Patents by Inventor Myeong Sub NOH

Myeong Sub NOH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230317419
    Abstract: Provided are a substrate processing apparatus and method capable of improving line edge roughness (LER). The substrate processing apparatus comprises a plasma generating space disposed between an electrode and an ion blocker, a processing space disposed under the ion blocker and for processing a substrate, a first gas supply module for providing a first gas for generating plasma to the plasma generating space, and a second gas supply module for providing an unexcited second gas to the processing space, wherein the first gas is a hydrogen-containing gas, the second gas includes a nitrogen-containing gas, and the substrate includes a photoresist pattern including carbon.
    Type: Application
    Filed: April 1, 2022
    Publication date: October 5, 2023
    Inventors: Young Je UM, Wan Jae PARK, Joun Taek KOO, Dong Hun KIM, Seong Gil LEE, Ji Hwan LEE, Dong Sub OH, Myeong Sub NOH, Du Ri KIM