Patents by Inventor Munekazu Komiya
Munekazu Komiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240038554Abstract: The EFEM comprises: a transfer chamber in which a transfer robot is disposed, a first fan that forms a downward air flow in the transfer chamber, a gas return space that circulates the gas flowing downward in the transfer chamber above the first fan, a box that communicates with the transfer chamber and is provided with a gas outlet, and a connecting and disconnecting means configured to switch connection and disconnection of the box to and from the transport chamber. A circulation path in which gas circulates is formed by the transfer chamber, the gas return space, and the box. When the transfer chamber and the box are separated by the connecting and disconnecting means, a shortened circulation path is formed in which the gas circulates without passing through the box.Type: ApplicationFiled: October 11, 2023Publication date: February 1, 2024Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Patent number: 11823923Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: July 8, 2022Date of Patent: November 21, 2023Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Publication number: 20220344182Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: ApplicationFiled: July 8, 2022Publication date: October 27, 2022Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Patent number: 11424145Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: April 10, 2020Date of Patent: August 23, 2022Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Patent number: 10930537Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.Type: GrantFiled: January 28, 2020Date of Patent: February 23, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
-
Patent number: 10923372Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.Type: GrantFiled: August 19, 2016Date of Patent: February 16, 2021Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
-
Publication number: 20200312686Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: ApplicationFiled: April 10, 2020Publication date: October 1, 2020Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Patent number: 10672632Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: GrantFiled: February 5, 2016Date of Patent: June 2, 2020Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Publication number: 20200168495Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system.Type: ApplicationFiled: January 28, 2020Publication date: May 28, 2020Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Tkashi SHIGETA
-
Patent number: 10658217Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.Type: GrantFiled: February 5, 2016Date of Patent: May 19, 2020Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Patent number: 10586723Abstract: A door opening/closing system includes: a base as part of a wall isolating a conveyance space from an external space; an opening portion provided in the base; a door configured to open/close the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door; a sealed space constituted by the base, the first and second seal members, a lid member, and the door when the container state of contact with the opening portion with the first seal member therebetween; a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit which evacuates the sealed space. The door opening/closing system prevents entry of atmospheric air into a front-opening unified pod and an equipment front end module when placed in communication.Type: GrantFiled: July 12, 2016Date of Patent: March 10, 2020Assignee: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Yasushi Taniyama, Munekazu Komiya, Takashi Shigeta
-
Publication number: 20180254209Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.Type: ApplicationFiled: August 19, 2016Publication date: September 6, 2018Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Takashi SHIGETA
-
Publication number: 20180204753Abstract: A door opening/closing system includes: a base as part of a wall isolating a conveyance space from an external space; an opening portion provided in the base; a door configured to open/close the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door; a sealed space constituted by the base, the first and second seal members, a lid member, and the door when the container state of contact with the opening portion with the first seal member therebetween; a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit which evacuates the sealed space. The door opening/closing system prevents entry of atmospheric air into a front-opening unified pod and an equipment front end module when placed in communication.Type: ApplicationFiled: July 12, 2016Publication date: July 19, 2018Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro KAWAI, Yasushi TANIYAMA, Munekazu KOMIYA, Takashi SHIGETA
-
Publication number: 20180047602Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.Type: ApplicationFiled: February 5, 2016Publication date: February 15, 2018Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama
-
Publication number: 20180040493Abstract: To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).Type: ApplicationFiled: February 5, 2016Publication date: February 8, 2018Applicant: SINFONIA TECHNOLOGY CO., LTD.Inventors: Toshihiro Kawai, Takashi Shigeta, Munekazu Komiya, Yasushi Taniyama