Patents by Inventor Mutsuko Higo
Mutsuko Higo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12164229Abstract: A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Ra10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.Type: GrantFiled: December 23, 2019Date of Patent: December 10, 2024Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masako Sugihara, Mutsuko Higo
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Patent number: 11681224Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:Type: GrantFiled: August 23, 2019Date of Patent: June 20, 2023Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 11500288Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.Type: GrantFiled: January 14, 2020Date of Patent: November 15, 2022Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 11353790Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.Type: GrantFiled: January 14, 2020Date of Patent: June 7, 2022Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Shingo Fujita, Koji Ichikawa
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Patent number: 10838300Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.Type: GrantFiled: September 1, 2017Date of Patent: November 17, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hiromu Sakamoto, Mutsuko Higo, Koji Ichikawa
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Publication number: 20200233301Abstract: Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)n3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1? represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni?5.Type: ApplicationFiled: January 14, 2020Publication date: July 23, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20200233300Abstract: Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein R1 represents a hydrogen atom or a methyl group; L1 and L2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Ra50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Ra51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—; Aa52 represents an alkanediyl group; Xa51 and Xa52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.Type: ApplicationFiled: January 14, 2020Publication date: July 23, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20200209749Abstract: Disclosed is a resist composition including a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: wherein, in formula (3), Ra10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.Type: ApplicationFiled: December 23, 2019Publication date: July 2, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masako SUGIHARA, Mutsuko HIGO
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Publication number: 20200064735Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:Type: ApplicationFiled: August 23, 2019Publication date: February 27, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko HIGO, Shingo FUJITA, Koji ICHIKAWA
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Publication number: 20180065925Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.Type: ApplicationFiled: September 1, 2017Publication date: March 8, 2018Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hiromu SAKAMOTO, Mutsuko HIGO, Koji ICHIKAWA
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Publication number: 20130266806Abstract: A composition including the following: (A): Polymer (A-1) having structural units derived from propylene and structural units derived from 1-butene, and substantially no melting peak is observed with Polymer (A-1), or Polymer (A-2) obtained by graft polymerization of Polymer (A-1) with an ?,?-unsaturated carboxylic acid compound; (B): Polymer (B-1) having structural units derived from ethylene and structural units derived from propylene, and the melting peak of which is observed, or Polymer (B-2) obtained by graft polymerization of Polymer (B-1) with an ?,?-unsaturated carboxylic acid compound; and (C): Polymer (C-1) having structural units derived from propylene and structural units derived from 1-butene, and the melting peak of which is observed, or Polymer (C-2) obtained by graft polymerization of Polymer (C-1) with an ?,?-unsaturated carboxylic acid compound.Type: ApplicationFiled: December 15, 2011Publication date: October 10, 2013Applicant: Sumitomo Chemical Company, LimitedInventors: Masashi Nagano, Mutsuko Higo
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Publication number: 20130157051Abstract: A composition can be provided with superior adhesiveness toward adherends, for example, made of plastic (in particular, polypropylene, and the like). The composition includes the following (A) and (B).Type: ApplicationFiled: June 10, 2011Publication date: June 20, 2013Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masashi Nagano, Mutsuko Higo
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Publication number: 20120088111Abstract: An aqueous emulsion comprising the following components (A), (B) and (C): (A) an acrylic resin comprising a structural unit derived from an ?,?-unsaturated carboxylic acid, and a structural unit derived from an ?,?-unsaturated carboxylic acid ester derived from an aliphatic diol having 1 to 10 carbon atoms and having at least one hydroxyl group bonded to a primary carbon atom or a secondary carbon atom and an ?,?-unsaturated carboxylic acid (B) a thermoplastic polymer (C) water.Type: ApplicationFiled: June 7, 2010Publication date: April 12, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Mutsuko Higo, Masashi Nagano, Junji Morimoto
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Publication number: 20110171479Abstract: An emulsion comprising the following (A), (B) and (C): (A) an olefinic copolymer comprising a structural unit derived from ethylene and/or a linear ?-olefin and a structural unit derived from a vinyl compound represented by the formula (I): CH2?CH—R??(I) wherein R represents a secondary alkyl group, a tertiary alkyl group or a alicyclic hydrocarbon group, or a polymer obtained by graft polymerizing an ?,?-unsaturated carboxylic acid anhydride to the olefinic copolymer, (B) an acrylic resin comprising a structural unit derived from an ?,?-unsaturated carboxylic acid and a structural unit derived from an ?,?-unsaturated carboxylic acid ester, (C) water.Type: ApplicationFiled: September 9, 2009Publication date: July 14, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masashi Nagano, Mutsuko Higo, Junji Morimoto, Tsuyoshi Takei, Kenji Sogoh
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Publication number: 20100101643Abstract: A complex compound (I) obtained by coordinating a compound represented by the following formula (II), hereinafter abbreviated as compound (II), to a metal atom. In the formula, R1, R2 and R3 each independently represent a substituent represented by the following formula (III), formula (IV), formula (V) or formula (VI) and at least one of them is a substituent represented by the formula (III); a, b and c each independently represent an integer of 0 to 2 and a+b+c?1; here, L represents a linking group represented by the following formula (VII) or formula (VIII); Ar represents an aryl group which may have a substituent; A represents an acidic group or a salt thereof; Y represents a halogen atom or a substituent; Q1 and Q2 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or a cyano group; and p and q each represent an integer of 1 to 3.Type: ApplicationFiled: March 27, 2008Publication date: April 29, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Toshiya Takahashi, Mutsuko Higo, Tetsuya Shintaku, Tetsuo Kawata, Akio Tanaka, Kunihito Miyake
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Publication number: 20050247913Abstract: A phosphorous ester compound of formula (I): wherein R1 and R2 independently represent hydrogen, C1-8 alkyl, C5-8 cycloalkyl, C6-12 alkylcycloalkyl, C7-12 aralkyl or phenyl, R3 represents hydrogen or C1-8 alkyl, R4, R5, R6 and R7 independently represent hydrogen, C1-8 alkyl, C5-8 cycloalkyl, C6-12 alkylcycloalkyl, C7-12 aralkyl, phenyl, C1-8 alkoxy, or halogen, provided that four R1 groups are the same or different, four R2 groups are the same or different, two R4 groups are the same or different, two R5 groups are the same or different, two R6 groups are the same or different, and two R7 groups are the same or different, X represents a single bond, sulfur, or —CHR8—, wherein R8 represents hydrogen, C1-8 alkyl, or C5-8 cycloalkyl, A represents a single bond, oxygen, etc.Type: ApplicationFiled: August 25, 2003Publication date: November 10, 2005Inventors: Mutsuko Higo, Masaaki Tanaka, Hideaki Awa
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Patent number: 6956074Abstract: There is a provided a polyurethane composition, which exhibits an excellent property of preventing discoloring or coloring not only by oxidized nitrogen gases but also by heat, characterized in that (A) a hindered phenol antioxidant, and (B) an amide represented by the following general formula (I): R1—CONH2??(I) wherein R1 represents an alkyl group having 12 to 21 carbon atoms is compounded in the polyurethane.Type: GrantFiled: August 19, 1999Date of Patent: October 18, 2005Assignee: Sumitomo Chemical Company, Ltd.Inventors: Kenji Kimura, Kanako Fukuda, Mutsuko Higo, Kunihito Miyake
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Patent number: 6815481Abstract: A polybutadiene composition comprising a polybutadiene type polymer and a compound represented by the following formula (I): wherein Ar1 and Ar2 each independently represent an aromatic ring, X and Y each independently represent an alkylene group having one or two carbon atoms, an oxygen atom or a carbonyl group, is provided; and thermal degradation of the polybutadiene type polymer can be prevented even in an air-free environment.Type: GrantFiled: July 11, 2001Date of Patent: November 9, 2004Assignee: Sumitomo Chemical Company, LimitedInventors: Kunihito Miyake, Hironobu Iyama, Mutsuko Higo
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Patent number: 6756432Abstract: There are disclosed a polybutadiene composition comprising: a polybutadiene type polymer, and at least one compound selected from a compound of formula (I-1): or a compound of formula (I-2): wherein R11 to R28 are the same or different and independently represent a hydrogen atom, an alkyl group, or the like; or a compound of formula (II): wherein R1 to R10 independently represent a hydrogen atom, an alkyl group, or the like; or a styrene-butadiene copolymer, and a benzoin compound; and an article molded therefrom, and processes for producing the composition and the molded article.Type: GrantFiled: December 20, 2001Date of Patent: June 29, 2004Assignee: Sumitomo Chemical Company, LimitedInventors: Kunihito Miyake, Mutsuko Higo, Kanako Fukuda, Hironobu Iyama
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Publication number: 20030153655Abstract: There are disclosed a polybutadiene composition comprising:Type: ApplicationFiled: December 20, 2001Publication date: August 14, 2003Inventors: Kunihito Miyake, Mutsuko Higo, Kanako Fukuda, Hironobu Iyama