Patents by Inventor Mu-Lin Tsai

Mu-Lin Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photo resist stripper composition
    Patent number: 7456141
    Abstract: A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stripping capability, good compatibility among different types of photo resist; allowing storage at ambient temperature, low production cost, and not requiring retrofit of the existing equipment.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: November 25, 2008
    Assignee: Echem Solutions Corp.
    Inventors: Ming-Ann Hsu, Kuang-Lung Kuo, Mu-Lin Tsai, Sing-Ru Dai
  • Photo resist stripper composition
    Publication number: 20060100116
    Abstract: A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stripping capability, good compatibility among different types of photo resist; allowing storage at ambient temperature, low production cost, and not requiring retrofit of the existing equipment.
    Type: Application
    Filed: April 19, 2005
    Publication date: May 11, 2006
    Inventors: Ming-Ann Hsu, Kuang-Lung Kuo, Mu-Lin Tsai, Sing-Ru Dai