Abstract: The present disclosure provides a method to provide a conductive bus bar on a patterned transparent conductor, such as ITO traces used for touch screen manufacturing. The method can be a cheaper and a more convenient technique to pattern a conductive metal or metal alloy, such as copper, silver, or a copper/silver/titanium alloy, on ITO electrodes in a roll-to-roll process.

Abstract: A device including a transparent or semitransparent substrate and at least one layered structure disposed on a first major surface of the substrate is described. The layered structure includes a first ITO layer on the substrate, a silicon dioxide layer on the first ITO layer opposite the substrate, and a second ITO layer on the silicon dioxide layer opposite the first ITO layer. The silicon dioxide layer includes an edge that is offset inwardly from an edge of the first ITO layer and from an edge of the second ITO layer. Methods of making the device are described.

Abstract: A reflection sheet and a method of manufacturing a reflection sheet are disclosed. The reflection sheet comprises a substrate layer and a reflective layer formed on the substrate layer, wherein the reflective layer comprises an alloy consisting of silver (Ag), palladium (Pd) and neodymium (Nd).

Abstract: Provided is a touch panel comprising: a transparent substrate, a transparent conductive material disposed on the 5 substrate, and a Ag—Pd—Nd alloy layer disposed on the transparent conductive material. Provided are also a preparation method of the touch panel and a display comprising the touch panel. Provided are also a Ag—Pd—Nd alloy for touch panel, comprising: 97.9 to 99.2 weight % of Ag, 0.7 to 1.8 weight % of Pd, and 0.1 to 0.3 weight % of Nd, based on 100 weight % of the alloy.

Abstract: The invention relates to a method for patterning one or more portions of a microstructure comprised of a flexible substrate, a conductor disposed on the substrate, and a metal layer disposed on the conductor, wherein the conductor is comprised of a stack of a first and a second transparent conductive oxide (TCO) layer, and a metal doped silicon oxide layer sandwiched between the two TCO layers.

Abstract: A capacitive touch screen sensor 104 is disclosed. The sensor 104 comprises an array of drive electrodes 100, an array of sense electrodes 102 separated from the array of drive electrodes by a dielectric layer 200, each sense electrode 102 being offset from each drive electrode 100 to define respective overlapping regions 112 and first non-overlapping regions 113, and a plurality of non-electrically connected electrodes 402, each non-electrically connected electrode 402 being arranged to correspond to each first non-overlapping region 113 and spaced from adjacent drive 100 or sense electrodes 102 by a perimeter gap 404. The perimeter gap 404 may have a width of about 100 um or less. A related touch panel and method of fabricating the same are also disclosed.

Abstract: In one embodiment a transparent conductive component is described comprising a flexible transparent substrate; a transparent conductive layer disposed on the flexible transparent substrate; and a plurality of metal traces disposed on and in electrical communication with the transparent conductive layer. A portion of the flexible transparent substrate comprising the transparent conductive layer and metal traces forms an interconnect circuit tab. At least the interconnect circuit tab comprises a cured organic polymeric material disposed on the (e.g. patterned) transparent conductive layer and metal traces metal traces and flexible transparent substrate such that the cured organic polymeric material forms an exposed surface layer. The cured organic polymeric material is optionally disposed at the bezel region and/or at a central region of the transparent conductive component (e.g. touch sensor).

Abstract: A device including a transparent or semitransparent substrate and at least one layered structure disposed on a first major surface of the substrate is described. The layered structure includes a first ITO layer on the substrate, a silicon dioxide layer on the first ITO layer opposite the substrate, and a second ITO layer on the silicon dioxide layer opposite the first ITO layer. The silicon dioxide layer includes an edge that is offset inwardly from an edge of the first ITO layer and from an edge of the second ITO layer. Methods of making the device are described.

Abstract: In one embodiment a transparent conductive component is described comprising a flexible transparent substrate; a transparent conductive layer disposed on the flexible transparent substrate; and a plurality of metal traces disposed on and in electrical communication with the transparent conductive layer. A portion of the flexible transparent substrate comprising the transparent conductive layer and metal traces forms an interconnect circuit tab. At least the interconnect circuit tab comprises a cured organic polymeric material disposed on the (e.g. patterned) transparent conductive layer and metal traces metal traces and flexible transparent substrate such that the cured organic polymeric material forms an exposed surface layer. The cured organic polymeric material is optionally disposed at the bezel region and/or at a central region of the transparent conductive component (e.g. touch sensor).

Abstract: A reflection sheet and a method of manufacturing a reflection sheet are disclosed. The reflection sheet comprises a substrate layer and a reflective layer formed on the substrate layer, wherein the reflective layer comprises an alloy consisting of silver (Ag), palladium (Pd) and neodymium (Nd).

Abstract: The present disclosure provides a method to provide a conductive bus bar on a patterned transparent conductor, such as ITO taces used for touch screen manufacturing. The method can be a cheaper and a more convenient technique to pattern a conductive metal or metal alloy, such as copper, silver, or a copper/silver/titanium alloy, on ITO electrodes in a roll-to-roll process.

Abstract: An article includes a multilayer structure, such as, e.g., a touch sensor, having two opposing sides and comprising a central polymeric UV transparent substrate, a transparent conductive layer on each of the two major opposing surfaces of the polymeric substrate, a metallic conductive layer on each transparent conductive layer, and a patterned photoimaging mask on each metallic conductive layer.

Abstract: The invention relates to a method of etching a portion of a metal layer of a microstructure comprised of the metal layer disposed on a transparent conducting oxide (TCO) layer, and in particular, to selectively etching the portion of the metal layer and not the TCO layer.

Abstract: The invention relates to a method for patterning one or more portions of a microstructure comprised of a flexible substrate, a conductor disposed on the substrate, and a metal layer disposed on the conductor, wherein the conductor is comprised of a stack of a first and a second transparent conductive oxide (TCO) layer, and a metal doped silicon oxide layer sandwiched between the two TCO layers.

Abstract: Provided is a touch panel comprising: a transparent substrate, a transparent conductive material disposed on the 5 substrate, and a Ag—Pd—Nd alloy layer disposed on the transparent conductive material. Provided are also a preparation method of the touch panel and a display comprising the touch panel. Provided are also a Ag—Pd—Nd alloy for touch panel, comprising: 97.9 to 99.2 weight % of Ag, 0.7 to 1.8 weight % of Pd, and 0.1 to 0.3 weight % of Nd, based on 100 weight % of the alloy.

Abstract: A capacitive touch screen sensor 104 is disclosed. The sensor 104 comprises an array of drive electrodes 100, an array of sense electrodes 102 separated from the array of drive electrodes by a dielectric layer 200, each sense electrode 102 being offset from each drive electrode 100 to define respective overlapping regions 112 and first non-overlapping regions 113, and a plurality of non-electrically connected electrodes 402, each non-electrically connected electrode 402 being arranged to correspond to each first non-overlapping region 113 and spaced from adjacent drive 100 or sense electrodes 102 by a perimeter gap 404. The perimeter gap 404 may have a width of about 100 um or less. A related touch panel and method of fabricating the same are also disclosed.

Abstract: A double ITO structure, containing sequential layers of indium tin oxide (ITO), silicon dioxide (SiO2) (which may include a dopant material) and ITO, is selectively protected by a patterned photo-resist mask. The sequential layers are etched together in a single etching step using an etchant composition which is an acidic solution containing a transition metal chloride and hydrochloric acid (HCl). Thus, the double ITO structure is etched using a substantially fluoride-free etchant composition.

Abstract: An article includes a multilayer structure, such as, e.g., a touch sensor, having two opposing sides and comprising a central polymeric UV transparent substrate, a transparent conductive layer on each of the two major opposing surfaces of the polymeric substrate, a metallic conductive layer on each transparent conductive layer, and a patterned photoimaging mask on each metallic conductive layer.

Abstract: A double ITO structure, containing sequential layers of indium tin oxide (ITO), silicon dioxide (SiO2) (which may include a dopant material) and ITO, is selectively protected by a patterned photo-resist mask. The sequential layers are etched together in a single etching step using an etchant composition which is an acidic solution containing a transition metal chloride and hydrochloric acid (HCl). Thus, the double ITO structure is etched using a substantially fluoride-free etchant composition.