Patents by Inventor Mutsuko Higo

Mutsuko Higo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11681224
    Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: June 20, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
  • Patent number: 11500288
    Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: November 15, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
  • Patent number: 11353790
    Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: June 7, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
  • Patent number: 10838300
    Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: November 17, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiromu Sakamoto, Mutsuko Higo, Koji Ichikawa
  • Publication number: 20200233300
    Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
    Type: Application
    Filed: January 14, 2020
    Publication date: July 23, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
  • Publication number: 20200233301
    Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)n3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.
    Type: Application
    Filed: January 14, 2020
    Publication date: July 23, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
  • Publication number: 20200209749
    Abstract: Disclosed is a resist composition including a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Ra10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.
    Type: Application
    Filed: December 23, 2019
    Publication date: July 2, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masako SUGIHARA, Mutsuko HIGO
  • Publication number: 20200064735
    Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:
    Type: Application
    Filed: August 23, 2019
    Publication date: February 27, 2020
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
  • Publication number: 20180065925
    Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.
    Type: Application
    Filed: September 1, 2017
    Publication date: March 8, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiromu SAKAMOTO, Mutsuko HIGO, Koji ICHIKAWA
  • Publication number: 20130266806
    Abstract: A composition including the following: (A): Polymer (A-1) having structural units derived from propylene and structural units derived from 1-butene, and substantially no melting peak is observed with Polymer (A-1), or Polymer (A-2) obtained by graft polymerization of Polymer (A-1) with an ?,?-unsaturated carboxylic acid compound; (B): Polymer (B-1) having structural units derived from ethylene and structural units derived from propylene, and the melting peak of which is observed, or Polymer (B-2) obtained by graft polymerization of Polymer (B-1) with an ?,?-unsaturated carboxylic acid compound; and (C): Polymer (C-1) having structural units derived from propylene and structural units derived from 1-butene, and the melting peak of which is observed, or Polymer (C-2) obtained by graft polymerization of Polymer (C-1) with an ?,?-unsaturated carboxylic acid compound.
    Type: Application
    Filed: December 15, 2011
    Publication date: October 10, 2013
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Masashi Nagano, Mutsuko Higo
  • Publication number: 20130157051
    Abstract: A composition can be provided with superior adhesiveness toward adherends, for example, made of plastic (in particular, polypropylene, and the like). The composition includes the following (A) and (B).
    Type: Application
    Filed: June 10, 2011
    Publication date: June 20, 2013
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masashi Nagano, Mutsuko Higo
  • Publication number: 20120088111
    Abstract: An aqueous emulsion comprising the following components (A), (B) and (C): (A) an acrylic resin comprising a structural unit derived from an ?,?-unsaturated carboxylic acid, and a structural unit derived from an ?,?-unsaturated carboxylic acid ester derived from an aliphatic diol having 1 to 10 carbon atoms and having at least one hydroxyl group bonded to a primary carbon atom or a secondary carbon atom and an ?,?-unsaturated carboxylic acid (B) a thermoplastic polymer (C) water.
    Type: Application
    Filed: June 7, 2010
    Publication date: April 12, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mutsuko Higo, Masashi Nagano, Junji Morimoto
  • Publication number: 20110171479
    Abstract: An emulsion comprising the following (A), (B) and (C): (A) an olefinic copolymer comprising a structural unit derived from ethylene and/or a linear ?-olefin and a structural unit derived from a vinyl compound represented by the formula (I): CH2?CH—R??(I) wherein R represents a secondary alkyl group, a tertiary alkyl group or a alicyclic hydrocarbon group, or a polymer obtained by graft polymerizing an ?,?-unsaturated carboxylic acid anhydride to the olefinic copolymer, (B) an acrylic resin comprising a structural unit derived from an ?,?-unsaturated carboxylic acid and a structural unit derived from an ?,?-unsaturated carboxylic acid ester, (C) water.
    Type: Application
    Filed: September 9, 2009
    Publication date: July 14, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masashi Nagano, Mutsuko Higo, Junji Morimoto, Tsuyoshi Takei, Kenji Sogoh
  • Publication number: 20100101643
    Abstract: A complex compound (I) obtained by coordinating a compound represented by the following formula (II), hereinafter abbreviated as compound (II), to a metal atom. In the formula, R1, R2 and R3 each independently represent a substituent represented by the following formula (III), formula (IV), formula (V) or formula (VI) and at least one of them is a substituent represented by the formula (III); a, b and c each independently represent an integer of 0 to 2 and a+b+c?1; here, L represents a linking group represented by the following formula (VII) or formula (VIII); Ar represents an aryl group which may have a substituent; A represents an acidic group or a salt thereof; Y represents a halogen atom or a substituent; Q1 and Q2 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or a cyano group; and p and q each represent an integer of 1 to 3.
    Type: Application
    Filed: March 27, 2008
    Publication date: April 29, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiya Takahashi, Mutsuko Higo, Tetsuya Shintaku, Tetsuo Kawata, Akio Tanaka, Kunihito Miyake
  • Publication number: 20050247913
    Abstract: A phosphorous ester compound of formula (I): wherein R1 and R2 independently represent hydrogen, C1-8 alkyl, C5-8 cycloalkyl, C6-12 alkylcycloalkyl, C7-12 aralkyl or phenyl, R3 represents hydrogen or C1-8 alkyl, R4, R5, R6 and R7 independently represent hydrogen, C1-8 alkyl, C5-8 cycloalkyl, C6-12 alkylcycloalkyl, C7-12 aralkyl, phenyl, C1-8 alkoxy, or halogen, provided that four R1 groups are the same or different, four R2 groups are the same or different, two R4 groups are the same or different, two R5 groups are the same or different, two R6 groups are the same or different, and two R7 groups are the same or different, X represents a single bond, sulfur, or —CHR8—, wherein R8 represents hydrogen, C1-8 alkyl, or C5-8 cycloalkyl, A represents a single bond, oxygen, etc.
    Type: Application
    Filed: August 25, 2003
    Publication date: November 10, 2005
    Inventors: Mutsuko Higo, Masaaki Tanaka, Hideaki Awa
  • Patent number: 6956074
    Abstract: There is a provided a polyurethane composition, which exhibits an excellent property of preventing discoloring or coloring not only by oxidized nitrogen gases but also by heat, characterized in that (A) a hindered phenol antioxidant, and (B) an amide represented by the following general formula (I): R1—CONH2??(I) wherein R1 represents an alkyl group having 12 to 21 carbon atoms is compounded in the polyurethane.
    Type: Grant
    Filed: August 19, 1999
    Date of Patent: October 18, 2005
    Assignee: Sumitomo Chemical Company, Ltd.
    Inventors: Kenji Kimura, Kanako Fukuda, Mutsuko Higo, Kunihito Miyake
  • Patent number: 6815481
    Abstract: A polybutadiene composition comprising a polybutadiene type polymer and a compound represented by the following formula (I): wherein Ar1 and Ar2 each independently represent an aromatic ring, X and Y each independently represent an alkylene group having one or two carbon atoms, an oxygen atom or a carbonyl group, is provided; and thermal degradation of the polybutadiene type polymer can be prevented even in an air-free environment.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: November 9, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kunihito Miyake, Hironobu Iyama, Mutsuko Higo
  • Patent number: 6756432
    Abstract: There are disclosed a polybutadiene composition comprising: a polybutadiene type polymer, and at least one compound selected from a compound of formula (I-1): or a compound of formula (I-2): wherein R11 to R28 are the same or different and independently represent a hydrogen atom, an alkyl group, or the like; or a compound of formula (II): wherein R1 to R10 independently represent a hydrogen atom, an alkyl group, or the like; or a styrene-butadiene copolymer, and a benzoin compound; and an article molded therefrom, and processes for producing the composition and the molded article.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: June 29, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kunihito Miyake, Mutsuko Higo, Kanako Fukuda, Hironobu Iyama
  • Publication number: 20030153655
    Abstract: There are disclosed a polybutadiene composition comprising:
    Type: Application
    Filed: December 20, 2001
    Publication date: August 14, 2003
    Inventors: Kunihito Miyake, Mutsuko Higo, Kanako Fukuda, Hironobu Iyama
  • Publication number: 20020032256
    Abstract: A polybutadiene composition comprising a polybutadiene type polymer and a compound represented by the following formula (I): 1
    Type: Application
    Filed: July 11, 2001
    Publication date: March 14, 2002
    Inventors: Kunihito Miyake, Hironobu Iyama, Mutsuko Higo