Abstract: Provided is a method of forming reference information for defining a fault pattern of equipment, and monitoring equipment. One example embodiment method may include performing an angle spectrum analysis by re-classifying fault points distributed on a plane, the plane including a first component axis and a second component axis, and the re-classifying fault points including calculating an angle for each of the fault points with reference to any one of the first component axis and the second component axis of the plane, and forming a reference fault pattern for defining a fault pattern of the re-classified fault points.

Abstract: Provided is a method of forming reference information for defining a fault pattern of equipment, and monitoring equipment. One example embodiment method may include performing an angle spectrum analysis by re-classifying fault points distributed on a plane, the plane including a first component axis and a second component axis, and the re-classifying fault points including calculating an angle for each of the fault points with reference to any one of the first component axis and the second component axis of the plane, and forming a reference fault pattern for defining a fault pattern of the re-classified fault points.

Abstract: An input parameter monitoring apparatus is disclosed wherein input parameters for ion implantation can be stored in a database during an ion implantation process, thereby allowing a user to monitor the operational history from a remote location. A method of monitoring input parameters created during an ion implantation process in a semiconductor fabricating device includes collecting log data generated by a plurality of ion implantation devices, listing the collected log data in a database in chronological order and updating the database substantially contemporaneously during said process. The log data can be processed to enable textual or graphical display. A LAN connects a local computer connected via input ports to plural ion-imp devices and a remote computer, thereby enabling remote computer monitoring of the operational process and possibly interaction.

Abstract: An input parameter monitoring apparatus is disclosed wherein input parameters for ion implantation can be stored in a database during an ion implantation process, thereby allowing a user to monitor the operational history from a remote location. A method of monitoring input parameters created during an ion implantation process in a semiconductor fabricating device includes collecting log data generated by a plurality of ion implantation devices, listing the collected log data in a database in chronological order and updating the database substantially contemporaneously during said process. The log data can be processed to enable textual or graphical display. A LAN connects a local computer connected via input ports to plural ion-imp devices and a remote computer, thereby enabling remote computer monitoring of the operational process and possibly interaction.