Abstract: A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a<bn or a>bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.

Abstract: The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound with a specific structure, and a developer for the positive electron beam resist, containing specific amounts of alkali metal ions, weak acid radical ions and a water soluble organic compound. The present invention can provide a positive electron beam resist composition with a novolak and a quinonediazide as main ingredients, excellent in dry etching resistance and resolution, and it if is used, a fine pattern can be obtained at high sensitivity especially when the developer of the present invention is used.

Abstract: The present invention relates to a radiation-sensitive positive resist comprising a copolymer obtained by copolymerizing 2,2,2-trifluoroethyl .alpha.-chloroacrylate with 2,2,3,3-tetrafluoropropyl .alpha.-chloroacrylate at a weight ratio of between 90:10 and 50:50 and a radiation-sensitive positive resist composition essentially comprising said copolymer and a solvent containing methyl cellosolve acetate as a major component. The resist and the resist composition according to the present invention exhibit high sensitivity and excellent reproducibility, so that they are useful in the production of a photo mask which is used in the production of LSI, VLSI and the like.

Abstract: As a stripper for a radiosensitive resist formed of a poly(fluoroalkyl .alpha.-haloacrylate) or a copolymer thereof, there is used a solution which contains 0.1 to 40 wt. % of an alkali metal alkoxide, an alkali metal hydroxide or a tetraalkylammonium hydroxide in a substantially non-aqueous polar solvent of dimethyl sulfoxide.

Abstract: Negative resist materials comprising soluble, film-forming polymers with side branches containing vinyl silyl groups are used for pattern generation on exposure to high energy radiation such as electron beams or X-rays.

Abstract: New compounds of the formula ##STR1## WHEREIN Ar is selected from the group consisting of phenylethyl, furyl, methylfuryl, thienyl, pyrrolyl, naphthyl, hydroxynaphthyl, and phenyl substituted by at least one member selected from the group consisting of halogen, hydroxyl, cyano, trifluoromethyl, alkyl of 1-4 carbon atoms, alkoxy of 1-4 carbon atoms, carbamoyl, amino of the formula --NR'R", alkoxycarbonyl of the formula --CO--OR' wherein R' and R" are each alkyl of 1-4 carbon atoms, and alkylenedioxy of the formula --O--R'"--O-- wherein R'" is alkylene of 1-4 carbon atoms, provided that said substituted phenyl is not 3,4-di-methoxyphenyl, and the addition salts thereof with the cation of an organic or inorganic base inhibit the enzyme activities of tyrosine hydroxylase and dopamine .beta.-hydroxylase and are useful chemotherapeutic agents in the treatment of essential hypertension.

Abstract: As new compound, a series of 2-hydrocinnamoyl-1,3-cyclopentanedione derivative of the general formula: ##STR1## WHEREIN Ar stands for a mono-valent aromatic radical, for example, phenyl and 3,4-methylenedioxy-phenyl, substituted or unsubstituted, have been found to have an activity to inhibit the action of tyrosine hydroxylase and to be useful as hypotensive agent. These new compounds may be produced by condensing 2-acetyl-1,3-cyclopentanedione with an aromatic aldehyde of the formula Ar-CHO wherein Ar is as defined, according to Claisen-Schmidt condensation, followed by the hydrogenation of the condensation product obtained, or the new compounds may also be produced by reacting 2-acetyl-1,3-cyclopentanedione with an aromatic halide of the formula Ar-CH.sub.2 X wherein Ar is as defined and X is a halogen, for example, in liquid ammonia and in the presence of an alkali metal amide.

Abstract: New compounds of the formula ##SPC1##Wherein Ar is selected from the group consisting of phenylethyl, furyl, methylfuryl, thienyl, pyrrolyl, naphthyl, hydroxynaphthyl, and phenyl substituted by at least one member selected from the group consisting of halogen, hydroxyl, cyano, trifluoromethyl, akyl of 1-4 carbon atoms, alkoxy of 1-4 carbon atoms, carbamoyl, amino of the formula --NR'R", alkoxycarbonyl of the formula --CO--OR' wherein R'and R"are each alkyl of 1-4 carbon atoms, and alkylenedioxy of the formula --O--R '"--O-- wherein R'" is alkylene of 1-4 carbon atoms, provided that said substituted phenyl is not 3,4-di-methoxyphenyl, and the addition salts thereof with the cation of an organic or inorganic base inhibit the enzyme activities of tyrosine hydroxylase and dopamine .beta.-hydroxylase and are useful chemotherapeutic agents in the treatment of essential hypertension.