Date of Patent: April 28, 2015Assignee: Nikon CorporationInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Patent number: 8797506Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: GrantFiled: August 22, 2012Date of Patent: August 5, 2014Assignee: Nikon CorporationInventors: Motokatsu Imai, Susumu Makinouchi
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Patent number: 8384880Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: September 10, 2008Date of Patent: February 26, 2013Assignee: Nikon CorporationInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20120320350Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: ApplicationFiled: August 22, 2012Publication date: December 20, 2012Applicant: NIKON CORPORATIONInventors: Motokatsu IMAI, Susumu MAKINOUCHI
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Patent number: 8272544Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: GrantFiled: March 21, 2011Date of Patent: September 25, 2012Assignee: Nikon CorporationInventors: Motokatsu Imai, Susumu Makinouchi
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Patent number: 8208117Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: GrantFiled: September 10, 2008Date of Patent: June 26, 2012Assignee: Nikon CorporationInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20110189613Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: ApplicationFiled: March 21, 2011Publication date: August 4, 2011Applicant: NIKON CORPORATIONInventors: Motokatsu Imai, Susumu Makinouchi
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Patent number: 7932996Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: GrantFiled: April 20, 2006Date of Patent: April 26, 2011Assignee: Nikon CorporationInventors: Motokatsu Imai, Susumu Makinouchi
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Publication number: 20090015808Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: ApplicationFiled: September 10, 2008Publication date: January 15, 2009Applicant: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20090015816Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.Type: ApplicationFiled: September 10, 2008Publication date: January 15, 2009Applicant: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20070002299Abstract: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.Type: ApplicationFiled: April 20, 2006Publication date: January 4, 2007Applicant: NIKON CORPORATIONInventors: Motokatsu Imai, Susumu Makinouchi
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Publication number: 20060227312Abstract: In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.Type: ApplicationFiled: June 8, 2006Publication date: October 12, 2006Applicant: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Publication number: 20060139614Abstract: In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.Type: ApplicationFiled: December 9, 2005Publication date: June 29, 2006Applicant: NIKON CORPORATIONInventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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Patent number: 6107621Abstract: Each component of a modular encoder can be formed so as to be fixed to a rotary shaft of a rotating unit in a horizontal direction (a direction of a shaft line of a rotary shaft). Consequently, the modular encoder can easily be assembled and fixed, and reliability of fixation can be enhanced at the same time. In addition, the modular encoder has an elliptical shape so that a size thereof can be reduced in a direction in which a dimension should be decreased. Furthermore, if the holding member is rotatably fitted in the locking member in such a manner that the holding member can be rotated around the rotary shaft of the rotating unit, a sign plate can easily be aligned.Type: GrantFiled: July 29, 1999Date of Patent: August 22, 2000Assignee: Kawasaki Jukogyo Kabushiki KaishaInventors: Motokatsu Imai, Kou Ohno, Yasuhiko Hashimoto, Shigeki Yamauchi
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Patent number: 5663557Abstract: A disclosed multiple rotating absolute encoder comprises an encoding plate with a first pattern and a second pattern formed thereon, a first detection unit for reading the first pattern and outputting an information in one rotation of the encoding plate, a second detection unit for reading the second pattern and outputting a first rotation information of the encoding plate, a calculation unit for calculating a second rotation data based on the information in one rotation and the first rotation data, a selection unit for monitoring a rotation speed of the encoding plate and selecting either the first rotation data or the second rotation data in accordance with the rotation speed, and a data calculation unit for calculating rotation information of the encoding plate on the basis of either the first rotation data or the second rotation data selected by the selection unit and the information in one rotation.Type: GrantFiled: July 12, 1995Date of Patent: September 2, 1997Assignee: Nikon CorporationInventors: Tohru Morita, Kou Ohno, Motokatsu Imai, Yuuji Yamazaki