Patents by Inventor Mototsugu Ogura

Mototsugu Ogura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110303146
    Abstract: There is provided a regulating gas suction device, which forms a regulating gas flow for use in preventing air outside a vacuum container trying to invade into the vacuum container through a sealing member that tightly closes a gap between an upper end surface of the vacuum container and a peripheral edge of a top pate being opposed to each other from flowing toward a substrate at a coupling portion between the top plate and the vacuum container.
    Type: Application
    Filed: December 2, 2010
    Publication date: December 15, 2011
    Inventors: Osamu Nishijima, Yuichiro Sasaki, Masafumi Kubota, Mototsugu Ogura, Katsumi Okashita
  • Patent number: 5143863
    Abstract: According to the structure of the invention, an AlGaInP cladding layer of one conductive type, an active layer, and an AlGaInP cladding layer of other conductive type greater in thickness in stripes are formed on a GaAs substrate, and an insulating film, AlGaInP or amorphous layer smaller in refractive index than the AlGaInP cladding layer are formed at both sides of the stripes, wherein the light can be confined and guided also in the direction parallel to the active layer, and the light can be index-guided both in the direction parallel to the active layer and in the direction vertical thereto, so that a laser having an extremely smaller astigmatism may be presented. What is more, the current blocking layer disposed at the outer side of the insulating film, AlGaInP or amorphous layer is high in thermal conductivity, and the heat generated in the vicinity of the active layer may be efficiently released.The invention also relates to the method of fabricating the laser composed in such structure.
    Type: Grant
    Filed: April 9, 1991
    Date of Patent: September 1, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kiyoshi Ohnaka, Mototsugu Ogura
  • Patent number: 5099357
    Abstract: An optical sensor excellent in reliability and mass producibility and low in cost, by forming a magnetic optical crystal, polarizer and analyzer monolithically on the same substrate.
    Type: Grant
    Filed: May 10, 1991
    Date of Patent: March 24, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Toshiya Yokogawa, Mototsugu Ogura
  • Patent number: 5092937
    Abstract: Semiconductors are treated with such surface-treating solutions as ultra-pure water, dilute hydrofluoric acid and an organic solvent and then subjected to removal of the surface-treating solutions remaining on the surface of the semiconductor in an inert gas atmosphere of high purity while contacting the surface of the surface-treated semiconductor only with the inert gas of high purity, whereby contamination with impurities on atom level from the atmosphere can be prevented.
    Type: Grant
    Filed: July 13, 1990
    Date of Patent: March 3, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mototsugu Ogura, Keiichi Kagawa, Yuichi Hirofuji
  • Patent number: 5029175
    Abstract: In a semiconductor laser, an AlGaInP cladding layer of one conductive type, an active layer, and an AlGaInP cladding layer of other conductive type greater in thickness in stripes are formed on a GaAs substrate, and an insulating film, AlGaInP or amorphous layer smaller in refractive index than the AlGaInP cladding layer are formed at both sides of the stripes, wherein the light can be confined and guided also in the direction parallel to the active layer, and the light can be index-guided both in the direction parallel to the active layer and in the direction vertical thereto, so that a laser having an extremely smaller astigmatism may be presented. In addition, the current blocking layer disposed at the outer side of the insulating film, AlGaInP or amorphous layer is high in thermal conductivity, and the heat generated in the vicinity of the active layer may be efficiently released.
    Type: Grant
    Filed: November 17, 1989
    Date of Patent: July 2, 1991
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kiyoshi Ohnaka, Mototsugu Ogura
  • Patent number: 4885260
    Abstract: Disclosed is a vapor phase growth method of compound semiconductor in which source gases are introduced into an epitaxial growth reactor at fixed feed rates, the substrate surface is irradiated with light, and the light irradiation is turned on and off, or the intensity of light irradiation is increased or decreased, so that an epitaxial layer structure changes in the composition, and the carrier concentration and conductivity type abruptly or continuously change in the growth film in the direction of the thickness.
    Type: Grant
    Filed: February 16, 1988
    Date of Patent: December 5, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuzaburo Ban, Masaya Manno, Minoru Kubo, Mototsugu Morisaki, Mototsugu Ogura
  • Patent number: 4866489
    Abstract: A semiconductor device in which a strained-layer of super-lattice composed of two or more group II-IV semiconductors grown on an epitaxial growth layer formed on a surface of a semiconductor substrate. Since the strained-layer of super-lattice composed of two or more group II-VI semiconductors is present in the heterojunction of the heterostructure, it is possible to form a favorable heterostructure seminconductor layer, inhibiting the adverse effects of lattice mismatch.
    Type: Grant
    Filed: July 22, 1987
    Date of Patent: September 12, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Toshiya Yokogawa, Mototsugu Ogura
  • Patent number: 4843031
    Abstract: Disclosed is a method of fabricating a compound semiconductor device which is capable of forming a multi-wavelength semiconductor laser structure, double cavity type semiconductor laser structure, stripe type semiconductor laser structure transverse junction stripe type semiconductor laser structure, or semiconductor grating by a single step of epitaxial growth while illuminating a desired part of substrate surface selectively with light at the time of epitaxial growth.
    Type: Grant
    Filed: March 15, 1988
    Date of Patent: June 27, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuzaburo Ban, Hiraaki Tsujii, Youichi Sasai, Mototsugu Ogura, Hiroyuki Serizawa
  • Patent number: 4755015
    Abstract: A semiconductor device which includes a semiconductor substrate, an active layer in a quantum well structure disposed on said semiconductor substrate, an optical waveguide formed by a disordering part of said active layer, and a clad layer disposed on said active layer and optical waveguide. As a result of this structure, the coupling efficiency of the active layer and optical waveguide is extremely enhanced, and a high performance semiconductor device is obtained.
    Type: Grant
    Filed: July 11, 1986
    Date of Patent: July 5, 1988
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomoaki Uno, Mototsugu Ogura
  • Patent number: 4747110
    Abstract: A semiconductor laser device has a compound semiconductor substrate, a first semiconductor layer disposed on the compound semiconductor substrate, and a second semiconductor layer disposed on the first semiconductor layer. The second semiconductor layer has at least three thin film layers of at least two different semiconductor compounds, the film layers being laminated with the different semiconductor compound layers alternating. An electrically isolating region extends through the thickness of the second semiconductor layer and electrically divides the second semiconductor layer into first and second portions which differ in quantum level from each other. A third semiconductor layer is disposed on the second semiconductor layer, and first and second electrodes are disposed on the third semiconductor layer in positions for supplying current to the first and second portions, respectively, and a third electrode is disposed on the substrate at the surface thereof opposite to the first and second electrodes.
    Type: Grant
    Filed: February 13, 1986
    Date of Patent: May 24, 1988
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yasuhito Takahashi, Mototsugu Ogura, Nobuyasu Hase
  • Patent number: 4533410
    Abstract: A layer of a compound semiconductor having good quality is formed by disposing a substrate in an epitaxial growth layer, feeding a second reactant gas through a guide member extending from the downstream side to the upstream side of the flow of a first reactant gas, mixing the first reactant gas and second reactant gas, and supplying the resultant gaseous mixture of the first and second reactant gases onto the substrate.
    Type: Grant
    Filed: October 17, 1983
    Date of Patent: August 6, 1985
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mototsugu Ogura, Yuzaburoh Ban, Nobuyasu Hase