Patents by Inventor Motonobu Kawarada
Motonobu Kawarada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 6094191Abstract: A keyboard including a housing unit for slidably supporting a key top; and a support panel unit carrying a switch to be operated by the key top. The housing unit can move between a first position apart from the support panel unit and a second position close to the the support panel unit, and the first position is such that the key top vertically shifting from but confronting the switch, when pressed, can operate the switch, and the second position is such that the key top being horizontally deviated from the switch, even if pressed, cannot operate the switch. The housing panel may support the elastic member for supporting the key top upon a main surface thereof, a first horizontal end of the elastic member may be fixed to the housing panel, and a second horizontal end opposite the first end of the elastic member may be movable in the horizontal direction.Type: GrantFiled: March 14, 1997Date of Patent: July 25, 2000Assignee: Fujitsu LimitedInventors: Goro Watanabe, Hideyuki Motoyama, Motonobu Kawarada
-
Patent number: 5565249Abstract: A process for gas phase synthesis of diamond using a DC plasma jet where a plasma jet generated by DC arc discharge using a DC plasma torch is made to strike a substrate and grow diamond on the substrate, wherein use is made of a plurality of plasma torch anodes, these are arranged coaxially in a telescoped structure, a magnetic field is applied to these in accordance with need to cause the arc to rotate or the electrode is rotated so as to perform gas phase synthesis of diamond.Type: GrantFiled: May 7, 1993Date of Patent: October 15, 1996Assignee: Fujitsu LimitedInventors: Kazuaki Kurihara, Kenichi Sasaki, Tsukasa Itani, Motonobu Kawarada
-
Patent number: 5538765Abstract: A process for producing diamond includes a step of bringing a columnar cathode and a tubular pilot anode provided concentrically around the cathode, into proximity to a plasma jetting port of a front end portion of a tubular main anode provided concentrically around the pilot anode. According to the process, a voltage is applied across the cathode and the pilot anode to convert a pilot gas to the form of a plasma. Then, the cathode is moved away from the pilot anode along a common axis. The process also includes the step of holding the discharge voltage between the cathode and the pilot anode at a first preselected voltage, and then applying voltage across the cathode and the main anode to convert a main gas to the form of a plasma. Subsequently, at least the pilot anode is moved away from the main anode along the common axis while maintaining the discharge voltage between the cathode and the pilot anode at the first preselected voltage.Type: GrantFiled: April 5, 1995Date of Patent: July 23, 1996Assignee: Fujitsu Ltd.Inventors: Kazuaki Kurihara, Kenichi Sasaki, Tsukasa Itani, Motonobu Kawarada
-
Patent number: 5492770Abstract: A diamond film is formed on a surface of a substrate. The diamond film is attached securely to the substrate by forming a first layer on the surface comprising a mixture of a main component of the substrate and a sintering reinforcement agent for diamond, then forming a second layer comprising a mixture of said agent and diamond on said first layer, and finally forming the diamond film on the second layer.Type: GrantFiled: November 16, 1993Date of Patent: February 20, 1996Assignee: Fujitsu LimitedInventors: Motonobu Kawarada, Kazuaki Kurihara
-
Patent number: 5403399Abstract: An apparatus for a vapor deposition of diamond by:effecting an arc discharge while feeding a discharge gas between an anode and a cathode of a thermal plasma chemical vapor deposition device;radicalizing a gaseous carbon compound by feeding the gaseous carbon compound to a generated plasma jet; andpermitting said radicalized plasma jet to impinge on a substrate to be treated, whereby a film of diamond is formed on said substrate.Type: GrantFiled: June 29, 1992Date of Patent: April 4, 1995Assignee: Fujitsu LimitedInventors: Kazuaki Kurihara, Kenichi Sasaki, Motonobu Kawarada, Nagaaki Koshino
-
Patent number: 5382293Abstract: An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode of opposite polarity positioned in the nozzle. The apparatus additionally includes a power source for applying a direct current voltage between the electrodes. A gas is fed between the electrodes as a direct current voltage is applied thereto, whereby the gas is formed into a thermal plasma which is jetted through the nozzle. A starting gas feed system is included for feeding gaseous starting compounds for vapor phase deposition to the plasma jet and a powder supplying pipe is provided for feeding a metal powder between the electrodes.Type: GrantFiled: July 28, 1993Date of Patent: January 17, 1995Assignee: Fujitsu LimitedInventors: Motonobu Kawarada, Kazuaki Kurihara, Ken-ichi Sasaki, Akitomo Teshima, Nagaaki Koshino
-
Patent number: 5368897Abstract: A method for vapor deposition of diamond by effecting an arc discharge while feeding a discharge gas between an anode and a cathode of a thermal plasma chemical vapor deposition device, radicalizing a gaseous carbon compound by feeding the gaseous carbon compound into a generated plasma jet, and permitting the radicalized plasma jet to impinge on a substrate to be treated, whereby a film of diamond is formed on the substrate.Type: GrantFiled: April 4, 1988Date of Patent: November 29, 1994Assignee: Fujitsu LimitedInventors: Kazuaki Kurihara, Kenichi Sasaki, Motonobu Kawarada, Nagaaki Koshino
-
Patent number: 5338364Abstract: A process and apparatus for producing a diamond film from a gas phase, in which a fuel gas is burnt by oxygen gas in a torch, to thereby provide a gas flame jet having a high temperature and high speed sufficient to form a high quality diamond film on a substrate, by an unlimited use of various kinds of combustible carbon compound gases as the fuel gas. A process and apparatus for producing a diamond film from a gas phase, in which a thermal spray material is fed to a combustion flame to thereby form an intermediate layer of a mixture of the thermal spray material and diamond between a substrate and a diamond film, to thereby provide a high purity diamond film having an improved adhesion to the substrate.Type: GrantFiled: December 21, 1992Date of Patent: August 16, 1994Assignee: Fujitsu LimitedInventors: Kazuaki Kurihara, Kenichi Sasaki, Motonobu Kawarada
-
Patent number: 5314726Abstract: A process for forming a diamond gas phase synthesized coating film which is easily controlled and affords a high quality, good adhesion strength diamond film includes a step of forming a mixed layer of a plasma spraying material and diamond by simultaneously conducting plasma injection by a plasma spraying, a first torch and plasma CVD by a CVD plasma, second torch to thereby form a mixed layer on the substrate. The first and second torches are structurally distinct and have respective, separately and selectively controlled plasma generation operating conditions.Type: GrantFiled: September 30, 1991Date of Patent: May 24, 1994Assignee: Fujitsu Ltd.Inventors: Kazuaki Kurihara, Motonobu Kawarada, Ken-ichi Sasaki, Akitomo Teshima
-
Patent number: 5260106Abstract: A diamond film is deposited on a surface of a substrate. The diamond film is attached securely to the substrate by forming a first layer on the surface comprising a mixture of a main component of the substrate and a sintering reinforcement agent for diamond, then forming a second layer comprising a mixture of said agent and diamond on said first layer, and finally forming the diamond film on the second layer.Type: GrantFiled: November 12, 1991Date of Patent: November 9, 1993Assignee: Fujitsu LimitedInventors: Motonobu Kawarada, Kazuaki Kurihara, Ken-ichi Sasaki, Akitomo Teshima, Nagaaki Koshino
-
Patent number: 5217700Abstract: A process and apparatus for producing a diamond film from a gas phase, in which a fuel gas is burnt by oxygen gas in a torch, to thereby provide a gas flame jet having a high temperature and high speed sufficient to form a high quality diamond film on a substrate, by an unlimited use of various kinds of combustible carbon compound gases as the fuel gas. A process and apparatus for producing a diamond film from a gas phase, in which a thermal spray material is fed to a combustion flame to thereby form an intermediate layer of a mixture of the thermal spray material and diamond between a substrate and a diamond film, to thereby provide a high purity diamond film having an improved adhesion to the substrate.Type: GrantFiled: December 13, 1991Date of Patent: June 8, 1993Assignee: Fujitsu LimitedInventors: Kazuaki Kurihara, Kenichi Sasaki, Motonobu Kawarada