Patents by Inventor Motoyuki Hirooka
Motoyuki Hirooka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200411900Abstract: An insulation layer that improves the safety of a battery, a battery cell sheet and a battery, include an insulation layer having a non-aqueous electrolyte, insulation layer particles, and an insulation layer binder, wherein the non-aqueous electrolyte has a non-aqueous solvent with a volatilization temperature of less than 246.degree.C., and when the insulation layer has been heated higher than a reference temperature, the temperature at which the weight of the insulation layer reduces by 10% compared to the weight of the insulation layer at the reference temperature is at least 3.degree.C. higher than the temperature at which the weight of the non-aqueous solvent reduces by 10% compared to the weight of the non-aqueous solvent at the reference temperature. Also provided are a battery cell sheet and a battery that are provided with said insulation layer.Type: ApplicationFiled: February 14, 2019Publication date: December 31, 2020Applicant: HITACHI, LTD.Inventors: Atsushi UNEMOTO, Motoyuki HIROOKA, Jun KAWAJI, Takefumi OKUMURA
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Publication number: 20200014062Abstract: Provided is a battery cell sheet and a secondary battery that can prevent a variation in an electrolyte composition due to volatilization and do not cause a decrease in battery performance even in a case where a component with high volatility is used.Type: ApplicationFiled: June 27, 2019Publication date: January 9, 2020Inventors: Yusuke KAGA, Motoyuki HIROOKA, Etsuko NISHIMURA, Eiji SEKI, Shimpei AMASAKI
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Patent number: 8695110Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.Type: GrantFiled: August 15, 2012Date of Patent: April 8, 2014Assignee: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
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Patent number: 8635710Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.Type: GrantFiled: April 13, 2012Date of Patent: January 21, 2014Assignee: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
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Patent number: 8476739Abstract: A graphene-on-oxide substrate according to the present invention includes: a substrate having a metal oxide layer formed on its surface; and, formed on the metal oxide layer, a graphene layer including at least one atomic layer of the graphene. The graphene layer is grown generally parallel to the surface of the metal oxide layer, and the inter-atomic-layer distance between the graphene atomic layer adjacent to the surface of the metal oxide layer and the surface atomic layer of the metal oxide layer is 0.34 nm or less. Preferably, the arithmetic mean surface roughness Ra of the metal oxide layer is 1 nm or less.Type: GrantFiled: November 24, 2009Date of Patent: July 2, 2013Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Motoyuki Hirooka, Takashi Kyotani, Hironori Orikasa
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Patent number: 8471237Abstract: A circuit board having a graphene circuit according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2?xO3+x (where x is 0 or more), the patterned aluminum oxide film having a recessed region whose surface has one or more cone-shaped recesses therein; a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film having a contact region that covers the recessed region, the graphene film growing parallel to a flat surface of the recessed region and parallel to an inner wall surface of each cone-shaped recess of the recessed region; and a patterned metal film, a part of the patterned metal film covering and having electrical contact with the contact region, the patterned metal film filling each recess covered by the graphene film.Type: GrantFiled: January 26, 2011Date of Patent: June 25, 2013Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
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Publication number: 20130145507Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.Type: ApplicationFiled: August 15, 2012Publication date: June 6, 2013Inventors: Toshihiko NAKATA, Masahiro WATANABE, Takashi INOUE, Kishio HIDAKA, Motoyuki HIROOKA
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Patent number: 8438660Abstract: The stress due to contact between a probe and a measurement sample is improved when using a microcontact prober having a conductive nanotube, nanowire, or nanopillar probe, the insulating layer at the contact interface is removed, thereby the contact resistance is reduced, and the performance of semiconductor device examination is improved. The microcontact prober comprises a cantilever probe in which each cantilever is provided with a nanowire, nanopillar, or a metal-coated carbon nanotube probe projecting by 50 to 100 nm from a holder provided at the fore end and a vibrating mechanism for vibrating the cantilever horizontally with respect to the subject. The fore end of the holder may project from the free end of the cantilever, and the fore end of the holder can be checked from above the cantilever.Type: GrantFiled: May 26, 2010Date of Patent: May 7, 2013Assignee: Hitachi High-Technologies CorporationInventors: Motoyuki Hirooka, Makoto Okai
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Patent number: 8410474Abstract: A substrate having a graphene film grown thereon according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2?xO3+x (where x is 0 or more); and a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film growing parallel to a surface of the patterned aluminum oxide film, the graphene film having an electrical conductivity of 1×104 S/cm or more measured by a four-probe resistive method using an inter-voltage-probe distance of 0.2 mm.Type: GrantFiled: January 20, 2011Date of Patent: April 2, 2013Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
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Patent number: 8407811Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.Type: GrantFiled: February 25, 2010Date of Patent: March 26, 2013Assignee: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Motoyuki Hirooka
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Patent number: 8278658Abstract: An device according to the present invention comprises: graphene; and a metal electrode, the metal electrode and the graphene being electrically connected, the following relationship of Eq. (1) being satisfied: coth ? ( r GP r C ? S ) < 1.3 , Eq . ? ( 1 ) where rGP (in units of ?/?m2) denotes the electrical resistance of a graphene layer per unit area, rC (in units of ??m2) denotes the contact resistance per unit area between the graphene layer and a metal electrode, and S denotes the contact area (in units of ?m2) between the graphene layer and the metal electrode.Type: GrantFiled: April 26, 2010Date of Patent: October 2, 2012Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Motoyuki Hirooka
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Patent number: 8272068Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.Type: GrantFiled: February 26, 2008Date of Patent: September 18, 2012Assignee: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
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Publication number: 20120204297Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.Type: ApplicationFiled: April 13, 2012Publication date: August 9, 2012Applicant: Hitachi, Ltd.Inventors: Toshihiko NAKATA, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
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Patent number: 8181268Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.Type: GrantFiled: December 18, 2008Date of Patent: May 15, 2012Assignee: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
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Publication number: 20120090056Abstract: The stress due to contact between a probe and a measurement sample is improved when using a microcontact prober having a conductive nanotube, nanowire, or nanopillar probe, the insulating layer at the contact interface is removed, thereby the contact resistance is reduced, and the performance of semiconductor device examination is improved. The microcontact prober comprises a cantilever probe in which each cantilever is provided with a nanowire, nanopillar, or a metal-coated carbon nanotube probe projecting by 50 to 100 nm from a holder provided at the fore end and a vibrating mechanism for vibrating the cantilever horizontally with respect to the subject. The fore end of the holder may project from the free end of the cantilever, and the fore end of the holder can be checked from above the cantilever.Type: ApplicationFiled: May 26, 2010Publication date: April 12, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Motoyuki Hirooka, Makoto Okai
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Publication number: 20110198558Abstract: A circuit board having a graphene circuit according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2-xO3+x (where x is 0 or more), the patterned aluminum oxide film having a recessed region whose surface has one or more cone-shaped recesses therein; a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film having a contact region that covers the recessed region, the graphene film growing parallel to a flat surface of the recessed region and parallel to an inner wall surface of each cone-shaped recess of the recessed region; and a patterned metal film, a part of the patterned metal film covering and having electrical contact with the contact region, the patterned metal film filling each recess covered by the graphene film.Type: ApplicationFiled: January 26, 2011Publication date: August 18, 2011Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
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Publication number: 20110175060Abstract: A substrate having a graphene film grown thereon according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2-xO3+x (where x is 0 or more); and a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film growing parallel to a surface of the patterned aluminum oxide film, the graphene film having an electrical conductivity of 1×104 S/cm or more measured by a four-probe resistive method using an inter-voltage-probe distance of 0.2 mm.Type: ApplicationFiled: January 20, 2011Publication date: July 21, 2011Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
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Patent number: 7976950Abstract: The transparent conductive film according to the present invention comprises graphene platelets which overlap one another to form a multilayer structure. The average size of the graphene platelets is 50 nm or more and the number of layers of the graphene platelets is 9 or less. The transparent conductive film has an electrical resistivity of 1.0×10?6 (?m) or less and a light transmission at a wavelength of 550 nm of 80% or more.Type: GrantFiled: June 1, 2010Date of Patent: July 12, 2011Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Motoyuki Hirooka
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Publication number: 20100325761Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.Type: ApplicationFiled: December 18, 2008Publication date: December 23, 2010Applicant: Hitachi, Ltd.Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
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Publication number: 20100304131Abstract: The transparent conductive film according to the present invention comprises graphene platelets which overlap one another to form a multilayer structure. The average size of the graphene platelets is 50 nm or more and the number of layers of the graphene platelets is 9 or less. The transparent conductive film has an electrical resistivity of 1.0×10?6 (?m) or less and a light transmission at a wavelength of 550 nm of 80% or more.Type: ApplicationFiled: June 1, 2010Publication date: December 2, 2010Inventors: Makoto OKAI, Motoyuki Hirooka