Patents by Inventor Motoyuki Hirooka

Motoyuki Hirooka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200411900
    Abstract: An insulation layer that improves the safety of a battery, a battery cell sheet and a battery, include an insulation layer having a non-aqueous electrolyte, insulation layer particles, and an insulation layer binder, wherein the non-aqueous electrolyte has a non-aqueous solvent with a volatilization temperature of less than 246.degree.C., and when the insulation layer has been heated higher than a reference temperature, the temperature at which the weight of the insulation layer reduces by 10% compared to the weight of the insulation layer at the reference temperature is at least 3.degree.C. higher than the temperature at which the weight of the non-aqueous solvent reduces by 10% compared to the weight of the non-aqueous solvent at the reference temperature. Also provided are a battery cell sheet and a battery that are provided with said insulation layer.
    Type: Application
    Filed: February 14, 2019
    Publication date: December 31, 2020
    Applicant: HITACHI, LTD.
    Inventors: Atsushi UNEMOTO, Motoyuki HIROOKA, Jun KAWAJI, Takefumi OKUMURA
  • Publication number: 20200014062
    Abstract: Provided is a battery cell sheet and a secondary battery that can prevent a variation in an electrolyte composition due to volatilization and do not cause a decrease in battery performance even in a case where a component with high volatility is used.
    Type: Application
    Filed: June 27, 2019
    Publication date: January 9, 2020
    Inventors: Yusuke KAGA, Motoyuki HIROOKA, Etsuko NISHIMURA, Eiji SEKI, Shimpei AMASAKI
  • Patent number: 8695110
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: April 8, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Patent number: 8635710
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: January 21, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8476739
    Abstract: A graphene-on-oxide substrate according to the present invention includes: a substrate having a metal oxide layer formed on its surface; and, formed on the metal oxide layer, a graphene layer including at least one atomic layer of the graphene. The graphene layer is grown generally parallel to the surface of the metal oxide layer, and the inter-atomic-layer distance between the graphene atomic layer adjacent to the surface of the metal oxide layer and the surface atomic layer of the metal oxide layer is 0.34 nm or less. Preferably, the arithmetic mean surface roughness Ra of the metal oxide layer is 1 nm or less.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: July 2, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka, Takashi Kyotani, Hironori Orikasa
  • Patent number: 8471237
    Abstract: A circuit board having a graphene circuit according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2?xO3+x (where x is 0 or more), the patterned aluminum oxide film having a recessed region whose surface has one or more cone-shaped recesses therein; a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film having a contact region that covers the recessed region, the graphene film growing parallel to a flat surface of the recessed region and parallel to an inner wall surface of each cone-shaped recess of the recessed region; and a patterned metal film, a part of the patterned metal film covering and having electrical contact with the contact region, the patterned metal film filling each recess covered by the graphene film.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: June 25, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
  • Publication number: 20130145507
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Application
    Filed: August 15, 2012
    Publication date: June 6, 2013
    Inventors: Toshihiko NAKATA, Masahiro WATANABE, Takashi INOUE, Kishio HIDAKA, Motoyuki HIROOKA
  • Patent number: 8438660
    Abstract: The stress due to contact between a probe and a measurement sample is improved when using a microcontact prober having a conductive nanotube, nanowire, or nanopillar probe, the insulating layer at the contact interface is removed, thereby the contact resistance is reduced, and the performance of semiconductor device examination is improved. The microcontact prober comprises a cantilever probe in which each cantilever is provided with a nanowire, nanopillar, or a metal-coated carbon nanotube probe projecting by 50 to 100 nm from a holder provided at the fore end and a vibrating mechanism for vibrating the cantilever horizontally with respect to the subject. The fore end of the holder may project from the free end of the cantilever, and the fore end of the holder can be checked from above the cantilever.
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: May 7, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motoyuki Hirooka, Makoto Okai
  • Patent number: 8410474
    Abstract: A substrate having a graphene film grown thereon according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2?xO3+x (where x is 0 or more); and a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film growing parallel to a surface of the patterned aluminum oxide film, the graphene film having an electrical conductivity of 1×104 S/cm or more measured by a four-probe resistive method using an inter-voltage-probe distance of 0.2 mm.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: April 2, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
  • Patent number: 8407811
    Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: March 26, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Motoyuki Hirooka
  • Patent number: 8278658
    Abstract: An device according to the present invention comprises: graphene; and a metal electrode, the metal electrode and the graphene being electrically connected, the following relationship of Eq. (1) being satisfied: coth ? ( r GP r C ? S ) < 1.3 , Eq . ? ( 1 ) where rGP (in units of ?/?m2) denotes the electrical resistance of a graphene layer per unit area, rC (in units of ??m2) denotes the contact resistance per unit area between the graphene layer and a metal electrode, and S denotes the contact area (in units of ?m2) between the graphene layer and the metal electrode.
    Type: Grant
    Filed: April 26, 2010
    Date of Patent: October 2, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka
  • Patent number: 8272068
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: September 18, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Publication number: 20120204297
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Application
    Filed: April 13, 2012
    Publication date: August 9, 2012
    Applicant: Hitachi, Ltd.
    Inventors: Toshihiko NAKATA, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8181268
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 15, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Publication number: 20120090056
    Abstract: The stress due to contact between a probe and a measurement sample is improved when using a microcontact prober having a conductive nanotube, nanowire, or nanopillar probe, the insulating layer at the contact interface is removed, thereby the contact resistance is reduced, and the performance of semiconductor device examination is improved. The microcontact prober comprises a cantilever probe in which each cantilever is provided with a nanowire, nanopillar, or a metal-coated carbon nanotube probe projecting by 50 to 100 nm from a holder provided at the fore end and a vibrating mechanism for vibrating the cantilever horizontally with respect to the subject. The fore end of the holder may project from the free end of the cantilever, and the fore end of the holder can be checked from above the cantilever.
    Type: Application
    Filed: May 26, 2010
    Publication date: April 12, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Motoyuki Hirooka, Makoto Okai
  • Publication number: 20110198558
    Abstract: A circuit board having a graphene circuit according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2-xO3+x (where x is 0 or more), the patterned aluminum oxide film having a recessed region whose surface has one or more cone-shaped recesses therein; a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film having a contact region that covers the recessed region, the graphene film growing parallel to a flat surface of the recessed region and parallel to an inner wall surface of each cone-shaped recess of the recessed region; and a patterned metal film, a part of the patterned metal film covering and having electrical contact with the contact region, the patterned metal film filling each recess covered by the graphene film.
    Type: Application
    Filed: January 26, 2011
    Publication date: August 18, 2011
    Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
  • Publication number: 20110175060
    Abstract: A substrate having a graphene film grown thereon according to the present invention includes: a base substrate; a patterned aluminum oxide film formed on the base substrate, the patterned aluminum oxide film having an average composition of Al2-xO3+x (where x is 0 or more); and a graphene film preferentially grown only on the patterned aluminum oxide film, the graphene film having one or more graphene atomic layers, the graphene film growing parallel to a surface of the patterned aluminum oxide film, the graphene film having an electrical conductivity of 1×104 S/cm or more measured by a four-probe resistive method using an inter-voltage-probe distance of 0.2 mm.
    Type: Application
    Filed: January 20, 2011
    Publication date: July 21, 2011
    Inventors: Makoto Okai, Motoyuki Hirooka, Yasuo Wada
  • Patent number: 7976950
    Abstract: The transparent conductive film according to the present invention comprises graphene platelets which overlap one another to form a multilayer structure. The average size of the graphene platelets is 50 nm or more and the number of layers of the graphene platelets is 9 or less. The transparent conductive film has an electrical resistivity of 1.0×10?6 (?m) or less and a light transmission at a wavelength of 550 nm of 80% or more.
    Type: Grant
    Filed: June 1, 2010
    Date of Patent: July 12, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka
  • Publication number: 20100325761
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Application
    Filed: December 18, 2008
    Publication date: December 23, 2010
    Applicant: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Publication number: 20100304131
    Abstract: The transparent conductive film according to the present invention comprises graphene platelets which overlap one another to form a multilayer structure. The average size of the graphene platelets is 50 nm or more and the number of layers of the graphene platelets is 9 or less. The transparent conductive film has an electrical resistivity of 1.0×10?6 (?m) or less and a light transmission at a wavelength of 550 nm of 80% or more.
    Type: Application
    Filed: June 1, 2010
    Publication date: December 2, 2010
    Inventors: Makoto OKAI, Motoyuki Hirooka