Abstract: A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.

Abstract: A Micro-Electro-Mechanical System (MEMS) apparatus provides for self-calibration of mirror positioning of a moveable mirror of an interferometer. At least one mirror in the MEMS apparatus includes a non-planar surface. The moveable mirror is coupled to a MEMS actuator having a variable capacitance. The MEMS apparatus includes a capacitive sensing circuit for determining the capacitance of the MEMS actuator at multiple reference positions of the moveable mirror corresponding to a center burst and one or more secondary bursts of an interferogram produced by the interferometer based on the non-planar surface. A calibration module uses the actuator capacitances at the reference positions to compensate for any drift in the capacitive sensing circuit.

Abstract: A Micro-Electro-Mechanical System (MEMS) interferometer provides for self-calibration of mirror positioning of a moveable mirror. The moveable mirror is coupled to a MEMS actuator having a variable capacitance. The MEMS interferometer includes a capacitive sensing circuit for determining the capacitance of the MEMS actuator at two or more known positions of the moveable mirror and a calibration module for using the actuator capacitances at the known positions to compensate for any drift in the capacitive sensing circuit.

Abstract: A micro-optical bench device is fabricated by a process that provides control over one or more properties of the micro-optical bench device and/or one or more properties of optical surfaces in the micro-optical bench device. The process includes etching a substrate to form a permanent structure including optical elements and a temporary structure. The shape of the temporary structure and gaps between the temporary structure and permanent structure facilitate control of a property of the micro-optical bench and/or optical surfaces therein. The process further includes removing the temporary structure from an optical path of the micro-optical bench device.

Abstract: A Micro-Electro-Mechanical System (MEMS) apparatus provides for self-calibration of mirror positioning of a moveable mirror of an interferometer. At least one mirror in the MEMS apparatus includes a non-planar surface. The moveable mirror is coupled to a MEMS actuator having a variable capacitance. The MEMS apparatus includes a capacitive sensing circuit for determining the capacitance of the MEMS actuator at multiple reference positions of the moveable mirror corresponding to a center burst and one or more secondary bursts of an interferogram produced by the interferometer based on the non-planar surface. A calibration module uses the actuator capacitances at the reference positions to compensate for any drift in the capacitive sensing circuit.

Abstract: A Micro-Electro-Mechanical System (MEMS) interferometer provides for self-calibration of mirror positioning of a moveable mirror. The moveable mirror is coupled to a MEMS actuator having a variable capacitance. The MEMS interferometer includes a capacitive sensing circuit for determining the capacitance of the MEMS actuator at two or more known positions of the moveable mirror and a calibration module for using the actuator capacitances at the known positions to compensate for any drift in the capacitive sensing circuit.