Patents by Inventor Mung Chen

Mung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multilayer photoresist process utilizing an absorbant dye
    Patent number: 4362809
    Abstract: An improved photoetch technique is presented of the portable-conformable-mask type wherein a thin top layer of resist and a thick planarizing layer are deposited on a substrate and the thin layer is exposed and developed to produce a portable-conformable-mask. The improvement involves dissolving a suitable dye in a layer between the thin top layer and the substrate. The dye is preferably selected to absorb light of the wavelengths used to expose the top layer but does not interfere with processing of the other layers.
    Type: Grant
    Filed: March 30, 1981
    Date of Patent: December 7, 1982
    Assignee: Hewlett-Packard Company
    Inventors: Mung Chen, William R. Trutna, Jr., Michael P. C. Watts, Keith G. Bartlett, Gary Hillis