Abstract: Provided is a substrate contamination analysis system capable of individually analyzing impurities present in a film and impurities present on a surface of the film. The substrate contamination analysis system includes: a vapor phase decomposition device configured to expose a film formed on a surface of a first substrate to a gas that reacts with the film, to thereby dissolve the film; a recovery device configured to perform a first recovery operation of moving an object to be measured to a first measurement position before the film is dissolved and a second recovery operation of moving the object to be measured to a second measurement position after the film is dissolved; and an analyzer configured to analyze the object to be measured every time the recovery device performs the first recovery operation and the second recovery operation.

Abstract: Provided is a substrate contamination analysis system capable of individually analyzing impurities present in a film and impurities present on a surface of the film. The substrate contamination analysis system includes: a vapor phase decomposition device configured to expose a film formed on a surface of a first substrate to a gas that reacts with the film, to thereby dissolve the film; a recovery device configured to perform a first recovery operation of moving an object to be measured to a first measurement position before the film is dissolved and a second recovery operation of moving the object to be measured to a second measurement position after the film is dissolved; and an analyzer configured to analyze the object to be measured every time the recovery device performs the first recovery operation and the second recovery operation.

Abstract: An X-ray fluorescence analyzing system includes: a cassette (3) in which a substrate (1) is housed; a vapor phase decomposing device (20) for dissolving and then drying a measurement object (2) on a sample substrate surface (11a) to be held thereon; at least one measurement substrate (12); a sample recovering device (30) for dripping and drying a recovery liquid (4), which has recovered the measurement object (2) from the sample substrate (11), onto a predetermined dripping position on a measurement substrate surface (12a) to hold the recovery liquid (4) thereon; an X-ray fluorescence spectrometer (40); a conveying device (50) for conveying the substrate (1); and a control device (60) for controlling the devices (20, 30, 40, 50). The recovery liquids (4) of the measurement objects (2) from a plurality of the sample substrates (11) are dripped and dried on the single measurement substrate surface (12a) to be measured.

Abstract: An X-ray fluorescence analyzing system includes: a cassette (3) in which a substrate (1) is housed; a vapor phase decomposing device (20) for dissolving and then drying a measurement object (2) on a sample substrate surface (11a) to be held thereon; at least one measurement substrate (12); a sample recovering device (30) for dripping and drying a recovery liquid (4), which has recovered the measurement object (2) from the sample substrate (11), onto a predetermined dripping position on a measurement substrate surface (12a) to hold the recovery liquid (4) thereon; an X-ray fluorescence spectrometer (40); a conveying device (50) for conveying the substrate (1); and a control device (60) for controlling the devices (20, 30, 40, 50). The recovery liquids (4) of the measurement objects (2) from a plurality of the sample substrates (11) are dripped and dried on the single measurement substrate surface (12a) to be measured.

Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.

Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Abstract: In order to render the value of the fluorescent X-ray strength Ia2 of a standard sample 2 multiplied by the ratio PF1/PF2 between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia1 of the standard sample 1, specific glancing angles øa* and øb* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia3 and Ib3 of a sample to be measured that is irradiated at the determined specific glancing angles øa* and øb*, to thereby provide an accurate determination of the abundance of the substance of interest.

Abstract: In order to render the value of the fluorescent X-ray strength Ia2 of a standard sample 2 multiplied by the ratio PF1/PF2 between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia1 of the standard sample 1, specific glancing angles øa* and øb* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia3 and Ib3 of a sample to be measured that is irradiated at the determined specific glancing angles øa* and øb*, to thereby provide an accurate determination of the abundance of the substance of interest.

Abstract: A sample preprocessing system for a fluorescent X-ray analysis includes a sample preprocessing apparatus for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, a transport apparatus for transporting the substrate, and a control apparatus for controlling the sample preprocessing apparatus and the transport apparatus. The control apparatus 60 after having confirmed that the pressure difference between inside and outside of the apparatus 10 (20, 30) and the concentration of the reactive gas within the apparatus are within a predetermined range causes automatically opening and closing shutters 21a, 27 and 31a to thereby avoid a possible corrosion of the apparatuses positioned outside the sample preprocessing apparatus while increasing the service lifetime thereof.

Abstract: An X-ray fluorescence spectrometric system includes a sample pre-treatment apparatus 10 for retaining on a surface of a substrate a substance to be measured that is found on the surface of the substrate, after such substance has been dissolved and subsequently dried, an X-ray fluorescence spectrometer 40, and a transport apparatus 50 for transporting the substrate from the sample pre-treatment apparatus towards the X-ray fluorescence spectrometer, which system as a whole is easy to operate. This spectrometric system also includes a control apparatus 50 for controlling the sample pre-treatment apparatus 10, the X-ray fluorescence spectrometer 40 and the transport apparatus 50 in a totalized fashion.

Abstract: An X-ray spectroscopic analyzer having a mechanism for observing a sample surface, for analyzing a sample 3 by irradiating X-ray 4 thereupon within a chamber 2, comprises: a viewer apparatus 11 for letting the sample to be viewed; and an illumination means 31 for illuminating a surface of the sample 3, by irradiating an illuminating light B upon the surface of the sample 3 obliquely, while suppressing an incidence of a reflecting light of the illuminating light B upon the viewer apparatus 11. With such the construction, a shape of a contaminated portion, a residue or the like, upon the sample surface, can be clearly observed under dark field on the viewer apparatus 11, while keeping the sample 3 set within the x-ray spectroscopic analyzer 1.