Patents by Inventor Mutsuhiko Ota
Mutsuhiko Ota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10868553Abstract: An atomic oscillator includes an atom cell that accommodates an alkali metal atom, a heating device that heats the atom cell, a container that includes a first magnetism shielding member that is disposed between the heating device and the atom cell and a second magnetism shielding member that is disposed on the side opposite the atom cell with respect to the heating device to shield the atom cell from magnetism produced by the heating device, and a thermally insulating member disposed between the first member and the second member.Type: GrantFiled: November 13, 2018Date of Patent: December 15, 2020Inventors: Yasunori Onishi, Takahiro Kan, Mutsuhiko Ota
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Patent number: 10727851Abstract: An atomic oscillator includes a light source unit including a light source and a first temperature control device controlling the light source to have a first temperature, an atom cell unit including an atom cell accommodating an alkali metal atom and that light emitted from the light source enters and a second temperature control device controlling the atom cell to have a second temperature different from the first temperature, and a container accommodating the light source unit and the atom cell unit and has a first surface and a second surface different from the first surface. The light source unit is mounted to the first surface, and an air gap is present between the light source unit and the second surface. The atom cell unit is mounted to the second surface, and an air gap is present between the atom cell unit and the first surface.Type: GrantFiled: November 13, 2018Date of Patent: July 28, 2020Assignee: Seiko Epson CorporationInventors: Yukihiro Hashi, Koji Chindo, Yasunori Onishi, Shunsuke Watanabe, Katsuhiko Maki, Mutsuhiko Ota, Noriaki Tanaka
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Publication number: 20190149160Abstract: An atomic oscillator includes a light source unit including a light source and a first temperature control device controlling the light source to have a first temperature, an atom cell unit including an atom cell accommodating an alkali metal atom and that light emitted from the light source enters and a second temperature control device controlling the atom cell to have a second temperature different from the first temperature, and a container accommodating the light source unit and the atom cell unit and has a first surface and a second surface different from the first surface. The light source unit is mounted to the first surface, and an air gap is present between the light source unit and the second surface. The atom cell unit is mounted to the second surface, and an air gap is present between the atom cell unit and the first surface.Type: ApplicationFiled: November 13, 2018Publication date: May 16, 2019Inventors: Yukihiro HASHI, Koji CHINDO, Yasunori ONISHI, Shunsuke WATANABE, Katsuhiko MAKI, Mutsuhiko OTA, Noriaki TANAKA
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Publication number: 20190149157Abstract: An atomic oscillator includes an atom cell that accommodates an alkali metal atom, a heating device that heats the atom cell, a container that includes a first magnetism shielding member that is disposed between the heating device and the atom cell and a second magnetism shielding member that is disposed on the side opposite the atom cell with respect to the heating device to shield the atom cell from magnetism produced by the heating device, and a thermally insulating member disposed between the first member and the second member.Type: ApplicationFiled: November 13, 2018Publication date: May 16, 2019Inventors: Yasunori ONISHI, Takahiro KAN, Mutsuhiko OTA
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Patent number: 10272685Abstract: A method is provided for manufacturing a piezoelectric device including a piezoelectric element that is disposed above a diaphragm and that has a multilayer structure including a first electrode disposed above the diaphragm, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode.Type: GrantFiled: January 30, 2017Date of Patent: April 30, 2019Assignee: Seiko Epson CorporationInventors: Yuma Fukuzawa, Shunya Fukuda, Masato Shimada, Mutsuhiko Ota
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Publication number: 20170217182Abstract: A method is provided for manufacturing a piezoelectric device including a piezoelectric element that is disposed above a diaphragm and that has a multilayer structure including a first electrode disposed above the diaphragm, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode.Type: ApplicationFiled: January 30, 2017Publication date: August 3, 2017Inventors: Yuma FUKUZAWA, Shunya FUKUDA, Masato SHIMADA, Mutsuhiko OTA
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Patent number: 8757777Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: August 22, 2013Date of Patent: June 24, 2014Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Publication number: 20130335485Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: ApplicationFiled: August 22, 2013Publication date: December 19, 2013Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
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Patent number: 8534800Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: November 30, 2012Date of Patent: September 17, 2013Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Patent number: 8342656Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: November 18, 2011Date of Patent: January 1, 2013Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Publication number: 20120062655Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: ApplicationFiled: November 18, 2011Publication date: March 15, 2012Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA, Tetsushi TAKAHASHI, Yasuyuki MATSUMOTO
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Patent number: 8061813Abstract: A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.Type: GrantFiled: September 12, 2007Date of Patent: November 22, 2011Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota, Tetsushi Takahashi, Yasuyuki Matsumoto
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Patent number: 7699452Abstract: An ink cartridge 1 is detachably connected to a head of a record apparatus and has a container main body 2 having an ink tank chamber 11 opened to the atmosphere in a state in which the head and the cartridge are connected and a first opening 85 through which ink can be injected into the ink tank chamber (second ink storage chamber 16, etc.,). Such an intermediate wall 301 partitioning the ink tank chamber 11 into two space parts 11a and 11b placed side by side in an ink injection direction is disposed in the ink tank chamber 11 and is formed with a through part 301a through which ink can be injected.Type: GrantFiled: December 13, 2006Date of Patent: April 20, 2010Assignee: Seiko Epson CorporationInventors: Mutsuhiko Ota, Yukiharu Suda, Hisashi Koike, Satoshi Shinada, Michinari Tsukahara, Hisashi Miyazawa, Yasuto Sakai
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Patent number: 7643144Abstract: An adjusting unit for making positional adjustment of the optical axis adjustment mask, based on the observation by the one optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed, and for making optical axis adjustment of the other optical axis, based on the observation by the other optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed.Type: GrantFiled: September 14, 2007Date of Patent: January 5, 2010Assignee: Seiko Epson CorporationInventors: Takuma Okamuro, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Yasuo Inaoka
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Publication number: 20090267999Abstract: Included are the steps of: forming piezoelectric elements on a surface of a passage-forming substrate with a vibration plate in between, and forming a penetrating portion by removing an area in the vibration plate, which area will serve as a communicating portion; forming lead electrodes and sealing up the penetrating portion with an interconnect layer; joining a reservoir forming plate to a surface of a passage-forming substrate; forming liquid passages by wet-etching; forming protection films on inner surfaces of the liquid passages; detaching and removing a protection film on an interconnect layer; and causing a reservoir portion and a communicating portion to communicate with each other by removing a corresponding part of the interconnect layer, and in accordance with the manufacturing method, while the liquid passages are being formed, the communicating portion is formed in a way that an edge of an opening of the vibration plate is located outside an edge of an opening which is close to the penetrating pType: ApplicationFiled: June 30, 2009Publication date: October 29, 2009Applicant: SEIKO EPSON CORPORATIONInventors: Akira MATSUZAWA, Mutsuhiko OTA
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Patent number: 7602490Abstract: The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting heads ejects liquid and further having alignment marks for positional alignment, the fixation member holding the nozzle-plate side of the plurality of liquid ejecting heads.Type: GrantFiled: September 7, 2007Date of Patent: October 13, 2009Assignee: Seiko Epson CorporationInventors: Yasuo Inaoka, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Takuma Okamuro
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Patent number: 7576859Abstract: An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the alignment apparatus includes: a transparent mask provided with reference marks with which the alignment marks are aligned; a mirror disposed between the mask and the workpiece; an optical unit having an optical axis pointed in a direction of the mirror via the reference mark from a side of the mask opposite to the mirror, the optical unit enabling the reference mark and a virtual image of the reference mark reflected in the mirror to be observed simultaneously; and an adjusting unit for making optical axis adjustment of the optical axis, based on the observation by the optical unit, such that a real image of the reference mark and the virtual image of the reference mark reflected in the mirror are superposed.Type: GrantFiled: September 12, 2007Date of Patent: August 18, 2009Assignee: Seiko Epson CorporationInventors: Takuma Okamuro, Motonori Okumura, Mutsuhiko Ota, Kazutoshi Goto, Isao Yanagisawa, Yasuo Inaoka
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Patent number: 7575312Abstract: An ink cartridge 1 is detachably connected to a head of a record apparatus and has a container main body 2 having an ink tank chamber 11 opened to the atmosphere in a state in which the head and the cartridge are connected and a first opening 85 through which ink can be injected into the ink tank chamber (second ink storage chamber 16, etc.,). Such an intermediate wall 301 partitioning the ink tank chamber 11 into two space parts 11a and 11b placed side by side in an ink injection direction is disposed in the ink tank chamber 11 and is formed with a through part 301a through which ink can be injected.Type: GrantFiled: December 13, 2006Date of Patent: August 18, 2009Assignee: Seiko Epson CorporationInventors: Mutsuhiko Ota, Yukiharu Suda, Hisashi Koike, Satoshi Shinada, Michinari Tsukahara, Hisashi Miyazawa, Yasuto Sakai
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Publication number: 20090202730Abstract: A slit coating type application apparatus includes a holding table 20 which holds a substrate 1 on a vertically lower surface, a first liquid tank 30 which is disposed so as to face the surface of the substrate 1 held on the holding table 20 and stores a predetermined coating liquid 2, a coating head 40 which is held so as to be vertically moved in the first liquid tank 30 and has a slit-shaped nozzle 41 for flowing the coating liquid stored in the first liquid tank 30 toward the surface of the substrate 1, a second liquid tank 50 which is supported so as to be vertically moved, communicates with the first liquid tank 30 through a communicating pipe 60, and stores the coating liquid 2, and a height control unit which controls the height of the second liquid tank 50 according to the movement of the coating head 40 when the coating liquid 2 is coated on the substrate 1.Type: ApplicationFiled: January 28, 2009Publication date: August 13, 2009Applicant: SEIKO EPSON CORPORATIONInventors: Takumi Yamaoka, Mutsuhiko Ota
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Patent number: 7571525Abstract: Included are the steps of: forming piezoelectric elements on a surface of a passage-forming substrate with a vibration plate in between, and forming a penetrating portion by removing an area in the vibration plate, which area will serve as a communicating portion; forming lead electrodes and sealing up the penetrating portion with an interconnect layer; joining a reservoir forming plate to a surface of a passage-forming substrate; forming liquid passages by wet-etching; forming protection films on inner surfaces of the liquid passages; detaching and removing a protection film on an interconnect layer; and causing a reservoir portion and a communicating portion to communicate with each other by removing a corresponding part of the interconnect layer, and in accordance with the manufacturing method, while the liquid passages are being formed, the communicating portion is formed in a way that an edge of an opening of the vibration plate is located outside an edge of an opening which is close to the penetrating pType: GrantFiled: March 30, 2006Date of Patent: August 11, 2009Assignee: Seiko Epson CorporationInventors: Akira Matsuzawa, Mutsuhiko Ota