Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: An integrated circuit device package with a first part (101) having a cavity (104) to mount the chip (105), further I/O terminals (102) on the top surface and terminals (103) on the bottom surface. The chip has contact pads (107a and 107b). The second part (110) of the package has bottom surface terminals (111) aligned with the chip contact pads, and bottom terminals (112) aligned with the terminals (102) of the first package part. The connections are provided by stud bumps between the chip contact pads and terminals (111), and by reflow material between terminals (102) and (112). The connector lines (109a and 109b) in the second package part (110) comprise signal/power and ground layers. The layers are spaced by insulation between 10 and 50 ?m thick, and the connector lines have a width less than three times the insulator thickness.

Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: A packaged integrated circuit which includes a die 700 having a surface and corners separated by edges. The die surface includes depressions 600, 720 so that mold compound 114 covering the die surface fills the depressions. The filling of the depressions in the die surface enhances the adhesion of the mold compound to the die. The die can include bond pads 714, in which case the depressions can take the form of slots 720 in the bond pads. In addition, the depressions can take the form of trenches 600 at the surface of the die in a dielectric layer 703. The trenches can be at the die corners and along the die edges.

Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: A semiconductor package comprising a die adjacent a substrate, a supporting plate adjacent the die, and a conducting plate abutting the supporting plate and electrically coupled to a metal apparatus adjacent the substrate and the die using a plurality of bond wires. The metal apparatus supplies power to the conducting plate.

Abstract: An integrated circuit device package with a first part (101) having a cavity (104) to mount the chip (105), further I/O terminals (102) on the top surface and terminals (103) on the bottom surface. The chip has contact pads (107a and 107b). The second part (110) of the package has bottom surface terminals (111) aligned with the chip contact pads, and bottom terminals (112) aligned with the terminals (102) of the first package part. The connections are provided by stud bumps between the chip contact pads and terminals (111), and by reflow material between terminals (102) and (112). The connector lines (109a and 109b) in the second package part (110) comprise signal/power and ground layers. The layers are spaced by insulation between 10 and 50 ?m thick, and the connector lines have a width less than three times the insulator thickness.

Abstract: An integrated circuit device package with a first part (101) having a cavity (104) to mount the chip (105), further I/O terminals (102) on the top surface and terminals (103) on the bottom surface. The chip has contact pads (107a and 107b). The second part (110) of the package has bottom surface terminals (111) aligned with the chip contact pads, and bottom terminals (112) aligned with the terminals (102) of the first package part. The connections are provided by stud bumps between the chip contact pads and terminals (111), and by reflow material between terminals (102) and (1.12). The connector lines (109a and 109b) in the second package part (110) comprise signal/power and ground layers. The layers are spaced by insulation between. 10 and 50 ?m thick, and the connector lines have a width less than three times the insulator thickness.

Abstract: An integrated circuit device package with a first part (101) having a cavity (104) to mount the chip (105), further I/O terminals (102) on the top surface and terminals (103) on the bottom surface. The chip has contact pads (107a and 107b). The second part (110) of the package has bottom surface terminals (111) aligned with the chip contact pads, and bottom terminals (112) aligned with the terminals (102) of the first package part. The connections are provided by stud bumps between the chip contact pads and terminals (111), and by reflow material between terminals (102) and (112). The connector lines (109a and 109b) in the second package part (110) comprise signal/power and ground layers. The layers are spaced by insulation between, 10 and 50 ?m thick, and the connector lines have a width less than three times the insulator thickness.

Abstract: A reinforcing system and method of fabrication for a semiconductor integrated circuit bond pad comprises a first dielectric layer or stack disposed under the bond pad; at least one second dielectric layer or stack disposed under the first dielectric layer; and a reinforcing metal structure disposed into the second dielectric layer such that the patterns of the metal structure and the second dielectric layer comprise a uniformly flat interface towards the first dielectric layer. The patterns of the metal structure and the second dielectric layer comprise feature sizes and fine pitches used in the integrated circuit.

Abstract: A packaged integrated circuit which includes a die 700 having a surface and corners separated by edges. The die surface includes depressions 600, 720 so that mold compound 114 covering the die surface fills the depressions. The filling of the depressions in the die surface enhances the adhesion of the mold compound to the die. The die can include bond pads 714, in which case the depressions can take the form of slots 720 in the bond pads. In addition, the depressions can take the form of trenches 600 at the surface of the die in a dielectric layer 703. The trenches can be at the die corners and along the die edges.

Abstract: The invention describes a high capacitance damascene capacitor. A etch-stop/capacitor dielectric layer 60 is sandwiched between two conductive plates 40 and 75 to form an integrated circuit capacitor. One metal plate 40 is copper formed using a damascene process. The high capacitance of the structure is due to the thin high k dielectric material used to form the etch-stop/capacitor dielectric layer 60.

Abstract: A reinforcing system for a bond which includes at least one dielectric layer or stack disposed under the bond pad. A reinforcing patterned structure is disposed in the dielectric layer or stack with the delectric filling the portion of the patterned structure from which the structure was removed after patterning.

Abstract: The invention describes a high capacitance damascene capacitor. A etch-stop/capacitor dielectric layer 60 is sandwiched between two conductive plates 40 and 75 to form an integrated circuit capacitor. One metal plate 40 is copper formed using a damascene process. The high capacitance of the structure is due to the thin high k dielectric material used to form the etch-stop/capacitor dielectric layer 60.

Abstract: A reinforcing system and method of fabrication for a semiconductor integrated circuit bond pad comprises a first dielectric layer or stack disposed under the bond pad; at least one second dielectric layer or stack disposed under the first dielectric layer; and a reinforcing metal structure disposed into the second dielectric layer such that the patterns of the metal structure and the second dielectric layer comprise a uniformly flat interface towards the first dielectric layer. The patterns of the metal structure and the second dielectric layer comprise feature sizes and fine pitches used in the integrated circuit.

Abstract: A reinforcing system and method of fabrication for a semiconductor integrated circuit bond pad comprises a first dielectric layer or stack disposed under the bond pad; at least one second dielectric layer or stack disposed under the first dielectric layer; and a reinforcing metal structure disposed into the second dielectric layer such that the patterns of the metal structure and the second dielectric layer comprise a uniformly flat interface towards the first dielectric layer. The patterns of the metal structure and the second dielectric layer comprise feature sizes and fine pitches used in the integrated circuit.

Abstract: A method of forming an electrical interconnect through a via to electrically couple two electrically conductive layers and the device. There are provided a pair of electrically conductive layers and an electrically insulating layer between the pair of electrically conductive layers having a via extending between the pair of electrically conductive layers. A layer of titanium is formed covering the walls of the via and extending onto one of the pair of electrically conductive layers. A thin layer of titanium nitride with a poor step ?? technique is formed covering the titanium on the walls but not covering the titanium on the one of the pair of electrically conductive layers. The remainder of the via is filled with aluminum. The layer of titanium and the layer of titanium nitride preferably extend out of the via and between the electrically insulating layer and at least one of the pair of electrically conductive layers.

Abstract: A reinforcing system and method of fabrication for a semiconductor integrated circuit bond pad comprises a first dielectric layer or stack disposed under the bond pad; at least one second dielectric layer or stack disposed under the first dielectric layer; and a reinforcing metal structure disposed into the second dielectric layer such that the patterns of the metal structure and the second dielectric layer comprise a uniformly flat interface towards the first dielectric layer. The patterns of the metal structure and the second dielectric layer comprise feature sizes and fine pitches used in the integrated circuit.