Abstract: A substrate processing method is provided. The substrate processing method comprises loading a substrate onto a substrate support inside a chamber, forming a plasma inside the chamber, providing a first DC pulse signal to an electromagnet that generates a magnetic field inside the chamber and processing the substrate with the plasma, wherein the first DC pulse signal is repeated at a first period including a first section and a second section subsequent to the first section, the first DC pulse signal has a first level during the first section, and the first DC pulse signal has a second level different from the first level during the second section.

Abstract: Various embodiments generally relate to a power distribution network and a semiconductor device, which may include: a plurality of chip pads; a first distribution layer in which a plurality of first conductive lines having rectangular shapes of different sizes, respectively, are disposed; a second distribution layer in which a plurality of second conductive lines including a central cross-shaped conductive line and L-shaped conductive lines open toward respective corners of the second distribution layer are disposed; and a redistribution layer electrically coupling chip pads to which power is applied among the plurality of chip pads and the first conductive lines of the first distribution layer.

Abstract: A complex malodor removing equipment includes: a neutralizing module which dissolves a portion of malodor-causing substances, in malodorous gas introduced from malodor-producing equipment, in liquid water and removes same, which includes an acidity neutralizing module that introduces an alkaline substance from outside and removes an acidic malodor-causing substance from the malodor-causing substances, and an alkaline neutralizing module that introduces an acidic substance from outside and removes an alkaline malodor-causing substance from the malodor-causing substances, and which connects the acidity neutralizing module and the alkaline neutralizing module; and a balancing module which dissolves the remainder of the malodor-causing substances, in the malodorous gas introduced from the neutralizing module, in water and removes same, which includes an oxidation balancing module that introduces an oxidizing agent from outside and balances the malodor-causing substances, and a reduction balancing module that intr

Abstract: A complex malodor removing equipment includes: a neutralizing module which dissolves a portion of malodor-causing substances, in malodorous gas introduced from malodor-producing equipment, in liquid water and removes same, which includes an acidity neutralizing module that introduces an alkaline substance from outside and removes an acidic malodor-causing substance from the malodor-causing substances, and an alkaline neutralizing module that introduces an acidic substance from outside and removes an alkaline malodor-causing substance from the malodor-causing substances, and which connects the acidity neutralizing module and the alkaline neutralizing module; and a balancing module which dissolves the remainder of the malodor-causing substances, in the malodorous gas introduced from the neutralizing module, in water and removes same, which includes an oxidation balancing module that introduces an oxidizing agent from outside and balances the malodor-causing substances, and a reduction balancing module that intr