Patents by Inventor Muhammad Asif Khan

Muhammad Asif Khan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11958789
    Abstract: A method for determining a consistency coefficient of a power-law cement grout includes: determining a water-cement ratio of the power-law cement grout; according to engineering practice requirements, determining a time required to determine the consistency coefficient of the power-law cement grout; and obtaining the consistency coefficient of the power-law cement grout. The method is accurate and reliable, requires less calculation, etc.; and has very high practical value and popularization value in environmental protection and ecological restoration.
    Type: Grant
    Filed: December 12, 2023
    Date of Patent: April 16, 2024
    Assignee: KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Zhi-quan Yang, Jun-fan Xiong, Ying-yan Zhu, Yi Yang, Yong-shun Han, Muhammad Asif Khan, Jian-bin Xie, Tian-bing Xiang, Bi-hua Zhang, Han-hua Xu, Jie Zhang, Shen-zhang Liu, Qi-jun Jia, Cheng-yin Ye, Gang Li
  • Patent number: 11946845
    Abstract: A method for determining a three-dimensional tortuosity of a loose and broken rock-soil mass, includes the following steps: a particle grading curve of the loose and broken rock-soil mass is obtained by utilizing a particle size analysis, and followed by calculating an equivalent particle size and an average particle size; a porosity of the loose and broken rock-soil mass is obtained by utilizing a moisture content test, a density test, and a specific gravity test; the three-dimensional tortuosity of the loose and broken rock-soil mass is obtained by utilizing the equivalent particle size, the average particle size and the porosity of the loose and broken rock-soil mass. The method has the advantages of simple logic, accuracy and reliability, simple and fast parameter determination, and has high practical value and promotion value in the field of environmental protection and ecological restoration technology.
    Type: Grant
    Filed: November 1, 2023
    Date of Patent: April 2, 2024
    Assignee: KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Zhi-quan Yang, Jia-jun Zhang, Jun-fan Xiong, Ying-yan Zhu, Yi Yang, Muhammad Asif Khan, Tian-bing Xiang, Bi-hua Zhang, Han-hua Xu, Jie Zhang, Shen-zhang Liu
  • Patent number: 11733146
    Abstract: A method for determining a column-hemispherical permeation radius with time-varying property of power-law cement grout and tortuosity of rock and soil mass is provided, including: acquiring a porosity ? of rock and soil mass and a corresponding permeation coefficient K by geotechnical tests, measuring a groundwater pressure P0 at a grouting point and determining tortuosity ? of rock and soil mass; acquiring an initial consistency coefficient c0, a rheological index n and a time-varying property coefficient k of power-law cement grout with a designed water to cement ratio by rheological tests, and determining the viscosity of water ?w; acquiring grouting parameters, including a grouting pressure P1, grouting time t, a number m of grouting holes of a side surface of a grouting pipe and a grouting hole radius r; and solving a column-hemispherical permeation grouting diffusion radius R considering coupling effect both the tortuosity of rock and soil mass and the time-varying property of power-law cement grout.
    Type: Grant
    Filed: November 30, 2022
    Date of Patent: August 22, 2023
    Assignee: KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Zhiquan Yang, Mao Chen, Yingyan Zhu, Yi Yang, Wentao Chen, Yuqing Liu, Muhammad Asif Khan, Bihua Zhang, Hanhua Xu, Tianbing Xiang, Jie Zhang
  • Patent number: 7348606
    Abstract: A method of producing nitride based heterostructure devices by using a quaternary layer comprised of AlInGaN. The quaternary layer may be used in conjunction with a ternary layer in varying thicknesses and compositions that independently adjust polarization charges and band offsets for device structure optimization by using strain compensation profiles. The profiles can be adjusted by altering profiles of molar fractions of In and Al.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: March 25, 2008
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Muhammad Asif Khan, Remigijus Gaska, Michael Shur, Jinwei Yang
  • Patent number: 6878593
    Abstract: A method and structure for producing nitride based heterostructure devices having substantially lower reverse leakage currents and performance characteristics comparable to other conventional devices. The method and structure include placing one or more layers of nitride-based compounds over a substrate. Additionally, a dielectric layer including silicon dioxide is placed over the nitride-based layers.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: April 12, 2005
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Muhammad Asif Khan, Remigijus Gaska, Michael Shur, Jinwei Yang
  • Publication number: 20040183096
    Abstract: A method of producing nitride based heterostructure devices by using a quaternary layer comprised of AlInGaN. The quaternary layer may be used in conjunction with a ternary layer in varying thicknesses and compositions that independently adjust polarization charges and band offsets for device structure optimization by using strain compensation profiles. The profiles can be adjusted by altering profiles of molar fractions of In and Al.
    Type: Application
    Filed: January 30, 2004
    Publication date: September 23, 2004
    Inventors: Muhammad Asif Khan, Remigijus Gaska, Michael Shur, Jinwei Yang
  • Patent number: 6764888
    Abstract: A method of producing nitride based heterostructure devices by using a quaternary layer comprised of AlInGaN. The quaternary layer may be used in conjunction with a ternary layer in varying thicknesses and compositions that independently adjust polarization charges and band offsets for device structure optimization by using strain compensation profiles. The profiles can be adjusted by altering profiles of molar fractions of In and Al.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: July 20, 2004
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Muhammad Asif Khan, Remigijus Gaska, Michael Shur, Jinwei Yang
  • Publication number: 20040036086
    Abstract: A method and structure for producing nitride based heterostructure devices having substantially lower reverse leakage currents and performance characteristics comparable to other conventional devices. The method and structure include placing one or more layers of nitride-based compounds over a substrate. Additionally, a dielectric layer including silicon dioxide is placed over the nitride-based layers.
    Type: Application
    Filed: August 25, 2003
    Publication date: February 26, 2004
    Inventors: Muhammad Asif Khan, Remigijus Gaska, Michael Shur, Jinwci Yang
  • Patent number: 6690042
    Abstract: A method and structure for producing nitride based heterostructure devices having substantially lower reverse leakage currents and performance characteristics comparable to other conventional devices. The method and structure include placing one or more layers of nitride-based compounds over a substrate. Additionally, a dielectric layer including silicon dioxide is placed over the nitride-based layers.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: February 10, 2004
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Muhammad Asif Khan, Remigilus Gaska, Michael Shur, Jinwci Yang
  • Publication number: 20020052076
    Abstract: A method and structure for producing nitride based heterostructure devices having substantially lower reverse leakage currents and performance characteristics comparable to other conventional devices. The method and structure include placing one or more layers of nitride-based compounds over a substrate. Additionally, a dielectric layer including silicon dioxide is placed over the nitride-based layers.
    Type: Application
    Filed: September 27, 2001
    Publication date: May 2, 2002
    Inventors: Muhammad Asif Khan, Remigilus Gaska, Michael Shur, Jinwei Yang