Patents by Inventor Muneto SAITO

Muneto SAITO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of making pattern data, and medium for storing the program for making the pattern data
    Patent number: 8739075
    Abstract: A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.
    Type: Grant
    Filed: March 17, 2009
    Date of Patent: May 27, 2014
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Muneto Saito, Koichi Suzuki, Mitsuo Sakurai, Norimasa Nagase
  • METHOD OF MAKING PATTERN DATA, AND MEDIUM FOR STORING THE PROGRAM FOR MAKING THE PATTERN DATA
    Publication number: 20090241086
    Abstract: A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.
    Type: Application
    Filed: March 17, 2009
    Publication date: September 24, 2009
    Applicant: FUJITSU MICROELECTRONICS LIMITED
    Inventors: Muneto SAITO, Koichi Suzuki, Mitsuo Sakurai, Norimasa Nagase