Patents by Inventor Mustafa Amhaouch

Mustafa Amhaouch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Patent number: 7423721
    Abstract: A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Mustafa Amhaouch, Wilhelmus Josephus Box, Johannes Henricus Wilhelmus Jacobs, Hernes Jacobs, Marius Ravensbergen, Martinus Arnoldus Henricus Terken, Robert Gordon Livesey, Franciscus Catharina Bernardus Marinus Van Vroonhoven
  • Lithographic apparatus and method of manufacturing a device and method of performing maintenance
    Patent number: 7078708
    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: July 18, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Pertrus Rutgerus Bartray, Mustafa Amhaouch, Angelo Alexander Michael Van Engelen, Paulus Martinus Maria Liebregts, Tim Anton Johan Meesters, Franciscus Catharina Bernardus Marinus Van Vroonhoven
  • Lithographic apparatus
    Publication number: 20060126041
    Abstract: A vacuum operated lithographic apparatus is disclosed. The apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
    Type: Application
    Filed: December 15, 2004
    Publication date: June 15, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Van Dijsseldonk, Mustafa Amhaouch, Wilhelmus Box, Johannes Jacobs, Hernes Jacobs, Marius Ravensbergen, Martinus Arnoldus Terken, Robert Livesey, Franciscus Catharina Van Vroonhoven
  • Lithographic apparatus and method of manufacturing a device and method of performing maintenance
    Publication number: 20050139784
    Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
    Type: Application
    Filed: December 24, 2003
    Publication date: June 30, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pertrus Bartray, Mustafa Amhaouch, Angelo Van Engelen, Paulus Liebregts, Tim Meesters