Abstract: An escape wheel (an example of a timepiece component) has a silicon-made substrate having an insertion portion into which an axle is inserted, and a coating film formed in a contact portion which comes into contact with at least the axle, at a surface of the substrate. The coating film contains metal alkoxide having a fluorine atom.

Abstract: Provided is a watch component made of silicon and including a front surface, a back surface, and a side surface intersecting with the front surface and the back surface, the watch component including a first recessed portion formed at the front surface side, a second recessed portion formed at the back surface side, and a communicating groove causing one of the first recessed portion and the second recessed portion to communicate with the side surface.

Abstract: A watch component includes a shaft member including a shaft and a flange portion formed to protrude in a direction intersecting with an axial direction of the shaft, a body portion made of silicon and provided with an insertion hole through which the shaft is inserted, and a fixing member mounted on the shaft at a side of the body portion opposite from the flange portion. The body portion includes an accommodating recessed portion configured to accommodate the flange portion, and is fixed to the shaft member by being interposed between the flange portion and the fixing member.

Abstract: Provided are a mechanical part, a timepiece having the mechanical part, and a method of manufacturing a mechanical part that suppresses separation and rotation of a rotating member to a staff member, and can be manufactured at a competitive cost. A escape wheel and pinion 35 as an example of a mechanical part has a staff member 102; an escape wheel 101 with a hole 115 to which the staff member 102 is inserted, and ribs 112 that extend toward the staff member 102; and an annular fastening member 130 that affixes the escape wheel 101 to the staff member 102. The fastening member 130 is disposed touching the ribs 112 and deforming to protrude into the hole 115.

Abstract: An escape wheel and pinion includes an escape wheel that has an axle, a web arm which holds the axle, and a rim which has a plurality of teeth. The web arm has a spoke which radially extends from the rim, and a comb including a radial spine and cross beams branching from the spoke.

Abstract: An escape wheel & pinion serving as a mechanical component includes an axle and an escape wheel serving as a rotary member having a holder for holding the axle. The axle has a recessed portion into which the holder is fitted. A tapered portion inclined in an axial direction of the axle is disposed in a portion where the recessed portion is in contact with the holder.

Abstract: A watch component includes a shaft member including a shaft and a flange portion formed to protrude in a direction intersecting with an axial direction of the shaft, a body portion made of silicon and provided with an insertion hole through which the shaft is inserted, and a fixing member mounted on the shaft at a side of the body portion opposite from the flange portion. The body portion includes an accommodating recessed portion configured to accommodate the flange portion, and is fixed to the shaft member by being interposed between the flange portion and the fixing member.

Abstract: Provided is a watch component made of silicon and including a front surface, a back surface, and a side surface intersecting with the front surface and the back surface, the watch component including a first recessed portion formed at the front surface side, a second recessed portion formed at the back surface side, and a communicating groove causing one of the first recessed portion and the second recessed portion to communicate with the side surface.

Abstract: An escape wheel (an example of a timepiece component) has a silicon-made substrate having an insertion portion into which an axle is inserted, and a coating film formed in a contact portion which comes into contact with at least the axle, at a surface of the substrate. The coating film contains metal alkoxide having a fluorine atom.

Abstract: An escape wheel & pinion serving as a mechanical component includes an axle and an escape wheel serving as a rotary member having a holder for holding the axle. The axle has a recessed portion into which the holder is fitted. A tapered portion inclined in an axial direction of the axle is disposed in a portion where the recessed portion is in contact with the holder.

Abstract: Provided are a mechanical part, a timepiece having the mechanical part, and a method of manufacturing a mechanical part that suppresses separation and rotation of a rotating member to a staff member, and can be manufactured at a competitive cost. A escape wheel and pinion 35 as an example of a mechanical part has a staff member 102; an escape wheel 101 with a hole 115 to which the staff member 102 is inserted, and ribs 112 that extend toward the staff member 102; and an annular fastening member 130 that affixes the escape wheel 101 to the staff member 102. The fastening member 130 is disposed touching the ribs 112 and deforming to protrude into the hole 115.

Abstract: An escape wheel and pinion includes an escape wheel that has an axle, a web arm which holds the axle, and a rim which has a plurality of teeth. The web arm has a spoke which radially extends from the rim, and a comb including a radial spine and cross beams branching from the spoke.

Abstract: An escape wheel serving as a mechanical component includes an axle member, and an escape gear portion serving as a rotation member which has a holding portion for holding the axle member, and a rim portion having a plurality of tooth portions. The holding portion has a plurality of projection portions formed to project into a through-hole into which the axle member is inserted. An elastic portion extending from between the projection portions adjacent to each other is provided between the holding portion and the rim portion.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.