Patents by Inventor Munekazu Komiya

Munekazu Komiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240038554
    Abstract: The EFEM comprises: a transfer chamber in which a transfer robot is disposed, a first fan that forms a downward air flow in the transfer chamber, a gas return space that circulates the gas flowing downward in the transfer chamber above the first fan, a box that communicates with the transfer chamber and is provided with a gas outlet, and a connecting and disconnecting means configured to switch connection and disconnection of the box to and from the transport chamber. A circulation path in which gas circulates is formed by the transfer chamber, the gas return space, and the box. When the transfer chamber and the box are separated by the connecting and disconnecting means, a shortened circulation path is formed in which the gas circulates without passing through the box.
    Type: Application
    Filed: October 11, 2023
    Publication date: February 1, 2024
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 11823923
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Grant
    Filed: July 8, 2022
    Date of Patent: November 21, 2023
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Publication number: 20220344182
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Application
    Filed: July 8, 2022
    Publication date: October 27, 2022
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 11424145
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: August 23, 2022
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 10930537
    Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: February 23, 2021
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
  • Patent number: 10923372
    Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.
    Type: Grant
    Filed: August 19, 2016
    Date of Patent: February 16, 2021
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
  • Publication number: 20200312686
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Application
    Filed: April 10, 2020
    Publication date: October 1, 2020
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 10672632
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: June 2, 2020
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Publication number: 20200168495
    Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.
    Type: Application
    Filed: January 28, 2020
    Publication date: May 28, 2020
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Tkashi SHIGETA
  • Patent number: 10658217
    Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: May 19, 2020
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Patent number: 10586723
    Abstract: A door opening/closing system includes: a base as part of a wall isolating a conveyance space from an external space; an opening portion provided in the base; a door configured to open/close the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door; a sealed space constituted by the base, the first and second seal members, a lid member, and the door when the container state of contact with the opening portion with the first seal member therebetween; a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit which evacuates the sealed space. The door opening/closing system prevents entry of atmospheric air into a front-opening unified pod and an equipment front end module when placed in communication.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: March 10, 2020
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
  • Publication number: 20180254209
    Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.
    Type: Application
    Filed: August 19, 2016
    Publication date: September 6, 2018
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Takashi SHIGETA
  • Publication number: 20180204753
    Abstract: A door opening/closing system includes: a base as part of a wall isolating a conveyance space from an external space; an opening portion provided in the base; a door configured to open/close the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door; a sealed space constituted by the base, the first and second seal members, a lid member, and the door when the container state of contact with the opening portion with the first seal member therebetween; a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit which evacuates the sealed space. The door opening/closing system prevents entry of atmospheric air into a front-opening unified pod and an equipment front end module when placed in communication.
    Type: Application
    Filed: July 12, 2016
    Publication date: July 19, 2018
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Takashi SHIGETA
  • Publication number: 20180047602
    Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.
    Type: Application
    Filed: February 5, 2016
    Publication date: February 15, 2018
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
  • Publication number: 20180040493
    Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).
    Type: Application
    Filed: February 5, 2016
    Publication date: February 8, 2018
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama