Patents by Inventor Munekazu Motoyama

Munekazu Motoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8883266
    Abstract: A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
    Type: Grant
    Filed: June 11, 2013
    Date of Patent: November 11, 2014
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Honda Patents & Technologies North America, LLC
    Inventors: Timothy P. Holme, Andrei Iancu, Hee Joon Jung, Michael C Langston, Munekazu Motoyama, Friedrich B. Prinz, Takane Usui, Hitoshi Iwadate, Neil Dasgupta, Cheng-Chieh Chao
  • Publication number: 20140093654
    Abstract: A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
    Type: Application
    Filed: June 11, 2013
    Publication date: April 3, 2014
    Inventors: Timothy P. Holme, Andrei Iancu, Hee Joon Jung, Michael C. Langston, Munekazu Motoyama, Friedrich B. Prinz, Takane Usui, Hitoshi Iwadate, Neil Dasgupta, Cheng-Chieh Chao
  • Patent number: 8551868
    Abstract: A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: October 8, 2013
    Assignees: The Board of Trustees of the Leland Stanford Junior Universit, Honda Patents & Technologies North America, LLC
    Inventors: Timothy P. Holme, Andrei Iancu, Hee Joon Jung, Michael C Langston, Munekazu Motoyama, Friedrich B. Prinz, Takane Usui, Hitoshi Iwadate, Neil Dasgupta, Cheng-Chieh Chao
  • Patent number: 8168251
    Abstract: A method of making nanowire probes is provided. The method includes providing a template having a nanoporous structure, providing a probe tip that is disposed on top of the template, and growing nanowires on the probe tip, where the nanowires are grown from the probe tip along the nanopores, and the nanowires conform to the shape of the nanopores.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: May 1, 2012
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Honda Motor Co., Ltd
    Inventors: Friedrich B. Prinz, Neil Dasgupta, Munekazu Motoyama
  • Publication number: 20110269298
    Abstract: A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
    Type: Application
    Filed: March 24, 2011
    Publication date: November 3, 2011
    Inventors: Timothy P. Holme, Andrei Iancu, Hee Joon Jung, Michael C Langston, Munekazu Motoyama, Friedrich B. Prinz, Takane Usui, Hitoshi Iwadate, Neil Dasgupta, Cheng-Chieh Chao
  • Patent number: 8007650
    Abstract: Disclosed is a low-cost, high quality metal nanotube comprising Ni, Fe, Co or the like. A metal thin film having a thickness of 10 to 80 nm is formed as a cathode on one surface of a film having penetrated holes, and an electrolyte solution is filled between an anode and the cathode to which a voltage is applied. Metal ions in the electrolyte solution are electrochemically deposited on the walls of the penetrated holes, thereby forming metal nanotubes. A thermoplastic resin porous film such as a polycarbonate film, an alumina porous film or aluminum anodic oxide film may be used as the film, and the diameters of the penetrated holes are preferably 15 to 500 nm. The metal thin film can be formed by sputtering, and preferably comprises a platinum-palladium alloy. The electrochemical processing of nanostructured tailored materials is a unique technique.
    Type: Grant
    Filed: October 13, 2004
    Date of Patent: August 30, 2011
    Inventors: Yasuhiro Fukunaka, Yoko Konishi, Munekazu Motoyama, Ryuji Ishii
  • Publication number: 20100183948
    Abstract: The present invention provides solid oxide fuel cell that includes an electrolyte membrane, a first electrode layer, and a second electrode layer, where the electrolyte membrane is disposed between the first electrode layer and the second electrode layer. The electrolyte membrane includes a solid electrolyte structure having at least two solid electrolyte nanoscopic closed-end tubes, where an open-ended base of each solid electrolyte nanoscopic closed-end tube is connected by a solid electrolyte layer.
    Type: Application
    Filed: December 7, 2009
    Publication date: July 22, 2010
    Inventors: Cheng-Chieh Chao, Turgut M. Gür, Munekazu Motoyama, Friedrich B. Prinz, Joon Hyung Shim, Joong Sun Park
  • Publication number: 20100089866
    Abstract: A method of making nanowire probes is provided. The method includes providing a template having a nanoporous structure, providing a probe tip that is disposed on top of the template, and growing nanowires on the probe tip, where the nanowires are grown from the probe tip along the nanopores, and the nanowires conform to the shape of the nanopores.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 15, 2010
    Inventors: Friedrich B. Prinz, Neil Dasgupta, Munekazu Motoyama
  • Publication number: 20070284257
    Abstract: Disclosed is a low-cost, high quality metal nanotube comprising Ni, Fe, Co or the like. A metal thin film having a thickness of 10 to 80 nm is formed as a cathode on one surface of a film having penetrated holes, and an electrolyte solution is filled between an anode and the cathode to which a voltage is applied. Metal ions in the electrolyte solution are electrochemically deposited on the walls of the penetrated holes, thereby forming metal nanotubes. A thermoplastic resin porous film such as a polycarbonate film, an alumina porous film or aluminum anodic oxide film may be used as the film, and the diameters of the penetrated holes are preferably 15 to 500 nm. The metal thin film can be formed by sputtering, and preferably comprises a platinum-palladium alloy. The electrochemical processing of nanostructured tailored materials is a unique technique.
    Type: Application
    Filed: October 13, 2004
    Publication date: December 13, 2007
    Inventors: Yasuhiro Fukunaka, Munekazu Motoyama, Ryuji Ishii