Patents by Inventor Mutsuhiko Ota

Mutsuhiko Ota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10868553
    Abstract: An atomic oscillator includes an atom cell that accommodates an alkali metal atom, a heating device that heats the atom cell, a container that includes a first magnetism shielding member that is disposed between the heating device and the atom cell and a second magnetism shielding member that is disposed on the side opposite the atom cell with respect to the heating device to shield the atom cell from magnetism produced by the heating device, and a thermally insulating member disposed between the first member and the second member.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: December 15, 2020
    Inventors: Yasunori Onishi, Takahiro Kan, Mutsuhiko Ota
  • Patent number: 10727851
    Abstract: An atomic oscillator includes a light source unit including a light source and a first temperature control device controlling the light source to have a first temperature, an atom cell unit including an atom cell accommodating an alkali metal atom and that light emitted from the light source enters and a second temperature control device controlling the atom cell to have a second temperature different from the first temperature, and a container accommodating the light source unit and the atom cell unit and has a first surface and a second surface different from the first surface. The light source unit is mounted to the first surface, and an air gap is present between the light source unit and the second surface. The atom cell unit is mounted to the second surface, and an air gap is present between the atom cell unit and the first surface.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: July 28, 2020
    Assignee: Seiko Epson Corporation
    Inventors: Yukihiro Hashi, Koji Chindo, Yasunori Onishi, Shunsuke Watanabe, Katsuhiko Maki, Mutsuhiko Ota, Noriaki Tanaka
  • Publication number: 20190149157
    Abstract: An atomic oscillator includes an atom cell that accommodates an alkali metal atom, a heating device that heats the atom cell, a container that includes a first magnetism shielding member that is disposed between the heating device and the atom cell and a second magnetism shielding member that is disposed on the side opposite the atom cell with respect to the heating device to shield the atom cell from magnetism produced by the heating device, and a thermally insulating member disposed between the first member and the second member.
    Type: Application
    Filed: November 13, 2018
    Publication date: May 16, 2019
    Inventors: Yasunori ONISHI, Takahiro KAN, Mutsuhiko OTA
  • Publication number: 20190149160
    Abstract: An atomic oscillator includes a light source unit including a light source and a first temperature control device controlling the light source to have a first temperature, an atom cell unit including an atom cell accommodating an alkali metal atom and that light emitted from the light source enters and a second temperature control device controlling the atom cell to have a second temperature different from the first temperature, and a container accommodating the light source unit and the atom cell unit and has a first surface and a second surface different from the first surface. The light source unit is mounted to the first surface, and an air gap is present between the light source unit and the second surface. The atom cell unit is mounted to the second surface, and an air gap is present between the atom cell unit and the first surface.
    Type: Application
    Filed: November 13, 2018
    Publication date: May 16, 2019
    Inventors: Yukihiro HASHI, Koji CHINDO, Yasunori ONISHI, Shunsuke WATANABE, Katsuhiko MAKI, Mutsuhiko OTA, Noriaki TANAKA
  • Patent number: 10272685
    Abstract: A method is provided for manufacturing a piezoelectric device including a piezoelectric element that is disposed above a diaphragm and that has a multilayer structure including a first electrode disposed above the diaphragm, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: April 30, 2019
    Assignee: Seiko Epson Corporation
    Inventors: Yuma Fukuzawa, Shunya Fukuda, Masato Shimada, Mutsuhiko Ota
  • Publication number: 20170217182
    Abstract: A method is provided for manufacturing a piezoelectric device including a piezoelectric element that is disposed above a diaphragm and that has a multilayer structure including a first electrode disposed above the diaphragm, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode.
    Type: Application
    Filed: January 30, 2017
    Publication date: August 3, 2017
    Inventors: Yuma FUKUZAWA, Shunya FUKUDA, Masato SHIMADA, Mutsuhiko OTA
  • Patent number: 8757777
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: August 22, 2013
    Date of Patent: June 24, 2014
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Publication number: 20130335485
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Application
    Filed: August 22, 2013
    Publication date: December 19, 2013
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
  • Patent number: 8534800
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 17, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Patent number: 8342656
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: January 1, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Publication number: 20120062655
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Application
    Filed: November 18, 2011
    Publication date: March 15, 2012
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
  • Patent number: 8061813
    Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: November 22, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
  • Patent number: 7699452
    Abstract: An ink cartridge 1 is detachably connected to a head of a record apparatus and has a container main body 2 having an ink tank chamber 11 opened to the atmosphere in a state in which the head and the cartridge are connected and a first opening 85 through which ink can be injected into the ink tank chamber (second ink storage chamber 16, etc.,). Such an intermediate wall 301 partitioning the ink tank chamber 11 into two space parts 11a and 11b placed side by side in an ink injection direction is disposed in the ink tank chamber 11 and is formed with a through part 301a through which ink can be injected.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: April 20, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Mutsuhiko Ota, Yukiharu Suda, Hisashi Koike, Satoshi Shinada, Michinari Tsukahara, Hisashi Miyazawa, Yasuto Sakai
  • Patent number: 7643144
    Abstract: An adjusting unit for making positional adjustment of the optical axis adjustment mask, based on the observation by the one optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed, and for making optical axis adjustment of the other optical axis, based on the observation by the other optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: January 5, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Takuma Okamuro, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Yasuo Inaoka
  • Publication number: 20090267999
    Abstract: Included are the steps of: forming piezoelectric elements on a surface of a passage-forming substrate with a vibration plate in between, and forming a penetrating portion by removing an area in the vibration plate, which area will serve as a communicating portion; forming lead electrodes and sealing up the penetrating portion with an interconnect layer; joining a reservoir forming plate to a surface of a passage-forming substrate; forming liquid passages by wet-etching; forming protection films on inner surfaces of the liquid passages; detaching and removing a protection film on an interconnect layer; and causing a reservoir portion and a communicating portion to communicate with each other by removing a corresponding part of the interconnect layer, and in accordance with the manufacturing method, while the liquid passages are being formed, the communicating portion is formed in a way that an edge of an opening of the vibration plate is located outside an edge of an opening which is close to the penetrating p
    Type: Application
    Filed: June 30, 2009
    Publication date: October 29, 2009
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Akira MATSUZAWA, Mutsuhiko OTA
  • Patent number: 7602490
    Abstract: The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting heads ejects liquid and further having alignment marks for positional alignment, the fixation member holding the nozzle-plate side of the plurality of liquid ejecting heads.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: October 13, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Yasuo Inaoka, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Takuma Okamuro
  • Patent number: 7576859
    Abstract: An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the alignment apparatus includes: a transparent mask provided with reference marks with which the alignment marks are aligned; a mirror disposed between the mask and the workpiece; an optical unit having an optical axis pointed in a direction of the mirror via the reference mark from a side of the mask opposite to the mirror, the optical unit enabling the reference mark and a virtual image of the reference mark reflected in the mirror to be observed simultaneously; and an adjusting unit for making optical axis adjustment of the optical axis, based on the observation by the optical unit, such that a real image of the reference mark and the virtual image of the reference mark reflected in the mirror are superposed.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: August 18, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Takuma Okamuro, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Yasuo Inaoka
  • Patent number: 7575312
    Abstract: An ink cartridge 1 is detachably connected to a head of a record apparatus and has a container main body 2 having an ink tank chamber 11 opened to the atmosphere in a state in which the head and the cartridge are connected and a first opening 85 through which ink can be injected into the ink tank chamber (second ink storage chamber 16, etc.,). Such an intermediate wall 301 partitioning the ink tank chamber 11 into two space parts 11a and 11b placed side by side in an ink injection direction is disposed in the ink tank chamber 11 and is formed with a through part 301a through which ink can be injected.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: August 18, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Mutsuhiko Ota, Yukiharu Suda, Hisashi Koike, Satoshi Shinada, Michinari Tsukahara, Hisashi Miyazawa, Yasuto Sakai
  • Publication number: 20090202730
    Abstract: A slit coating type application apparatus includes a holding table 20 which holds a substrate 1 on a vertically lower surface, a first liquid tank 30 which is disposed so as to face the surface of the substrate 1 held on the holding table 20 and stores a predetermined coating liquid 2, a coating head 40 which is held so as to be vertically moved in the first liquid tank 30 and has a slit-shaped nozzle 41 for flowing the coating liquid stored in the first liquid tank 30 toward the surface of the substrate 1, a second liquid tank 50 which is supported so as to be vertically moved, communicates with the first liquid tank 30 through a communicating pipe 60, and stores the coating liquid 2, and a height control unit which controls the height of the second liquid tank 50 according to the movement of the coating head 40 when the coating liquid 2 is coated on the substrate 1.
    Type: Application
    Filed: January 28, 2009
    Publication date: August 13, 2009
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Takumi Yamaoka, Mutsuhiko Ota
  • Patent number: 7571525
    Abstract: Included are the steps of: forming piezoelectric elements on a surface of a passage-forming substrate with a vibration plate in between, and forming a penetrating portion by removing an area in the vibration plate, which area will serve as a communicating portion; forming lead electrodes and sealing up the penetrating portion with an interconnect layer; joining a reservoir forming plate to a surface of a passage-forming substrate; forming liquid passages by wet-etching; forming protection films on inner surfaces of the liquid passages; detaching and removing a protection film on an interconnect layer; and causing a reservoir portion and a communicating portion to communicate with each other by removing a corresponding part of the interconnect layer, and in accordance with the manufacturing method, while the liquid passages are being formed, the communicating portion is formed in a way that an edge of an opening of the vibration plate is located outside an edge of an opening which is close to the penetrating p
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: August 11, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Akira Matsuzawa, Mutsuhiko Ota