Patents by Inventor Muhammad M. Rasheed

Muhammad M. Rasheed has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210262092
    Abstract: Gas delivery systems and methods of delivering a process gas are described. The gas delivery system includes an inert gas line and a first reactive gas line connected to a gas line with a purge gas flow. The flows of inert gas and first reactive gas are controlled so that the pressure at the end of the gas line remains substantially constant.
    Type: Application
    Filed: February 26, 2021
    Publication date: August 26, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Muhammad M. Rasheed, Mandyam Sriram, Anqing Cui, Sanjeev Baluja, Kevin Griffin, Joseph AuBuchon
  • Publication number: 20210246552
    Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 12, 2021
    Inventors: Muhammad M. RASHEED, Srinivas GANDIKOTA, Mario Dan SANCHEZ, Guoqiang JIAN, Yixiong YANG, Deepak JADHAV, Ashutosh AGARWAL
  • Publication number: 20210231242
    Abstract: Connector assemblies for holding two tubes together and methods of use are described. The connector assemblies have an inner bolt, a split outer bolt comprising at least two outer bolt sections and a clamp bolt. The clamp bolt holds the outer bolt sections together to form the split outer bolt and the inner bolt is screwed into the outer bolt to enclose the two tube ends.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed
  • Publication number: 20210187521
    Abstract: Embodiments of showerheads for use in a process chamber are provided herein. In some embodiments, a showerhead includes a first spiral channel extending from a central region to a peripheral region of the showerhead; a second spiral channel extending from a central region to a peripheral region of the showerhead, wherein the second spiral channel is interleaved with the first spiral channel and fluidly independent from the first spiral channel; a plurality of first channels extending from the first spiral channel to a plurality of first gas distribution holes on a lower surface of the showerhead, wherein each first channel is a singular channel extending at an angle; and a plurality of second channels extending from the second spiral channel to a plurality of second gas distribution holes on the lower surface of the showerhead, wherein each second channel is a singular channel extending at an angle.
    Type: Application
    Filed: December 19, 2019
    Publication date: June 24, 2021
    Inventors: MUHANNAD MUSTAFA, MUHAMMAD M. RASHEED
  • Publication number: 20210130953
    Abstract: Embodiments of process kits for us in a substrate processing chamber are provided herein. In some embodiments, a process kit for use in a substrate processing chamber includes an annular body configured to surround a substrate support and having an upper portion, a lower portion, and a central opening through the upper portion and the lower portion, wherein the upper portion includes sidewalls coupled to an upper flange that defines an outer diameter of the annular body, wherein the upper portion includes a plurality of first holes disposed through the sidewalls, and wherein the upper portion includes one or more heating elements; and a shield disposed about the annular body, wherein the shield includes an exhaust port fluidly connected to the plurality of first holes.
    Type: Application
    Filed: November 1, 2019
    Publication date: May 6, 2021
    Inventors: Muhannad Mustafa, Muhammad M Rasheed
  • Publication number: 20210087686
    Abstract: Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.
    Type: Application
    Filed: September 22, 2020
    Publication date: March 25, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez, Anqing Cui
  • Publication number: 20200378402
    Abstract: Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described. The first ring-shaped body has a first plurality of openings and the second ring-shaped body has a second plurality of openings. The first ring-shaped body and the second ring-shaped body are rotatable relative to each other around a central axis to at least partially overlap the first plurality of openings and the second plurality of openings to change the area of conductance through the openings. Methods of removing gases from a processing chamber are also described.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario D. Sanchez
  • Publication number: 20200377998
    Abstract: Pumping liners for process chambers with slit openings are described. The pumping liners have a ring-shaped body with inner and outer walls. An annular upper channel is formed in the upper portion of the outer wall. The upper channel has a plurality of openings with a height, each opening having an independent width. A lower channel is formed in the lower portion of the outer wall and is separated from the upper channel by a partition. The lower channel is in fluid communication with the upper channel through at least one passage in the partition. A slit valve opening is in the lower portion of the body forming an opening in the outer wall and the inner wall.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed
  • Publication number: 20200357616
    Abstract: Embodiments of the invention generally provide a processing chamber used to perform a physical vapor deposition (PVD) process and methods of depositing multi-compositional films. The processing chamber may include: an improved RF feed configuration to reduce any standing wave effects; an improved magnetron design to enhance RF plasma uniformity, deposited film composition and thickness uniformity; an improved substrate biasing configuration to improve process control; and an improved process kit design to improve RF field uniformity near the critical surfaces of the substrate. The method includes forming a plasma in a processing region of a chamber using an RF supply coupled to a multi-compositional target, translating a magnetron relative to the multi-compositional target, wherein the magnetron is positioned in a first position relative to a center point of the multi-compositional target while the magnetron is translating and the plasma is formed, and depositing a multi-compositional film on a substrate.
    Type: Application
    Filed: July 24, 2020
    Publication date: November 12, 2020
    Inventors: Adolph Miller ALLEN, Lara HAWRYLCHAK, Zhigang XIE, Muhammad M. RASHEED, Rongjun WANG, Xianmin TANG, Zhendong LIU, Tza-Jing GUNG, Srinivas GANDIKOTA, Mei CHANG, Michael S. COX, Donny YOUNG, Kirankumar SAVANDAIAH, Zhenbin GE
  • Patent number: 10763090
    Abstract: Embodiments of the invention generally provide a processing chamber used to perform a physical vapor deposition (PVD) process and methods of depositing multi-compositional films. The processing chamber may include: an improved RF feed configuration to reduce any standing wave effects; an improved magnetron design to enhance RF plasma uniformity, deposited film composition and thickness uniformity; an improved substrate biasing configuration to improve process control; and an improved process kit design to improve RF field uniformity near the critical surfaces of the substrate.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: September 1, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Adolph Miller Allen, Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang, Xianmin Tang, Zhendong Liu, Tza-Jing Gung, Srinivas Gandikota, Mei Chang, Michael S. Cox, Donny Young, Kirankumar Savandaiah, Zhenbin Ge
  • Patent number: 10704147
    Abstract: Embodiments of the present disclosure are directed process kits for use with an in-chamber heater and substrate rotating mechanism. In some embodiments consistent with the present disclosure, a process kit for use with a rotatable substrate support heater pedestal for supporting a substrate in a process chamber may include an upper edge ring including a top ledge and a skirt the extends downward from the top ledge, a lower edge ring that at least partially supports the upper edge ring and aligns the upper edge ring with the substrate support heater pedestal, a bottom plate disposed on a bottom of the process chamber that supports the upper edge ring when the substrate support heater pedestal is in a lowered non-processing position, and a shadow ring that couples with the upper edge ring when the substrate support heater pedestal is in a raised processing position.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: July 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Muhammad M. Rasheed, Muhannad Mustafa, Hamid Tavassoli, Steven V Sansoni, Cheng-Hsiung Tsai, Vikash Banthia
  • Patent number: 10704142
    Abstract: Embodiments of the present disclosure are directed to a quick disconnect resistance temperature detector (RTD) heater assembly, that includes a first assembly comprising a pedestal, a pedestal shaft, an adapter, one or more heater power supply terminals, and at least one RTD, and a second assembly comprising a rotating module having a central opening, and a cable assembly partially disposed in the central opening and securely fastened to the rotating module, wherein the first assembly is removably coupled to the second assembly, wherein the cable assembly includes one or more power supply sockets that receive the heater power supply terminals when the first and second assemblies are coupled together, and wherein the cable assembly includes one or more spring loaded RTD pins that contact the at least one RTD disposed in the first assembly when the first and second assemblies are coupled together.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: July 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed, Mario Dan Sanchez, Yu Chang, William Kuang, Vinod Konda Purathe, Manjunatha Koppa
  • Publication number: 20200087789
    Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The delivery channel is separated into a plurality of zones by partitions. Each of the plurality of zones has an inlet and an outlet.
    Type: Application
    Filed: September 12, 2019
    Publication date: March 19, 2020
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed
  • Patent number: 10571069
    Abstract: Embodiments of the present disclosure are directed to a gimbal assembly, that includes a gimbal plate having a central opening, a pivot screw disposed within a pivot mount formed in the gimbal plate, wherein the pivot screw includes a spherical pivot head about which the gimbal plate pivots, one or more motors coupled to the gimbal plate configured to provide in-situ gimbal plate motion about the spherical pivot head, and a plurality of leveling indicators configured that determine deflection of gimbal plate.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: February 25, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed
  • Patent number: 10519546
    Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: December 31, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Ravi Jallepally, Muhammad M. Rasheed, Ilker Durukan
  • Publication number: 20190390337
    Abstract: Embodiments of substrate processing equipment and rotatable substrate supports incorporating the same are provided herein. In some embodiments, the substrate support may include a pedestal having a substrate receiving surface, a shaft having an upper end, a lower end, and a central opening, where the shaft is coupled to the pedestal at the upper end, a hub circumscribing the shaft, where the shaft is rotatable with respect to the hub, and where the hub includes a first port that extends from an outer surface of the hub to a volume between the hub and the shaft, and a ferrofluid sealing assembly disposed between the hub and the shaft.
    Type: Application
    Filed: June 25, 2018
    Publication date: December 26, 2019
    Inventors: MUHANNAD MUSTAFA, MUHAMMAD M. RASHEED
  • Patent number: 10407771
    Abstract: Methods and apparatus for cleaning an atomic layer deposition chamber are provided herein. In some embodiments, a chamber lid assembly includes: a housing enclosing a central channel that extends along a central axis and has an upper portion and a lower portion; a lid plate coupled to the housing and having a contoured bottom surface that extends downwardly and outwardly from a central opening coupled to the lower portion of the central channel to a peripheral portion of the lid plate; a first heating element to heat the central channel; a second heating element to heat the bottom surface of the lid plate; a remote plasma source fluidly coupled to the central channel; and an isolation collar coupled between the remote plasma source and the housing, wherein the isolation collar has an inner channel extending through the isolation collar to fluidly couple the remote plasma source and the central channel.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: September 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Anqing Cui, Faruk Gungor, Dien-Yeh Wu, Vikas Jangra, Muhammad M. Rasheed, Wei V. Tang, Yixiong Yang, Xiaoxiong Yuan, Kyoung-Ho Bu, Srinivas Gandikota, Yu Chang, William W. Kuang
  • Publication number: 20190229007
    Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the upper surface is substantially planar and the lower surface includes a stepped lower surface to define a radially outermost portion and a radially innermost portion of the upper edge ring.
    Type: Application
    Filed: January 16, 2019
    Publication date: July 25, 2019
    Inventors: MUHANNAD MUSTAFA, MUHAMMAD M. RASHEED, YU LEI, AVGERINOS V. GELATOS, VIKASH BANTHIA, VICTOR H. CALDERON, SHI WEI TOH, YUNG-HSIN LEE, ANINDITA SEN
  • Publication number: 20190078205
    Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.
    Type: Application
    Filed: November 9, 2018
    Publication date: March 14, 2019
    Inventors: Ravi Jallepally, Muhammad M. Rasheed, Ilker Durukan
  • Publication number: 20190078725
    Abstract: Embodiments of the present disclosure are directed to a gimbal assembly, that includes a gimbal plate having a central opening, a pivot screw disposed within a pivot mount formed in the gimbal plate, wherein the pivot screw includes a spherical pivot head about which the gimbal plate pivots, one or more motors coupled to the gimbal plate configured to provide in-situ gimbal plate motion about the spherical pivot head, and a plurality of leveling indicators configured that determine deflection of gimbal plate.
    Type: Application
    Filed: September 29, 2017
    Publication date: March 14, 2019
    Inventors: MUHANNAD MUSTAFA, MUHAMMAD M. RASHEED