Patents by Inventor Msanori Yamaguchi

Msanori Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090022946
    Abstract: The present invention provides a membrane structure having favorable pressure resistance and a manufacturing method of the same. After forming an opening (21a) on a substrate (21) by Deep Digging Reactive Ion Etching (DRIE), vertical streak formed by DRIE on the side face (inner peripheral face) of the opening (21a) is removed by performing light etching with an alkali etchant. The level of overhang of an overhanging section (21b) formed when forming an opening (22a) of a BOX layer (22) is suppressed by suppressing the overetching level when forming the BOX layer (22) by etching.
    Type: Application
    Filed: February 8, 2007
    Publication date: January 22, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masato Hayashi, Msanori Yamaguchi, Yohei Yamada, Jun Murase, Katsuyuki Ono, Naoyuki Satoh