Abstract: A chromium plating method wherein an article to be plated is immersed in an acidic chromium electroplating bath and electrolysis is carried out using a positive electrode that has an iridium oxide-containing film at least on the surface. The acidic chromium electroplating bath contains a trivalent chromium compound and a hexavalent chromium compound at a ratio such that the total chromium concentration of trivalent chromium and hexavalent chromium is 60-140 g/L, the hexavalent chromium concentration is 5-40 g/L, and the ratio of the hexavalent chromium concentration is 5-35% by mass of the total chromium concentration, while containing 50-400 g/L of organic carboxylate ions and having a lead ion concentration of not more than 2 mg/L. By the method, a chromium plating film that is good and stable over a long time period can be obtained. In addition, the plating bath can be controlled extremely easily in the chromium plating method.