Patents by Inventor Mu Yang

Mu Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250118346
    Abstract: A device includes a first memory subarray, a first modulation circuit, a second memory subarray, a second modulation circuit and a control signal generator. The first modulation circuit is coupled to the first memory subarray. The second memory subarray is located between the first memory subarray and the first modulation circuit along a direction. The second modulation circuit is coupled to the second memory subarray. The control signal generator is configured to generate a first control signal to trigger the first modulation circuit according to a first length of the first memory subarray along the direction, and configured to generate a second control signal to trigger the second modulation circuit according to a second length of the second memory subarray along the direction.
    Type: Application
    Filed: December 17, 2024
    Publication date: April 10, 2025
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li YANG, He-Zhou WAN, Mu-Yang YE, Lu-Ping KONG, Ming-Hung CHANG
  • Publication number: 20250078905
    Abstract: A memory device, comprising: a first driving circuit configured to provide a first current signal to a first node according to a decoder signal; a second driving circuit configured to provide a second current signal to a second node according to the decoder signal; and a modulating circuit coupled to the first node and the second node, configured to transmit each of the first current signal and the second current signal to a reference voltage terminal. A method is also disclosed herein. A method is also disclosed herein.
    Type: Application
    Filed: November 15, 2024
    Publication date: March 6, 2025
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC Nanjing Company Limited, TSMC China Company Limited
    Inventors: He-Zhou WAN, Xiu-Li YANG, Mu-Yang YE, Yan-Bo SONG
  • Patent number: 12224339
    Abstract: An HEMT includes an aluminum gallium nitride layer. A gallium nitride layer is disposed below the aluminum gallium nitride layer. A zinc oxide layer is disposed under the gallium nitride layer. A source electrode and a drain electrode are disposed on the aluminum gallium nitride layer. A gate electrode is disposed on the aluminum gallium nitride layer and between the drain electrode and the source electrode.
    Type: Grant
    Filed: May 2, 2022
    Date of Patent: February 11, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yu-Chi Wang, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: 12211586
    Abstract: A device includes a first memory subarray, a first modulation circuit, a second memory subarray, a second modulation circuit and a control signal generator. The first modulation circuit is coupled to the first memory subarray. The second memory subarray is located between the first memory subarray and the first modulation circuit along a direction. The second modulation circuit is coupled to the second memory subarray. The control signal generator is configured to generate a first control signal to trigger the first modulation circuit according to a first length of the first memory subarray along the direction, and configured to generate a second control signal to trigger the second modulation circuit according to a second length of the second memory subarray along the direction.
    Type: Grant
    Filed: September 27, 2023
    Date of Patent: January 28, 2025
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li Yang, He-Zhou Wan, Mu-Yang Ye, Lu-Ping Kong, Ming-Hung Chang
  • Patent number: 12205905
    Abstract: A semiconductor structure includes a substrate including a device region, a peripheral region surrounding the device region, and a transition region disposed between the device region and the peripheral region. An epitaxial layer is disposed on the device region, the peripheral region, and the transition region. A first portion of the epitaxial layer on the peripheral region has a poly-crystal structure.
    Type: Grant
    Filed: February 19, 2021
    Date of Patent: January 21, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yen-Hsing Chen, Yu-Ming Hsu, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: 12190940
    Abstract: A memory device includes a first transistor, a second transistor and a third transistor. The first transistor is coupled to a first word line at a first node. The second transistor is coupled to a second word line different from the first word line at a second node. A control terminal of the first transistor is coupled to a control terminal of the second transistor. The third transistor is coupled between a ground and a third node which is coupled to each of the first node and the second node. In a layout view, each of the first transistor and the second transistor has a first length along a direction. The first transistor, the third transistor and second transistor are arranged in order along the direction. A method is also disclosed herein.
    Type: Grant
    Filed: November 1, 2023
    Date of Patent: January 7, 2025
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: He-Zhou Wan, Xiu-Li Yang, Mu-Yang Ye, Yan-Bo Song
  • Publication number: 20240429820
    Abstract: A DC-to-DC converter control method and system based on backstepping super-twisting, a device, and a storage medium are disclosed, the method including: constructing a state-space model of a DC-to-DC converter according to Kirchhoff's laws and a topological structure of the DC-to-DC converter; acquiring initial PWM wave control information by using a backstepping control algorithm in an inner current loop of the DC-to-DC converter according to the state-space model; processing the initial PWM wave control information by using a super-twisting sliding mode control algorithm in an outer voltage loop of the DC-to-DC converter based on the state-space model to obtain final PWM wave control information; and regulating an operation state of the DC-to-DC converter with the final PWM wave control information.
    Type: Application
    Filed: November 15, 2023
    Publication date: December 26, 2024
    Applicant: Foshan Xianhu Laboratory
    Inventors: Jing CHEN, Chun XIAO, Chihua LU, Mu YANG, Siyilang YOU, Jiawei GAO, Huchuan YANG, Junjie ZHAO, Congding YANG, Zhuo WANG
  • Patent number: 12159930
    Abstract: A high electron mobility transistor (HEMT) includes a substrate, a P-type III-V composition layer, a gate electrode and a carbon containing layer. The P-type III-V composition layer is disposed on the substrate, and the gate electrode is disposed on the P-type III-V composition layer. The carbon containing layer is disposed under the P-type III-V composition layer to function like an out diffusion barrier for preventing from the dopant within the P-type III-V composition layer diffusing into the stacked layers underneath during the annealing process.
    Type: Grant
    Filed: August 29, 2022
    Date of Patent: December 3, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: 12046640
    Abstract: A semiconductor device includes an epitaxial substrate. The epitaxial substrate includes a substrate. A strain relaxed layer covers and contacts the substrate. A III-V compound stacked layer covers and contacts the strain relaxed layer. The III-V compound stacked layer is a multilayer epitaxial structure formed by aluminum nitride, aluminum gallium nitride or a combination of aluminum nitride and aluminum gallium nitride.
    Type: Grant
    Filed: April 17, 2023
    Date of Patent: July 23, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yu-Chi Wang, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: 12046639
    Abstract: A semiconductor device includes an epitaxial substrate. The epitaxial substrate includes a substrate. A strain relaxed layer covers and contacts the substrate. A III-V compound stacked layer covers and contacts the strain relaxed layer. The III-V compound stacked layer is a multilayer epitaxial structure formed by aluminum nitride, aluminum gallium nitride or a combination of aluminum nitride and aluminum gallium nitride.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: July 23, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yu-Chi Wang, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Publication number: 20240161798
    Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.
    Type: Application
    Filed: January 25, 2024
    Publication date: May 16, 2024
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li YANG, He-Zhou WAN, Mu-Yang YE, Lu-Ping KONG, Ming-Hung CHANG
  • Patent number: 11955519
    Abstract: A semiconductor device includes an epitaxial substrate. The epitaxial substrate includes a substrate. A strain relaxed layer covers and contacts the substrate. A III-V compound stacked layer covers and contacts the strain relaxed layer. The III-V compound stacked layer is a multilayer epitaxial structure formed by aluminum nitride, aluminum gallium nitride or a combination of aluminum nitride and aluminum gallium nitride.
    Type: Grant
    Filed: April 17, 2023
    Date of Patent: April 9, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yu-Chi Wang, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: 11923041
    Abstract: A device includes a memory array, bit line pairs, word lines, a modulation circuit and a control signal generator. The memory array has bit cells arranged in rows and columns. Each bit line pair is connected to a respective column of bit cells. Each word line is connected to a respective row of bit cells. The modulation circuit is coupled with at least one bit line pair. The control signal generator is coupled with the modulation circuit. The control signal generator includes a tracking wiring with a tracking length positively correlated with a depth distance of the word lines. The control signal generator is configured to produce a control signal, switching to a first voltage level for a first time duration in reference with the tracking length, for controlling the modulation circuit. A method of controlling aforesaid device is also disclosed.
    Type: Grant
    Filed: July 5, 2022
    Date of Patent: March 5, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li Yang, He-Zhou Wan, Mu-Yang Ye, Lu-Ping Kong, Ming-Hung Chang
  • Publication number: 20240071470
    Abstract: A memory device includes a first transistor, a second transistor and a third transistor. The first transistor is coupled to a first word line at a first node. The second transistor is coupled to a second word line different from the first word line at a second node. A control terminal of the first transistor is coupled to a control terminal of the second transistor. The third transistor is coupled between a ground and a third node which is coupled to each of the first node and the second node. In a layout view, each of the first transistor and the second transistor has a first length along a direction. The first transistor, the third transistor and second transistor are arranged in order along the direction. A method is also disclosed herein.
    Type: Application
    Filed: November 1, 2023
    Publication date: February 29, 2024
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC Nanjing Company Limited, TSMC China Company Limited
    Inventors: He-Zhou WAN, Xiu-Li YANG, Mu-Yang YE, Yan-Bo SONG
  • Publication number: 20240038844
    Abstract: A method for fabricating a high electron mobility transistor (HEMT) includes the steps of forming a buffer layer on a substrate, forming a barrier layer on the buffer layer, forming a p-type semiconductor layer on the barrier layer, forming a gate electrode on the p-type semiconductor layer, and then forming a source electrode and a drain electrode adjacent to two sides of the gate electrode. Preferably, the buffer layer further includes a bottom portion having a first carbon concentration and a top portion having a second carbon concentration, in which the second carbon concentration is less than the first carbon concentration and a thickness of the bottom portion is less than a thickness of the top portion.
    Type: Application
    Filed: August 26, 2022
    Publication date: February 1, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chun-Liang Kuo, Yen-Hsing Chen, Yen-Lun Chen, Ruei-Hong Shen, Tsung-Mu Yang, Yu-Ren Wang
  • Publication number: 20240021225
    Abstract: A device includes a first memory subarray, a first modulation circuit, a second memory subarray, a second modulation circuit and a control signal generator. The first modulation circuit is coupled to the first memory subarray. The second memory subarray is located between the first memory subarray and the first modulation circuit along a direction. The second modulation circuit is coupled to the second memory subarray. The control signal generator is configured to generate a first control signal to trigger the first modulation circuit according to a first length of the first memory subarray along the direction, and configured to generate a second control signal to trigger the second modulation circuit according to a second length of the second memory subarray along the direction.
    Type: Application
    Filed: September 27, 2023
    Publication date: January 18, 2024
    Applicants: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: Xiu-Li YANG, He-Zhou WAN, Mu-Yang YE, Lu-Ping KONG, Ming-Hung CHANG
  • Patent number: 11862231
    Abstract: A memory device includes a first transistor, a second transistor and a third transistor. The first transistor is coupled to a first word line at a first node. The second transistor is coupled to a second word line different from the first word line at a second node. A control terminal of the first transistor is coupled to a control terminal of the second transistor. The third transistor is coupled between a ground and a third node which is coupled to each of the first node and the second node. In a layout view, each of the first transistor and the second transistor has a first length along a direction. The first transistor, the third transistor and second transistor are arranged in order along the direction. A method is also disclosed herein.
    Type: Grant
    Filed: October 26, 2022
    Date of Patent: January 2, 2024
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD, TSMC NANJING COMPANY LIMITED, TSMC CHINA COMPANY LIMITED
    Inventors: He-Zhou Wan, Xiu-Li Yang, Mu-Yang Ye, Yan-Bo Song
  • Publication number: 20230268397
    Abstract: A semiconductor device includes an epitaxial substrate. The epitaxial substrate includes a substrate. A strain relaxed layer covers and contacts the substrate. A III-V compound stacked layer covers and contacts the strain relaxed layer. The III-V compound stacked layer is a multilayer epitaxial structure formed by aluminum nitride, aluminum gallium nitride or a combination of aluminum nitride and aluminum gallium nitride.
    Type: Application
    Filed: April 17, 2023
    Publication date: August 24, 2023
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Ming Hsu, Yu-Chi Wang, Yen-Hsing Chen, Tsung-Mu Yang, Yu-Ren Wang
  • Patent number: D1021239
    Type: Grant
    Filed: July 5, 2022
    Date of Patent: April 2, 2024
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Qiu Rong Ma, Yi Mu Yang, Ling-Yuan Liou
  • Patent number: D1038523
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: August 6, 2024
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Qiu Rong Ma, Yi Mu Yang