Patents by Inventor Mu-Chen Chen

Mu-Chen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND EQUIPMENT FOR REMOVING PHOTORESIST RESIDUE AFER DRY ETCH
    Publication number: 20150249024
    Abstract: A method for removing photoresist residue includes etching a photoresist layer disposed over a front side of a semiconductor substrate during fabrication of a semiconductor device, and exposing at least one of the front side and the back side of the semiconductor substrate to an atmosphere comprising active oxygen. The method further includes cleaning at least one of the front side and the back side of the semiconductor substrate with a cleaning fluid.
    Type: Application
    Filed: April 29, 2015
    Publication date: September 3, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Mu-Chen CHEN, Yi-Tse HUANG, Wei-Fan LIAO, Han-Ti HSIAW, Chia-I SHEN
  • Method and equipment for removing photoresist residue after dry etch
    Patent number: 9048268
    Abstract: A method for removing photoresist residue includes etching a photoresist layer disposed over a front side of a semiconductor substrate during fabrication of a semiconductor device, and exposing at least one of the front side and the back side of the semiconductor substrate to an atmosphere comprising active oxygen. The method further includes cleaning at least one of the front side and the back side of the semiconductor substrate with a cleaning fluid.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: June 2, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Mu-Chen Chen, Yi-Tse Huang, Wei-Fan Liao, Han-Ti Hsiaw, Chia-I Shen
  • E-commerce advertising method with dynamic bid decrease and concealed bid time frame
    Publication number: 20140316904
    Abstract: An e-commerce advertising method is provided with creating an e-commerce advertising website having web pages each including a product and service advertising region and a promotional product bidding region. The promotional product bidding region includes a graphical and textual overview of a promotional product, a supplier hyperlink, and a predetermined bid displayed in the promotional product bidding region, and a bid time frame of the promotional product is set. With the concealed bid time frame, dynamic bid decrease is performed so that network users cannot predict the price decrease time of the promotional product, but need to browse the e-commerce advertising website all the time to monitor the price change in order to bid the promotional product with a lower price.
    Type: Application
    Filed: June 30, 2014
    Publication date: October 23, 2014
    Inventors: Mu-Chen Chen, Yi-Ching Tseng
  • METHOD AND EQUIPMENT FOR REMOVING PHOTORESIST RESIDUE AFTER DRY ETCH
    Publication number: 20140256138
    Abstract: A method for removing photoresist residue includes etching a photoresist layer disposed over a front side of a semiconductor substrate during fabrication of a semiconductor device, and exposing at least one of the front side and the back side of the semiconductor substrate to an atmosphere comprising active oxygen. The method further includes cleaning at least one of the front side and the back side of the semiconductor substrate with a cleaning fluid.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 11, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Mu-Chen Chen, Yi-Tse HUANG, Wei-Fan LIAO, Han-Ti HSIAW, Chia-I SHEN