Patents by Inventor Muhammad M. Rasheed
Muhammad M. Rasheed has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12054826Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.Type: GrantFiled: July 20, 2023Date of Patent: August 6, 2024Assignee: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Anqing Cui
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Patent number: 11932939Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.Type: GrantFiled: April 28, 2021Date of Patent: March 19, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Muhammad M. Rasheed, Srinivas Gandikota, Mario Dan Sanchez, Guoqiang Jian, Yixiong Yang, Deepak Jadhav, Ashutosh Agarwal
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Publication number: 20230357927Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.Type: ApplicationFiled: July 20, 2023Publication date: November 9, 2023Applicant: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Anqing Cui
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Publication number: 20230307216Abstract: Processing chambers comprising a chamber body, a remote plasma source (RPS) outside the chamber body, a first connection line between the remote plasma source and the interior volume of the chamber body through the top wall and a second connection line between the remote plasma source and the interior volume through the sidewall of the chamber body. Methods of cleaning a processing chamber comprising flowing an etchant gas through the RPS into the chamber body, followed by a flow recovery gas through the RPS into the chamber body through both the first connection line and second connection line.Type: ApplicationFiled: October 18, 2022Publication date: September 28, 2023Applicant: Applied Materials, Inc.Inventors: Prasanth Narayanan, Shrihari Sampathkumar, Keiichi Tanaka, Mario D. Sanchez, Muhammad M. Rasheed, Mandyam Sriram
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Patent number: 11767590Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.Type: GrantFiled: September 22, 2020Date of Patent: September 26, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Anqing Cui
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Patent number: 11767593Abstract: Gas distribution assemblies and process chambers comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are also described.Type: GrantFiled: September 20, 2022Date of Patent: September 26, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Muhannad Mustafa, Muhammad M. Rasheed
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Patent number: 11732358Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.Type: GrantFiled: August 17, 2022Date of Patent: August 22, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota, Wei V. Tang
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Patent number: 11719255Abstract: Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described. The first ring-shaped body has a first plurality of openings and the second ring-shaped body has a second plurality of openings. The first ring-shaped body and the second ring-shaped body are rotatable relative to each other around a central axis to at least partially overlap the first plurality of openings and the second plurality of openings to change the area of conductance through the openings. Methods of removing gases from a processing chamber are also described.Type: GrantFiled: July 26, 2022Date of Patent: August 8, 2023Assignee: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez
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Publication number: 20230125613Abstract: Embodiments of the present disclosure generally relate to an apparatus for improving the film thickness on a substrate when using a heated substrate support. A cover plate to be placed over the top surface of a heated substrate support is disclosed. The cover plate includes a pocket formed in the middle thereof for the placement of a substrate. The cover plate may include a variety of features including a plurality of dimples, a plurality of radially disposed grooves, a plurality of annular grooves, lift pin holes, pin slots, and gas exhaust holes.Type: ApplicationFiled: December 20, 2022Publication date: April 27, 2023Inventors: Muhammad M. RASHEED, Ilker DURUKAN
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Patent number: 11598454Abstract: Connector assemblies for holding two tubes together and methods of use are described. The connector assemblies have an inner bolt, a split outer bolt comprising at least two outer bolt sections and a clamp bolt. The clamp bolt holds the outer bolt sections together to form the split outer bolt and the inner bolt is screwed into the outer bolt to enclose the two tube ends.Type: GrantFiled: January 23, 2020Date of Patent: March 7, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Muhannad Mustafa, Muhammad M. Rasheed
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Patent number: 11566327Abstract: Methods and apparatus to reduce pressure fluctuations in a chemical delivery system for a process chamber are provided herein. In some embodiments, a chemical delivery system for a process chamber, includes: a carrier gas supply; an ampoule fluidly coupled to the carrier gas supply via a first supply line, wherein the ampoule is configured to supply one or more process gases to the process chamber via a second supply line; an inlet valve disposed in line with the first supply line to control a flow of a carrier gas from the carrier gas supply to the ampoule; and a first control valve disposed in line with a pressure regulation line, wherein the pressure regulation line is fluidly coupled to the first supply line at a tee location between the carrier gas supply and the inlet valve.Type: GrantFiled: November 20, 2020Date of Patent: January 31, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Ilker Durukan, Muhammad M. Rasheed, Kenric Choi, Tatsuya Sato
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Patent number: 11562914Abstract: Embodiments of the present disclosure generally relate to an apparatus for improving the film thickness on a substrate when using a heated substrate support. A cover plate to be placed over the top surface of a heated substrate support is disclosed. The cover plate includes a pocket formed in the middle thereof for the placement of a substrate. The cover plate may include a variety of features including a plurality of dimples, a plurality of radially disposed grooves, a plurality of annular grooves, lift pin holes, pin slots, and gas exhaust holes.Type: GrantFiled: April 12, 2021Date of Patent: January 24, 2023Assignee: Applied Materials, Inc.Inventors: Muhammad M. Rasheed, Ilker Durukan
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Publication number: 20230015613Abstract: Gas distribution assemblies and process chambers comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are also described.Type: ApplicationFiled: September 20, 2022Publication date: January 19, 2023Applicant: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed
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Publication number: 20220389585Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.Type: ApplicationFiled: August 17, 2022Publication date: December 8, 2022Applicant: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota, Wei V. Tang
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Publication number: 20220364575Abstract: Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described. The first ring-shaped body has a first plurality of openings and the second ring-shaped body has a second plurality of openings. The first ring-shaped body and the second ring-shaped body are rotatable relative to each other around a central axis to at least partially overlap the first plurality of openings and the second plurality of openings to change the area of conductance through the openings. Methods of removing gases from a processing chamber are also described.Type: ApplicationFiled: July 26, 2022Publication date: November 17, 2022Applicant: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez
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Publication number: 20220356572Abstract: Pump liners and process chambers with the pump liners are described. The pump liner has a ring-shaped body with an annular wall enclosing a process region. A plurality of circumferentially spaced openings provide fluid communication through the annular wall between the process region and a region outside of the ring-shaped body. Each of the plurality of circumferentially spaced openings has a self-adjusting valve assembly. Self-adjusting valves and processing methods are also described.Type: ApplicationFiled: May 9, 2022Publication date: November 10, 2022Applicant: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed
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Patent number: 11495932Abstract: Embodiments of a slip ring for use in a rotatable substrate support are provided herein. In some embodiments a slip ring includes a main body having a top wall, a bottom wall, and a sidewall extending between the top and bottom walls, wherein the top wall, bottom wall, and sidewall define an inner volume within the main body, wherein a central opening is formed through the top wall; a plurality of annular containers disposed within the inner volume and coaxially with the main body, wherein the plurality of annular containers are vertically spaced apart from one another, and wherein each of the plurality of annular containers contains a first volume of an electrically conductive liquid; an upper cylindrical body rotatably disposed in the central opening; a lower cylindrical body fixedly coupled to the lower wall of the main body.Type: GrantFiled: June 6, 2018Date of Patent: November 8, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Muhannad Mustafa, Yu Chang, William Kuang, Muhammad M. Rasheed, Xiping Huo
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Publication number: 20220344134Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the upper surface is substantially planar and the lower surface includes a stepped lower surface to define a radially outermost portion and a radially innermost portion of the upper edge ring.Type: ApplicationFiled: July 11, 2022Publication date: October 27, 2022Applicant: Applied Materials, Inc.Inventors: Muhannad MUSTAFA, Muhammad M. RASHEED, Yu LEI, Avgerinos V. GELATOS, Vikash BANTHIA, Victor H. CALDERON, Shi Wei TOH, Yung-Hsin LEE, Anindita SEN
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Patent number: 11479859Abstract: Gas distribution assemblies and process chamber comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are described.Type: GrantFiled: April 9, 2020Date of Patent: October 25, 2022Assignee: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed
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Patent number: 11447866Abstract: Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.Type: GrantFiled: June 17, 2021Date of Patent: September 20, 2022Assignee: Applied Materials, Inc.Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Srinivas Gandikota, Wei V. Tang