Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.

Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.

Abstract: A faucet device includes a faucet body including a faucet spigot communicating with a channel, a handle, and a fastening member; and a valve including a hollow cylinder, a fastening element on a top of the hollow cylinder and complementarily secured to the fastening member, a drain seat on a bottom of the hollow cylinder, a first hole through the drain seat and having a first tunnel through the drain seat, an inlet connector secured to the first hole, a second hole through the drain seat and having a second tunnel through the drain seat, an outlet connector secured to the second hole, a curved tube having a first end secured to the first tunnel and a second end passing through the second tunnel into the outlet connector, and a vent having a first end communicating with the second tunnel and a second end communicating with the atmosphere.

Abstract: A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.

Abstract: A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.

Abstract: A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.

Abstract: A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.

Abstract: A sealing device for a container, which has a vault and an opening defined in the vault of the container, includes a skirt upwardly extending from the vault of the container surrounding the opening the in the vault of the container and having a distal edge formed with a series of teeth. A hollow guider is partially longitudinally received in the skirt. The guider includes a body received in the skirt and having an annular lip laterally extending from the body. The guider has a series of teeth formed on the annular lip and corresponding to the series of teeth of the skirt. The series of teeth of the guider is engaged to that of the skirt to prevent the guider from being rotated. A cap is mounted to the skirt for covering the skirt and the hollow guider.

Abstract: An incinerator for carrying out incineration of general or specific waste dry distillation, which can improve wastes incineration efficiency and prevent secondary pollution, such as a gas smell, by performing complete combustion by facilitating feeding of waste and discharging of ash under a condition that the furnace maintained sealed like for a conventional dry distillation incineration furnace. The incinerator is provided to feed waste introduced into a waste placing tube to a dry distillation incineration furnace by repeatedly pressing the waste, to discharge ash heaped on the bottom of the dry distillation incineration furnace by dropping into an ash placing tube with a discharge blade and pressing the dropped ash with a pressing plate, and to incinerate specific waste with high moist contents and waste wire using an indirect dry distillation tank accommodated in a combustion tank.