Patents by Inventor Muthiah Thiyagarajan
Muthiah Thiyagarajan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11760867Abstract: The present disclosure provides compositions and products formed therefrom. In particular, the disclosure provides polymer compositions and hydrogel-latex compositions in particular. Such compositions can include a water-soluble polymer, a natural or synthetic rubber latex, and a rheological stabilizer. The present disclosure further provides products and articles that include a coating layer of the polymer composition on at least a portion of a surface thereof. The coating formed of the polymer composition can impart improved properties to the product or article, such as improved moisture absorption, improved lubricity, and the like.Type: GrantFiled: December 17, 2020Date of Patent: September 19, 2023Assignee: Church & Dwight Co., Inc.Inventors: Jon Toliver, Rajesh Ranjan, Muthiah Thiyagarajan
-
Publication number: 20210189103Abstract: The present disclosure provides compositions and products formed therefrom. In particular, the disclosure provides polymer compositions and hydrogel-latex compositions in particular. Such compositions can include a water-soluble polymer, a natural or synthetic rubber latex, and a rheological stabilizer. The present disclosure further provides products and articles that include a coating layer of the polymer composition on at least a portion of a surface thereof. The coating formed of the polymer composition can impart improved properties to the product or article, such as improved moisture absorption, improved lubricity, and the like.Type: ApplicationFiled: December 17, 2020Publication date: June 24, 2021Applicant: Church & Dwight Co., Inc.Inventors: Jon Toliver, Rajesh Ranjan, Muthiah Thiyagarajan
-
Publication number: 20210189104Abstract: The present disclosure provides compositions and products formed therefrom. In particular, the disclosure provides elastomeric latex articles, such as gloves and condoms, that can be prepared utilizing a styrene-polyisoprene-styrene (SIS) latex. The elastomeric articles can exhibit desired tensile properties while being substantially or completely free of undesired components, such as sulfur and zinc oxide, which can be allergens. The disclosure further provides methods of preparing elastomeric latex articles.Type: ApplicationFiled: December 17, 2020Publication date: June 24, 2021Applicant: Church & Dwight Co., Inc.Inventors: Muthiah Thiyagarajan, Rajesh Ranjan, Carmen Guzman, Jon Toliver, Steven T. Adamy
-
Publication number: 20210189106Abstract: The present disclosure provides compositions and products formed therefrom. In particular, the disclosure provides elastomeric latex articles, such as gloves and condoms, that can exhibit a desired combination of properties that can be correlated to suitable strength and softness.Type: ApplicationFiled: December 17, 2020Publication date: June 24, 2021Applicant: Church & Dwight Co., Inc.Inventors: Muthiah Thiyagarajan, Carmen Guzman, Jon Toliver, John Ip
-
Patent number: 9291909Abstract: The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.Type: GrantFiled: May 17, 2013Date of Patent: March 22, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng Wu, SungEun Hong, Yi Cao, Jian Yin, Margareta Paunescu, Muthiah Thiyagarajan
-
Patent number: 9040659Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.Type: GrantFiled: February 7, 2014Date of Patent: May 26, 2015Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Jian Yin, Hengpeng Wu, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao
-
Publication number: 20140342290Abstract: The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.Type: ApplicationFiled: May 17, 2013Publication date: November 20, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng WU, SungEun HONG, Yi CAO, Jian YIN, Margareta PAUNESCU, Muthiah THIYAGARAJAN
-
Publication number: 20140151330Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.Type: ApplicationFiled: February 7, 2014Publication date: June 5, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Jian YIN, Hengpeng WU, Muthiah THIYAGARAJAN, SungEun HONG, Mark NEISSER, Yi CAO
-
Patent number: 8686109Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.Type: GrantFiled: March 9, 2012Date of Patent: April 1, 2014Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Jian Yin, Hengpeng Wu, Muthiah Thiyagarajan, SungEun Hong, Mark Neisser, Yi Cao
-
Publication number: 20130233827Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.Type: ApplicationFiled: March 9, 2012Publication date: September 12, 2013Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Jian YIN, Hengpeng WU, Muthiah THIYAGARAJAN, SungEun HONG, Mark NEISSER, Yi CAO
-
Publication number: 20120219919Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.Type: ApplicationFiled: February 24, 2011Publication date: August 30, 2012Inventors: Muthiah Thiyagarajan, Ralph R. Dammel, Yi Cao, SungEun Hong, WenBing Kang, Clement Anyadiegwu
-
Patent number: 8252503Abstract: Photoresist compositions are disclosed.Type: GrantFiled: August 24, 2007Date of Patent: August 28, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
-
Patent number: 7923200Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), ?represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.Type: GrantFiled: April 9, 2007Date of Patent: April 12, 2011Assignee: AZ Electronic Materials USA Corp.Inventors: Muthiah Thiyagarajan, Ralph R. Dammel, Yi Cao, SungEun Hong, WenBing Kang, Clement Anyadiegwu
-
Publication number: 20100183851Abstract: A process for forming a double photoresist pattern is disclosed.Type: ApplicationFiled: January 21, 2009Publication date: July 22, 2010Inventors: Yi Cao, Muthiah Thiyagarajan, SungEun Hong, DongKwan Lee, Meng Li, David Mikrut
-
Patent number: 7745077Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.Type: GrantFiled: June 18, 2008Date of Patent: June 29, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Muthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
-
Publication number: 20090317739Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.Type: ApplicationFiled: June 18, 2008Publication date: December 24, 2009Inventors: Muthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
-
Publication number: 20090053652Abstract: Photoresist compositions are disclosed.Type: ApplicationFiled: August 24, 2007Publication date: February 26, 2009Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
-
Publication number: 20080248427Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.Type: ApplicationFiled: April 9, 2007Publication date: October 9, 2008Inventors: Muthiah Thiyagarajan, Ralph R. Dammel, Yi Cao, SungEun Hong, WenBing Kang, Clement Anyadiegwu