Patents by Inventor Munirathna Padmanaban

Munirathna Padmanaban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11031237
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 8, 2021
    Assignee: Merck Patent GMbH
    Inventors: Sachin Bobade, Orest Polishchuk, Munirathna Padmanaban, Durairaj Baskaran
  • Publication number: 20200273701
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Application
    Filed: October 23, 2018
    Publication date: August 27, 2020
    Inventors: Sachin BOBADE, Orest POLISHCHUK, Munirathna PADMANABAN, Durairaj BASKARAN
  • Publication number: 20200087534
    Abstract: The present invention relates a coating composition comprising a solvent, metal oxide nanoparticles dispersed in this solvent, a high carbon polymer dissolved in this solvent, where the high carbon polymer comprises a repeat unit of structure (1), a hydroxybiphenyl repeat unit of structure (2) and an moiety containing a fused aromatic containing moiety of structure (3) wherein R1 and R2 are independently selected from the group consisting of hydrogen, an alkyl and a substituted alkyl, Ar is an unsubstituted or substituted fused aromatic ring and X1 is an alkylene spacer, or a direct valence bound. The invention also relates to a processes where this composition is used in lithographic applications as a patterned hard mask either through and inverse tone hard mask pattern transfer process or a conventional mask pattern process using a photoresist, to pattern the hard mask and a hard mask to pattern a semiconductor substrate with a plasma.
    Type: Application
    Filed: December 19, 2017
    Publication date: March 19, 2020
    Inventors: M. Dalil RAHMAN, Huirong YAO, JoonYeon CHO, Munirathna PADMANABAN, Elizabeth WOLFER
  • Patent number: 9418836
    Abstract: The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: August 16, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Venkata Gopal Reddy Chada, Huirong Yao, Munirathna Padmanaban, JoonYeon Cho, Elizabeth Wolfer, Alberto D. Dioses, Salem K. Mullen
  • Patent number: 9409793
    Abstract: The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(?O)—), alkylcarbonyloxy (alkyl-C(?O)—O—), alkyloxycarbonyl (alkyl-O—C(?O)—), alkyloxycarbonyloxy (alkyl-O—C(?O)—O—) and mixtures of these; and a solvent. The present invention further relates to processes using the novel compositions.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: August 9, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Venkata Gopal Reddy Chada, Huirong Yao, Salem Mullen, Elizabeth Wolfer, Alberto D. Dioses, JoonYeon Cho, Munirathna Padmanaban
  • Patent number: 9315636
    Abstract: The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: April 19, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong Yao, M. Dalil Rahman, Salem K. Mullen, JoonYeon Cho, Clement Anyadiegwu, Munirathna Padmanaban
  • Patent number: 9296922
    Abstract: The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: March 29, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong Yao, Salem K. Mullen, Elizabeth Wolfer, Douglas McKenzie, JoonYeon Cho, Munirathna Padmanaban
  • Patent number: 9274426
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: March 1, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban, Salem K. Mullen
  • Publication number: 20150309410
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: June 4, 2014
    Publication date: October 29, 2015
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. MULLEN
  • Publication number: 20150309403
    Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.
    Type: Application
    Filed: April 29, 2014
    Publication date: October 29, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. Mullen
  • Publication number: 20150200091
    Abstract: The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.
    Type: Application
    Filed: July 29, 2014
    Publication date: July 16, 2015
    Inventors: Venkata Gopal Reddy CHADA, Huirong YAO, Munirathna PADMANABAN, JoonYeon CHO, Elizabeth WOLFER, Alberto D. DIOSES, Salem K. MULLEN
  • Publication number: 20150200090
    Abstract: The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(?O)—), alkylcarbonyloxy (alkyl-C(?O)—O—), alkyloxycarbonyl (alkyl-O—C(?O)—), alkyloxycarbonyloxy (alkyl-O—C(?O)—O—) and mixtures of these; and a solvent. The present invention further relates to processes using the novel compositions.
    Type: Application
    Filed: January 14, 2014
    Publication date: July 16, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Venkata Gopal Reddy CHADA, Huirong YAO, Salem MULLEN, Elizabeth WOLFER, Alberto D. DIOSES, JoonYeon CHO, Munirathna PADMANABAN
  • Publication number: 20150064904
    Abstract: The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to a compounds having the following structure (I): wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable composition of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.
    Type: Application
    Filed: August 30, 2013
    Publication date: March 5, 2015
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong YAO, Salem K. MULLEN, Elizabeth WOLFER, Douglas MCKENZIE, JoonYeon CHO, Munirathna PADMANABAN
  • Patent number: 8900797
    Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: December 2, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Shigemasa Nakasugi, Shinji Miyazaki, Munirathna Padmanaban, Alberto D. Dioses
  • Patent number: 8796398
    Abstract: There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: August 5, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Jin Li, Toru Koike, Yusuke Takano, Kazunori Kurosawa
  • Publication number: 20140193753
    Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
    Type: Application
    Filed: February 19, 2014
    Publication date: July 10, 2014
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Shigemasa NAKASUGI, Kazuma YAMAMOTO, Shinji MIYAZAKI, Munirathna PADMANABAN, Srinivasan CHAKRAPANI
  • Publication number: 20140159278
    Abstract: The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.
    Type: Application
    Filed: December 7, 2012
    Publication date: June 12, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong YAO, M. Dalil RAHMAN, Salem K. MULLEN, JoonYeon CHO, Clement ANYADIEGWU, Munirathna PADMANABAN
  • Patent number: 8697336
    Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: April 15, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Shigemasa Nakasugi, Kazuma Yamamoto, Yasushi Akiyama, Shinji Miyazaki, Munirathna Padmanaban, Srinivasan Chakrapani
  • Publication number: 20140087311
    Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.
    Type: Application
    Filed: September 26, 2012
    Publication date: March 27, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Shigemasa NAKASUGI, Shinji MIYAZAKI, Munirathna PADMANABAN, Alberto D. DIOSES
  • Patent number: 8632948
    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: January 21, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser