Patents by Inventor Muhammad Azim

Muhammad Azim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200306931
    Abstract: Methods and apparatus for removing particles from a substrate surface after a chemical mechanical polish. In some embodiments, the apparatus may include a manifold configured to receive and atomize a fluid and at least one spray nozzle mounted to the manifold and configured to spray the atomized fluid in a divergent spray pattern such that the substrate surface is cleansed when impinged by spray from the at least one spray nozzle, wherein the at least one spray nozzle sprays the atomized fluid at a pressure of approximately 30 psi to approximately 2500 psi.
    Type: Application
    Filed: March 25, 2019
    Publication date: October 1, 2020
    Inventors: PRAYUDI LIANTO, PENG SUO, SHIH-CHAO HUNG, PIN GIAN GAN, CHUN YU TO, PERIYA GOPALAN, KOK SEONG TEO, LIT PING LAM, ANDY LOO, PANGYEN ONG, DAVID P. SURDOCK, KEITH YPMA, BRIAN WILLIAMS, SCOTT OSTERMAN, MARVIN L. BERNT, MUHAMMAD NORHAZWAN, SAMUEL GOPINATH, MUHAMMAD AZIM, GUAN HUEI SEE, QI JIE PENG, SRISKANTHARAJAH THIRUNAVUKARASU, ARVIND SUNDARRAJAN
  • Patent number: 10002771
    Abstract: A polymer layer on a substrate may be treated with ozone gas or with deionized water and ozone gas to increase a removal rate of the polymer layer in a chemical mechanical polishing (CMP) process. The ozone gas may be diffused directly into the polymer layer or through a thin layer of deionized water on the surface of the polymer layer and into the polymer layer. The deionized water may also be heated during the process to further enhance the diffusion of the ozone gas into the polymer layer.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: June 19, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Prayudi Lianto, Kuma Hsiung, Eric J. Bergman, John L. Klocke, Mohamed Rafi, Muhammad Azim, Guan Huei See, Arvind Sundarrajan